| 1 |
A Novel Fault Detection Scheme Based on Difference in Independent Component for Reliable Process Monitoring: Application on the Semiconductor Manufacturing Processes
Zhang C, Xu T, Li Y
Journal of Chemical Engineering of Japan, 53(7), 313, 2020 |
| 2 |
Next-generation virtual metrology for semiconductor manufacturing: A feature-based framework
Suthar K, Shah D, Wang J, He QP
Computers & Chemical Engineering, 127, 140, 2019 |
| 3 |
DeepVM: A Deep Learning-based approach with automatic feature extraction for 2D input data Virtual Metrology
Maggipinto M, Beghi A, McLoone S, Susto GA
Journal of Process Control, 84, 24, 2019 |
| 4 |
DeepVM: A Deep Learning-based approach with automatic feature extraction for 2D input data Virtual Metrology
Maggipinto M, Beghi A, McLoone S, Susto GA
Journal of Process Control, 84, 24, 2019 |
| 5 |
An intelligent virtual metrology system with adaptive update for semiconductor manufacturing
Kang S, Kang P
Journal of Process Control, 52, 66, 2017 |
| 6 |
Tactical capacity planning for semiconductor manufacturing: MILP models and scalable distributed parallel algorithms
Zhou RJ, Li LJ
AIChE Journal, 62(11), 3930, 2016 |
| 7 |
Characterization of complex inter-layer dielectric stack by spectroscopic ellipsometry: A simple method to reduce parameters correlations
Likhachev DV
Thin Solid Films, 550, 305, 2014 |
| 8 |
A practical method for optical dispersion model selection and parameters variations in scatterometry analysis with variable n&k's
Likhachev DV
Thin Solid Films, 562, 90, 2014 |
| 9 |
Generation and verification of optimal dispatching policies for multi-product multi-tool semiconductor manufacturing processes
Chen CF, Wu KJ, Chang CT, Wong DSH, Jang SS
Computers & Chemical Engineering, 52, 112, 2013 |
| 10 |
Bottleneck Prediction Method Based on Improved Adaptive Network-based Fuzzy Inference System (ANFIS) in Semiconductor Manufacturing System
Cao ZC, Deng JJ, Liu M, Wang YJ
Chinese Journal of Chemical Engineering, 20(6), 1081, 2012 |
