1 |
Controllable synthesis of zinc oxide nanoparticles embedded holey reduced graphene oxide nanocomposite as a high-performance anode for lithium-ion batteries Wu DB, Wu HJ, Niu YB, Wang C, Chen Z, Ouyang YR, Wang S, Li HL, Chen LP, Zhang LY Powder Technology, 367, 774, 2020 |
2 |
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth Jang YC, Roh HJ, Park S, Jeong S, Ryu S, Kwon JW, Kim NK, Kim GH Current Applied Physics, 19(10), 1068, 2019 |
3 |
Copper(II) oxide powder manufacture for via-filling plating from H2O2 type etching wastes Lee SB, Jung RY, Kim SH Journal of Industrial and Engineering Chemistry, 79, 418, 2019 |
4 |
Dry etching characteristics of Mo and Al2O3 films in O-2/Cl-2/Ar inductively coupled plasmas Kwon KH, Efremov A, Yun SJ, Chun I, Kim K Thin Solid Films, 552, 105, 2014 |
5 |
Acid-catalyzed kinetics of indium tin oxide etching Choi JH, Kim SO, Hilton DL, Cho NJ Thin Solid Films, 565, 179, 2014 |
6 |
A New Surface Etching Method Using MnO2/H2SO4 Colloid for Adhesion Improvement of Epoxy Polymer Li N, Yuan XL, Li ZX, Wang ZL Journal of Adhesion Science and Technology, 26(10-11), 1407, 2012 |
7 |
Instabilities in reactive sputtering of ZnO:Al and reliable texture-etching solution for light trapping in silicon thin film solar cells Hupkes J, Zhu H, Owen JI, Jost G, Bunte E Thin Solid Films, 520(6), 1913, 2012 |
8 |
A study on the etch characteristics of HfAlO3 dielectric thin film in Cl-2/Ar gas chemistry using inductively coupled plasma system Woo JC, Ha TK, Um DS, Park J, Kang YC, Kim CI Thin Solid Films, 520(3), 1141, 2011 |
9 |
Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure Kim GH, Kim CI Thin Solid Films, 515(12), 4955, 2007 |
10 |
Surface activation of thin silicon oxides by wet cleaning and silanization Han Y, Mayer D, Offenhausser A, Ingebrandt S Thin Solid Films, 510(1-2), 175, 2006 |