화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 Controllable synthesis of zinc oxide nanoparticles embedded holey reduced graphene oxide nanocomposite as a high-performance anode for lithium-ion batteries
Wu DB, Wu HJ, Niu YB, Wang C, Chen Z, Ouyang YR, Wang S, Li HL, Chen LP, Zhang LY
Powder Technology, 367, 774, 2020
2 Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth
Jang YC, Roh HJ, Park S, Jeong S, Ryu S, Kwon JW, Kim NK, Kim GH
Current Applied Physics, 19(10), 1068, 2019
3 Copper(II) oxide powder manufacture for via-filling plating from H2O2 type etching wastes
Lee SB, Jung RY, Kim SH
Journal of Industrial and Engineering Chemistry, 79, 418, 2019
4 Dry etching characteristics of Mo and Al2O3 films in O-2/Cl-2/Ar inductively coupled plasmas
Kwon KH, Efremov A, Yun SJ, Chun I, Kim K
Thin Solid Films, 552, 105, 2014
5 Acid-catalyzed kinetics of indium tin oxide etching
Choi JH, Kim SO, Hilton DL, Cho NJ
Thin Solid Films, 565, 179, 2014
6 A New Surface Etching Method Using MnO2/H2SO4 Colloid for Adhesion Improvement of Epoxy Polymer
Li N, Yuan XL, Li ZX, Wang ZL
Journal of Adhesion Science and Technology, 26(10-11), 1407, 2012
7 Instabilities in reactive sputtering of ZnO:Al and reliable texture-etching solution for light trapping in silicon thin film solar cells
Hupkes J, Zhu H, Owen JI, Jost G, Bunte E
Thin Solid Films, 520(6), 1913, 2012
8 A study on the etch characteristics of HfAlO3 dielectric thin film in Cl-2/Ar gas chemistry using inductively coupled plasma system
Woo JC, Ha TK, Um DS, Park J, Kang YC, Kim CI
Thin Solid Films, 520(3), 1141, 2011
9 Dry etching of magnesium oxide thin films by using inductively coupled plasma for buffer layer of MFIS structure
Kim GH, Kim CI
Thin Solid Films, 515(12), 4955, 2007
10 Surface activation of thin silicon oxides by wet cleaning and silanization
Han Y, Mayer D, Offenhausser A, Ingebrandt S
Thin Solid Films, 510(1-2), 175, 2006