검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Dielectric Properties of Thermal and Plasma-Assisted Atomic Layer Deposited Al2O3 Thin Films Jinesh KB, van Hemmen JL, van de Sanden MCM, Roozeboom F, Klootwijk JH, Besling WFA, Kessels WMM Journal of the Electrochemical Society, 158(2), G21, 2011 |
| 2 |
Thermal and Plasma Enhanced Atomic Layer Deposition of Al2O3 on GaAs Substrates Sioncke S, Delabie A, Brammertz G, Conard T, Franquet A, Caymax M, Urbanzcyk A, Heyns M, Meuris M, van Hemmen JL, Keuning W, Kessels WMM Journal of the Electrochemical Society, 156(4), H255, 2009 |
| 3 |
Plasma and thermal ALD of Al2O3 in a commercial 200 mm ALD reactor van Hemmen JL, Heil SBS, Klootwijk JH, Roozeboom F, Hodson CJ, van de Sanden MCM, Kessels WMM Journal of the Electrochemical Society, 154(7), G165, 2007 |
| 4 |
Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor Heil SBS, van Hemmen JL, Hodson CJ, Singh N, Klootwijk JH, Roozeboom F, de Sanden MCMV, Kessels WMM Journal of Vacuum Science & Technology A, 25(5), 1357, 2007 |