검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
원격 플라즈마 화학기상증착법에 의해 중합된 아크릴산 필름의 XPS 분석 김성훈, 서문규 Journal of the Korean Industrial and Engineering Chemistry, 20(5), 536, 2009 |
| 2 |
Effect of a-SiN : H thin film deposited by PE/RACVD on a-Si : H thin film transistor Kang JW, Park KW, Park BN, Moon KH, Choi SY, Sohn YS Molecular Crystals and Liquid Crystals, 459, 157, 2006 |
| 3 |
Remote PECVD oxide utilized in U-MOS structures and different MOSFETs on SiC Scharnholz S, Hellmund O, Stein J, Spangenberg B, Kurz H Materials Science Forum, 353-356, 651, 2001 |