| 1 |
Fabrication of Si and Ge nanoarrays through graphoepitaxial directed hardmask block copolymer self-assembly
Gangnaik AS, Ghoshal T, Georgiev YM, Morris MA, Holmes JD
Journal of Colloid and Interface Science, 531, 533, 2018 |
| 2 |
Nanosecond laser nanostructuring of fused silica surfaces assisted by a chromium triangle template
Lorenz P, Gruner C, Frost F, Ehrhardt M, Zimmer K
Applied Surface Science, 418, 481, 2017 |
| 3 |
Non-chemically amplified resists containing polyhedral oligomeric silsesquioxane for a bilayer resist system
Woo SA, Choi SY, Kim JB
Polymer, 98, 336, 2016 |
| 4 |
Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films
Chen WH, Luo J, Meng LK, Li JJ, Xiang JJ, Li JF, Wang WW, Chen DP, Ye TC, Zhao C
Thin Solid Films, 613, 32, 2016 |
| 5 |
Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography
Borah D, Rasappa S, Salaun M, Zellsman M, Lorret O, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA
Advanced Functional Materials, 25(22), 3425, 2015 |
| 6 |
Solvent Vapor Annealing of Block Copolymers in Confined Topographies: Commensurability Considerations for Nanolithography
Cummins C, Kelly RA, Gangnaik A, Georgiev YM, Petkov N, Holmes JD, Morris MA
Macromolecular Rapid Communications, 36(8), 762, 2015 |
| 7 |
Nickel electrodeposition using EnFACE
Widayatno T, Roy S
Journal of Applied Electrochemistry, 44(7), 807, 2014 |
| 8 |
Fabrication of an ultra-thin silicon solar cell and nano-scale honeycomb structure by thermal-stress-induced pattern transfer method
Du CH, Wang TY, Chen CH, AndrewYeh J
Thin Solid Films, 557, 372, 2014 |
| 9 |
Direct-Write Thermocapillary Dewetting of Polymer Thin Films by a Laser-Induced Thermal Gradient
Singer JP, Lin PT, Kooi SE, Kimerling LC, Michel J, Thomas EL
Advanced Materials, 25(42), 6100, 2013 |
| 10 |
High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications
Gu XD, Dorsey P, Russell TP
Advanced Materials, 24(40), 5505, 2012 |
