검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
XRR and GISAXS study of silicon oxynitride films Bernstoff S, Dubcek P, Pivac B, Kovacevic I, Sassella A, Borghesi A Applied Surface Science, 253(1), 33, 2006 |
| 2 |
Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures Vamvakas VE, Davazoglou D, Berjoan R, Schamm S, Vahlas C Thin Solid Films, 429(1-2), 77, 2003 |
| 3 |
Effect of substrate temperature in SiOxNy films deposited by electron cyclotron resonance del Prado A, Martinez FL, Martil I, Gonzalez-Diaz G, Fernandez M Journal of Vacuum Science & Technology A, 17(4), 1263, 1999 |
| 4 |
A Study of Si Compounds by Zr L-Alpha Photoelectron-Spectroscopy Chourasia AR, Hood SJ, Chopra DR Journal of Vacuum Science & Technology A, 14(3), 699, 1996 |
| 5 |
Sioxny Films Deposited by Remote Plasma-Enhanced Chemical-Vapor-Deposition Using Sicl4 Sanchez O, Aguilar MA, Falcony C, Martinezduart JM, Albella JM Journal of Vacuum Science & Technology A, 14(4), 2088, 1996 |