화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Self-consistent charge-up simulation for the microscopic feature of SiO2 layer in rf capacitive discharge
Lee SH, Lee JK, Jung SW, Kim DW, You SJ
Current Applied Physics, 15(11), 1463, 2015
2 Distributed electron cyclotron resonance plasma: A technology for large area deposition of device-quality a-Si : H at very high rate
Leempoel P, Descamps P, de Meerendre TK, Charliac J, Cabarrocas PRI, Bulkin P, Daineka D, Dao TH, Kleider JP, Gueunier-Farret ME, Longeaud C
Thin Solid Films, 516(20), 6853, 2008
3 Positive bias effects on the growth of diamond at pressures below 100 mTorr
Teii K, Yoshida T
Thin Solid Films, 316(1-2), 24, 1998