검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
The Nearest Uniformity Producing Profile (NUPP) optimization criterion for thin-film processing applications Adomaitis RA Journal of Process Control, 18(10), 922, 2008 |
| 2 |
Implementation of a geometrically based criterion for film uniformity control in a planetary SiCCVD reactor system Parikh RP, Adomaitis RA, Oliver JD, Ponczak BH Journal of Process Control, 17(5), 477, 2007 |
| 3 |
Identification of a deposition rate profile subspace corresponding to spatially-uniform films in planetary CVD reactors: a new criterion for uniformity control Adomaitis RA Computers & Chemical Engineering, 29(4), 829, 2005 |
| 4 |
Feedback control of plasma etching reactors for improved etching uniformity Armaou A, Baker J, Christofides PD Chemical Engineering Science, 56(4), 1467, 2001 |