| 1 |
Optical emission spectroscopy as a process-monitoring tool in plasma enhanced chemical vapor deposition of amorphous carbon coatings - multivariate statistical modelling
Anooshehpour F, Turgeon S, Cloutier M, Mantovani D, Laroche G
Thin Solid Films, 649, 106, 2018 |
| 2 |
Effect of near-substrate plasma density in the reactive magnetron sputter deposition of hydrogenated amorphous germanium
Kaufman-Osborn T, Pollock KM, Hiltrop J, Braam K, Fazzio S, Doyle JR
Thin Solid Films, 520(6), 1866, 2012 |
| 3 |
Density of O-atoms in an afterglow reactor during treatment of wool
Canal C, Gaboriau F, Ricard A, Mozetic M, Cvelbar U, Drenik A
Plasma Chemistry and Plasma Processing, 27(4), 404, 2007 |
| 4 |
An iron catalytic probe for determination of the O-atom density in an Ar/O-2 afterglow
Mozetic M, Vesel A, Cvelbar U, Ricard A
Plasma Chemistry and Plasma Processing, 26(2), 103, 2006 |
| 5 |
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
Bohlmark J, Lattemann M, Gudmundsson JT, Ehiasarian AP, Gonzalvo YA, Brenning N, Helmersson U
Thin Solid Films, 515(4), 1522, 2006 |
| 6 |
Characterization of hydrogen plasma with a fiber optics catalytic probe
Cvelbar U, Mozetic M, Poberaj I, Babib D, Ricard A
Thin Solid Films, 475(1-2), 12, 2005 |
| 7 |
Temperature and electron density distributions of laser-induced plasmas generated with an iron sample at different ambient gas pressures
Aguilera JA, Aragon C
Applied Surface Science, 197, 273, 2002 |
