검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Difference between C4F8 and C5F8 plasmas in surface reaction processes for selective etching of SiO2 over Si3N4 Motomura H, Imai S, Tachibana K Thin Solid Films, 374(2), 243, 2000 |
| No. | Article |
|---|---|
| 1 |
Difference between C4F8 and C5F8 plasmas in surface reaction processes for selective etching of SiO2 over Si3N4 Motomura H, Imai S, Tachibana K Thin Solid Films, 374(2), 243, 2000 |