1 |
Modelling of an Atmospheric Pressure Nitrogen Glow Discharge Operating in High-Gas Temperature Regimes Prevosto L, Kelly H, Mancinelli B Plasma Chemistry and Plasma Processing, 36(4), 973, 2016 |
2 |
Characterisation of the growth of a carbonaceous film on silicon Beardmore JP, Palmer AJ, Fabrie CGCHM, van Leeuwen KAH, Sang RT Thin Solid Films, 520(7), 2414, 2012 |
3 |
Metastable helium atom scattering from Ni(110) surface Kurahashi M, Yamauchi Y Applied Surface Science, 169, 241, 2001 |
4 |
Laser-focused atomic deposition - nanofabrication via atom optics McClelland JJ, Celotta RJ Thin Solid Films, 367(1-2), 25, 2000 |
5 |
Excited atoms in the vicinity of a surface in a barrier discharge measured by evanescent-wave laser spectroscopy Sakurai T, Toda M Thin Solid Films, 374(2), 157, 2000 |
6 |
Classical trajectory calculations of collision energy dependence of total and partial Penning ionization cross sections for He*(2(3)S)+N-2 -> He+N-2(+)+e(-) Ogawa T, Ohno K Journal of Chemical Physics, 110(8), 3773, 1999 |
7 |
Influence of sticking coefficients on the behavior of sputtered atoms in an argon glow discharge : Modeling and comparison with experiment Bogaerts A, Naylor J, Hatcher M, Jones WJ, Mason R Journal of Vacuum Science & Technology A, 16(4), 2400, 1998 |
8 |
Characterization of ultrathin films of titanyl phthalocyanine on graphite: PIES and UPS study Kera S, Abduaini A, Aoki M, Okudaira KK, Ueno N, Harada Y, Shirota Y, Tsuzuki T Thin Solid Films, 327-329, 278, 1998 |
9 |
Photoemission Cross-Sections for CH Radicals Produced by Collisions of He(2(3)S) Atoms with CH(3)X (X=h, Cl, Br, I) Tokue I, Sakai Y, Yamasaki K Journal of Chemical Physics, 106(11), 4491, 1997 |
10 |
Nanofabrication using neutral atomic beams Thywissen JH, Johnson KS, Younkin R, Dekker NH, Berggren KK, Chu AP, Prentiss M, Lee SA Journal of Vacuum Science & Technology B, 15(6), 2093, 1997 |