| 1 |
Svnthesis and micropatterning properties of a novel base-soluble, positive-working, photosensitive polyirnide having an o-nitrobenzyl ether group
Shin GJ, Jung JC, Chi JH, Oh TH, Kim JB
Journal of Polymer Science Part A: Polymer Chemistry, 45(5), 776, 2007 |
| 2 |
Ionic-bonded negative photosensitive polyimides having pendant aminoalkyl (meth)acrylamide groups
Fukushima T, Oyama T, Tomoi M
Reactive & Functional Polymers, 56(1), 59, 2003 |
| 3 |
Synthesis and positive-imaging photosensitivity of soluble polyimides having pendant carboxyl groups
Fukushima T, Hosokawa K, Oyama T, Iijima T, Tomoi M, Itatani H
Journal of Polymer Science Part A: Polymer Chemistry, 39(6), 934, 2001 |
| 4 |
Self-adhesion of poly(4,4 ＇-oxydiphenylene biphenyltetracarboximide) and its adhesion to substrates
Ree M, Park YH, Shin TJ, Nunes TL, Volksen W
Polymer, 41(6), 2105, 2000 |
| 5 |
Chemically Amplified Resists Using 1,2-Naphthoquinone Diazide-4-Sulfonates as Photoacid Generators
Hayase R, Onishi Y, Niki H, Oyasato N, Hayase S
Journal of the Electrochemical Society, 141(11), 3141, 1994 |
