검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
Superhydrophobic silicone nanofilament coatings Zimmermann J, Artus GRJ, Seeger S Journal of Adhesion Science and Technology, 22(3-4), 251, 2008 |
| 2 |
Preparation of Spherical Poly(methylsilsesquioxanes) Beads and Their Properties Chae HS, Song SJ, Park YH Molecular Crystals and Liquid Crystals, 492, 28, 2008 |
| 3 |
CO2 promotes penetration and removal of aqueous hydrocarbon surfactant cleaning solutions and silylation in low-k dielectrics with 3 nm pores Keagy JA, Li Y, Green PF, Johnston KP, Weber F, Rhoad JT, Busch EL, Wolf PJ Journal of Supercritical Fluids, 42(3), 398, 2007 |
| 4 |
Characterization and integration of new porous low-k dielectric (k < 2.3) for 65 nm technology and beyond Choi KK, Cho IH, Park SJ, Lim JE, Jung OJ, Park JH, Min BS, Hwang SB, Ko MJ, Lee JG Thin Solid Films, 515(12), 5025, 2007 |
| 5 |
Removal of moisture contamination from porous polymeric low-k dielectric films Iqbal A, Juneja H, Yao JP, Shadman F AIChE Journal, 52(4), 1586, 2006 |
| 6 |
Cleaning of patterned porous low-k dielectrics with water, carbon dioxide and ambidextrous surfactants Keagy JA, Zhang XG, Johnston KP, Busch E, Weber F, Wolf PJ, Rhoad T Journal of Supercritical Fluids, 39(2), 277, 2006 |
| 7 |
Preparation and properties of alkoxy(methyl)silsesquioxanes as coating agents Gunji T, Iizuka Y, Arimitsu K, Abe Y Journal of Polymer Science Part A: Polymer Chemistry, 42(15), 3676, 2004 |
| 8 |
Characterisation of metal oxide semiconductor capacitor structure using low-k dielectric methylsilsesquioxane with evaporated aluminium and copper gate Aw KC, Ibrahim K Thin Solid Films, 434(1-2), 178, 2003 |
| 9 |
Characteristics of low-k nanoporous poly(methylsilsequioxane) thin films Min SK, Park JM, Song K, Jin MY, Lee C, Yoon DY, Rhee HW Molecular Crystals and Liquid Crystals, 377, 193, 2002 |
| 10 |
Methylsilsesquioxane-dimethylsiloxane 공중합체의 졸-겔 합성 이정훈, 석상일, 진문영, 서태수, 홍석인 HWAHAK KONGHAK, 39(2), 213, 2001 |