| 1 |
Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers
Li W, Varlamov S, Xue CW
Applied Surface Science, 314, 174, 2014 |
| 2 |
Effect of flash lamp annealing on electrical activation in boron-implanted polycrystalline Si thin films
Do W, Jin WB, Choi J, Bae SM, Kim HJ, Kim BK, Park S, Hwang JH
Materials Research Bulletin, 58, 164, 2014 |
| 3 |
Direct growth of large grain polycrystalline silicon films on aluminum-induced crystallization seed layer using hot-wire chemical vapor deposition
Wu BR, Lo SY, Wuu DS, Ou SL, Mao HY, Wang JH, Horng RH
Thin Solid Films, 520(18), 5860, 2012 |
| 4 |
Formation of n-channel polycrystalline-Si thin-film transistors by dual source/drain implantation
Juang MH, Chang CW, Wang JL, Shye DC, Hwang CC, Jang SL
Solid-State Electronics, 54(5), 516, 2010 |
| 5 |
Fabrication of self-aligned TFTs with a ultra-low temperature polycrystalline silicon process on metal foils
Moon J, Kim YH, Park DJ, Chung CH, Kang SY, Lee JH
Solid-State Electronics, 54(11), 1326, 2010 |
| 6 |
Dopant diffusion and activation induced by sub-melt laser anneal within the co-implanted p plus polycrystalline silicon gate used in CMOS technologies
Colin A, Morin P, Beneyton R, Pinzelli L, Mathiot D, Fogarassy E
Thin Solid Films, 518(9), 2390, 2010 |
| 7 |
Formation of polycrystalline-Si thin-film transistors with tunneling field-effect-transistor structure
Juang MH, Hu PS, Jang SL
Thin Solid Films, 518(14), 3978, 2010 |
| 8 |
Influence of laser wavelength and beam profile on Nd3+:YAG laser assisted formation of polycrystalline-Si films
Palani IA, Vasa NJ, Singaperumal M, Okada T
Thin Solid Films, 518(15), 4183, 2010 |
| 9 |
Effect of the interface glass on electrical performance of screen printed Ag thick-film contacts of Si solar cells
Zhang YP, Yang YX, Zheng JH, Chen GR, Cheng C, Hwang JCM, Ooi BS, Kovalskiy A, Jain H
Thin Solid Films, 518(24), E111, 2010 |
| 10 |
The formation of polycrystalline-Si thin-film transistors by using large-angle-tilt-implantation of dopant through gate sidewall spacer
Juang MH, Huang CW, Chang CW, Shye DC, Hwang CC, Wang JL, Jang SL
Solid-State Electronics, 53(9), 1036, 2009 |
