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| No. | Article |
|---|---|
| 1 |
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials Sun GR, Cho SH, Yang F, He X, Pavia-Sanders A, Clark C, Raymond JE, Verkhoturov SV, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of Polymer Science Part A: Polymer Chemistry, 53(2), 193, 2015 |