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원격 플라즈마 중합된 메틸메타크릴레이트 필름의 분광학적 분석 서문규 Applied Chemistry for Engineering, 32(1), 49, 2021 |
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Inactivation of bacterial endospores on surfaces by plasma processed air Kramer B, Hasse D, Guist S, Schmitt-John T, Muranyi P Journal of Applied Microbiology, 128(4), 920, 2020 |
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Surface modification of carbon felt by cold remote plasma for glucose oxidase enzyme immobilization Kahoush M, Behary N, Cayla A, Mutel B, Guan JP, Nierstrasz V Applied Surface Science, 476, 1016, 2019 |
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Performance improvements of tungsten and zinc doped indium oxide thin film transistor by fluorine based double plasma treatment with a high-K gate dielectric Ruan DB, Liu PT, Chiu YC, Yu MC, Gan KJ, Chien TC, Chen YH, Kuo PY, Sze SM Thin Solid Films, 665, 117, 2018 |
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Rapid thermal processing of hafnium dioxide thin films by remote plasma atomic layer deposition as high-k dielectrics Zhang XY, Hsu CH, Cho YS, Zhang S, Lien SY, Zhu WZ, Xiong FB Thin Solid Films, 660, 797, 2018 |
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Aluminum metal surface cleaning and activation by atmospheric-pressure remote plasma Munoz J, Bravo JA, Calzada MD Applied Surface Science, 407, 72, 2017 |
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Spectroscopic ellipsometry characterization of ZnO:Sn thin films with various Sn composition deposited by remote-plasma reactive sputtering Janicek P, Niang KM, Mistrik J, Palka K, Flewitt AJ Applied Surface Science, 421, 557, 2017 |
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Investigation of the Expansion of an Oxygen Microwave Remote Plasma for the Growth of Functional Oxide Thin Films Al Makdessi G, Tabbal M Plasma Chemistry and Plasma Processing, 37(1), 243, 2017 |
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Construction of antibacterial layer on polyvinylchloride three-channel hollow fiber membranes Li MS, Wang MX, Wu FY, Chu XZ Journal of Industrial and Engineering Chemistry, 39, 181, 2016 |
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Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric Lee DJ, Lim JW, Mun JK, Yun SJ Materials Research Bulletin, 83, 597, 2016 |