검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Formation of strained-silicon layer on thin relaxed-SiGe/SiO2/Si structure using SIMOX technology Sugiyama N, Mizuno T, Takagi S, Koike M, Kurobe A Thin Solid Films, 369(1-2), 199, 2000 |
| No. | Article |
|---|---|
| 1 |
Formation of strained-silicon layer on thin relaxed-SiGe/SiO2/Si structure using SIMOX technology Sugiyama N, Mizuno T, Takagi S, Koike M, Kurobe A Thin Solid Films, 369(1-2), 199, 2000 |