| 1 |
Generating Switchable and Reconfi gurable Optical Vortices via Photopatterning of Liquid Crystals
Wei BY, Hu W, Ming Y, Xu F, Rubin S, Wang JG, Chigrinov V, Lu YQ
Advanced Materials, 26(10), 1590, 2014 |
| 2 |
A simple, effective NADH sensor constructed with phenothiazine via AFM tip-induced oxidative polymerization
Chiang YM, Huang HY, Wang CM
Journal of Electroanalytical Chemistry, 677, 78, 2012 |
| 3 |
An air-flow based wafer bake system for improved temperature uniformity
Lan W, Poh LA, Ming GZ, Loong CS
Journal of Process Control, 18(10), 931, 2008 |
| 4 |
A lamp thermoelectricity based integrated bake/chill system for photoresist processing
Tay A, Chua HT, Wu XD
International Journal of Heat and Mass Transfer, 50(3-4), 580, 2007 |
| 5 |
Control of photoresist film thickness: Iterative feedback tuning approach
Tay A, Ho WK, Deng JW, Lok BK
Computers & Chemical Engineering, 30(3), 572, 2006 |
| 6 |
An inverse heat transfer method to provide near-isothermal surface for disc heaters used in microlithography
Narasimhan A, Karra S
International Journal of Heat and Mass Transfer, 49(23-24), 4624, 2006 |
| 7 |
Additive channel-constrained metallization of high-resolution features
Chen MS, Brandow SL, Dressick WJ
Thin Solid Films, 379(1-2), 203, 2000 |
| 8 |
Design of photoresists with reduced environmental impact. II. Water-soluble resists based on photocrosslinking of poly(2-isopropenyl-2-oxazoline)
Havard JM, Yoshida M, Pasini D, Vladimirov N, Frechet JMJ, Medeiros DR, Patterson K, Yamada S, Willson CG, Byers JD
Journal of Polymer Science Part A: Polymer Chemistry, 37(9), 1225, 1999 |
| 9 |
Base-Sensitive Polymers as Imaging Materials - Radiation-Induced Beta-Elimination to Yield Poly(4-Hydroxystyrene)
Urankar EJ, Brehm I, Niu QJ, Frechet JM
Macromolecules, 30(5), 1304, 1997 |
| 10 |
Formation of Polymerizable Monomer Langmuir-Blodgett-Films with Polyfluorocarbon Chains for Use in High-Resolution Negative Resists
Li XD, Aoki A, Miyashita T
Macromolecules, 30(7), 2194, 1997 |
