| 1 |
Infrared spectroscopic ellipsometry of micrometer-sized SiO2 line gratings
Walder C, Zellmeier M, Rappich J, Ketelsen H, Hinrichs K
Applied Surface Science, 416, 397, 2017 |
| 2 |
Traceable Mueller polarimetry and scatterometry for shape reconstruction of grating structures
Hansen PE, Madsen MH, Lehtolahti J, Nielsen L
Applied Surface Science, 421, 471, 2017 |
| 3 |
Convergence and precision characteristics of finite difference time domain method for the analysis of spectroscopic ellipsometry data at oblique incidence
Foo Y, Zapien JA
Applied Surface Science, 421, 878, 2017 |
| 4 |
Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data
Chen XG, Shi YT, Jiang H, Zhang CW, Liu SY
Applied Surface Science, 388, 524, 2016 |
| 5 |
Determination of an optimal measurement configuration in optical scatterometry using global sensitivity analysis
Dong ZQ, Liu SY, Chen XG, Zhang CW
Thin Solid Films, 562, 16, 2014 |
| 6 |
A practical method for optical dispersion model selection and parameters variations in scatterometry analysis with variable n&k's
Likhachev DV
Thin Solid Films, 562, 90, 2014 |
| 7 |
In and out of incidence plane Mueller matrix scattering ellipsometry of rough mc-Si
Maria J, Aas LMS, Kildemo M
Thin Solid Films, 571, 399, 2014 |
| 8 |
Off-plane diffraction of extreme ultraviolet light caused by line width roughness
Chen WY, Lin CH
Thin Solid Films, 522, 79, 2012 |
| 9 |
Analysis of textured films and periodic grating structures with Mueller matrices: A new challenge in instrumentation with the generation of angle-resolved SE polarimeters
Ferrieu F, Novikova T, Fallet C, Ben Hatit S, Vannuffel C, De Martino A
Thin Solid Films, 519(9), 2608, 2011 |
| 10 |
Application of scatterometric porosimetry to characterize porous ultra low-k patterned layers
Licitra C, Bouyssou R, El Kodadi M, Haberfehlner G, Chevolleau T, Hazart J, Virot L, Besacier M, Schiavone P, Bertin F
Thin Solid Films, 519(9), 2825, 2011 |
