화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Characteristics of post-nitridation rapid-thermal annealed gate oxide grown on 4H SiC
Cheong KY, Bahng W, Kim NK
Materials Science Forum, 483, 689, 2005
2 Characterization of non-equilibrium charge of MOS capacitors on p-type 4H SiC
Cheong KY, Dimitrijev S, Han J
Materials Science Forum, 457-460, 1365, 2004
3 Effects of initial nitridation on the characteristics of SiC-SiO2 interfaces
Cheong KY, Dimitrijev S, Han J
Materials Science Forum, 433-4, 583, 2002