| 1 |
Ionic conductivity of bias sputtered lithium phosphorus oxy-nitride thin films
Mani PD, Saraf S, Singh V, Real-Robert M, Vijayakumar A, Duranceau SJ, Seal S, Coffey KR
Solid State Ionics, 287, 48, 2016 |
| 2 |
Modeling the reactive sputter deposition of N-doped TiO2 for application in dye-sensitized solar cells: Effect of the O-2 flow rate on the substitutional N concentration
Duarte DA, Sagas JC, Sobrinho ASD, Massi M
Applied Surface Science, 269, 55, 2013 |
| 3 |
Magnetron sputtering modes during pulsed deposition process determined by the analysis of power supply parameter
Krowka K, Wiatrowski A, Posadowski WM
Thin Solid Films, 520(12), 4127, 2012 |
| 4 |
Optical on-line monitoring for the long-term stabilization of a reactive mid-frequency sputtering process of Al-doped zinc oxide films
Sittinger V, Ruske F, Pflug A, Dewald W, Szyszka B, Dittmar G
Thin Solid Films, 518(11), 3115, 2010 |
| 5 |
Structural characterization of sputtered indium oxide films deposited at room temperature
Hotovy I, Pezoldt J, Kadlecikova M, Kups T, Spiess L, Breza J, Sakalauskas E, Goldhahn R, Rehacek V
Thin Solid Films, 518(16), 4508, 2010 |
| 6 |
Microstructure and optical properties of chromium containing amorphous hydrogenated carbon thin films (a-C:H/Cr)
Cheng HY, Wu WY, Ting JM
Thin Solid Films, 517(17), 4724, 2009 |
| 7 |
Effects of thermal annealing in oxygen on the antiferromagnetic order and domain structure of epitaxial LaFeO3 thin films
Grepstad JK, Takamura Y, Scholl A, Hole I, Suzuki Y, Tybell T
Thin Solid Films, 486(1-2), 108, 2005 |
| 8 |
Structure of reactively sputter deposited tin-nitride thin films: A combined X-ray photoelectron spectroscopy, in situ X-ray reflectivity and X-ray absorption spectroscopy study
Lutzenkirchen-Hecht D, Frahm R
Thin Solid Films, 493(1-2), 67, 2005 |
| 9 |
Reactive sputter deposition of epitaxial (001)CeO2 on (001)Ge
Patel M, Kim K, Ivill M, Budai JD, Norton DP
Thin Solid Films, 468(1-2), 1, 2004 |
| 10 |
Effect of processing parameters on the microstructure and mechanical properties of TiN film on stainless steel by HCD ion plating
Huang JH, Tsai YP, Yu GP
Thin Solid Films, 355-356, 440, 1999 |
