화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 One-step surface nitridation of CoO for high-energy-density lithium-ion batteries
Kim D, Park S, Mun J, Ryu JH
International Journal of Energy Research, 44(11), 9233, 2020
2 HfO2/GeOxNy/Ge gate stacks with sub-nanometer capacitance equivalent thickness and low interface trap density by in situ NH3 plasma pretreatment
Cao YQ, Chen J, Liu XJ, Li X, Cao ZY, Ma YJ, Wu D, Li AD
Applied Surface Science, 325, 13, 2015
3 N-2 post-deposition treatment on silicon thin films with a hot-wire chemical vapor method at a low wire temperature
Omori Y, Tabata A, Kondo A
Thin Solid Films, 519(14), 4535, 2011
4 The effect of Si surface nitridation on the interfacial structure and electrical properties of (La2O3)(0.5)(SiO2)(0.5) high-k gate dielectric films
Gao LG, Yin KB, Chen L, Guo HX, Xia YD, Yin J, Liu ZG
Applied Surface Science, 256(1), 90, 2009