검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Synthesis of Fe metal precipitated colloidal silica and its application to W chemical mechanical polishing (CMP) slurry Kang YJ, Prasad YN, Kim IK, Jung SJ, Park JG Journal of Colloid and Interface Science, 349(1), 402, 2010 |
| 2 |
Chemical mechanical polishing of BTO thin film for vertical sidewall patterning of high-density memory capacitor Kim NH, Ko PJ, Seo YJ, Lee WS Thin Solid Films, 504(1-2), 261, 2006 |
| 3 |
Cu-CMP에서 Alanine이 Cu와 TaN의 선택비에 미치는 영향 박진형, 김민석, 백운규, 박재근 Korean Journal of Materials Research, 15(6), 426, 2005 |
| 4 |
Preparations of Silica Slurry for Wafer Polishing via Controlled Growth of Commercial Silica Seeds So JH, Bae SH, Yang SM, Kim DH Korean Journal of Chemical Engineering, 18(4), 547, 2001 |