검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Surfactant-aided supercritical carbon dioxide drying for photoresists to prevent pattern collapse Lee MY, Do KM, Ganapathy HS, Lo YS, Kim JJ, Choi SJ, Lim KT Journal of Supercritical Fluids, 42(1), 150, 2007 |
| 2 |
Adsorption of cationic surfactants onto photoresist surfaces - A way to reduce pattern collapse in high aspect ratio patterning Drechsler A, Petong N, Bellmann C, Synytska A, Busch P, Stamm M, Grundke K, Wunnicke O Canadian Journal of Chemical Engineering, 84(1), 3, 2006 |
| 3 |
Lithography for sub-60 nm resist nanostructures Ocola LE, Tennant D, Timp G, Novembre A Journal of Vacuum Science & Technology B, 17(6), 3164, 1999 |
| 4 |
Applications of molecular modeling in nanolithography Pawloski AR, Torres JA, Nealey PF, de Pablo JJ Journal of Vacuum Science & Technology B, 17(6), 3371, 1999 |