화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Mechanism of Cobalt Bottom-Up Filling for Advanced Node Interconnect Metallization
Wu J, Wafula F, Branagan S, Suzuki H, van Eisden J
Journal of the Electrochemical Society, 166(1), D3136, 2018
2 Properties of PEG, PPG and Their Copolymers: Influence on Copper Filling of Damascene Interconnects
Ryan K, Dunn K, van Eisden J, Adolf J
Journal of the Electrochemical Society, 160(12), D3186, 2013
3 In situ monitoring of formation of InAs quantum dots and overgrowth by GaAs or AlAs
Yakimov M, Tokranov V, Agnello G, van Eisden J, Oktyabrsky S
Journal of Vacuum Science & Technology B, 23(3), 1221, 2005