| 1 |
Plasma Impedance Analysis: A Novel Approach for Investigating a Phase Transition from a-Si:H to nc-Si:H
Chaudhary D, Sharma M, Sudhakar S, Kumar S
Plasma Chemistry and Plasma Processing, 37(1), 189, 2017 |
| 2 |
High-pressure condition of SiH4+Ar+H-2 plasma for deposition of hydrogenated nanocrystalline silicon film
Parashar A, Kumar S, Dixit PN, Gope J, Rauthan CMS, Hashmi SA
Solar Energy Materials and Solar Cells, 92(10), 1199, 2008 |
| 3 |
Simple method for ion current measurement at RF biased electrode
Kawata H, Yasuda M, Hirai Y
Thin Solid Films, 506, 683, 2006 |
| 4 |
Effect of the discharge frequency and impedance on the structural properties of polymorphous silicon
Aguas H, Raniero L, Pereira L, Fortunato E, Martins R
Thin Solid Films, 451-52, 264, 2004 |
| 5 |
Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique
Martins R, Silva V, Aguas H, Cabrita A, Ferreira I, Fortunato E
Applied Surface Science, 184(1-4), 101, 2001 |
