검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Influence of surface preparation and cleaning on the passivation of boron diffused silicon surfaces for high efficiency photovoltaics Ali H, Moldovan A, Mack S, Wilson M, Schoenfeld WV, Davis KO Thin Solid Films, 636, 412, 2017 |
| 2 |
Polished Wafer와 Epi-Layer Wafer의 표면 처리에 따른 표면 화학적/물리적 특성 김진서, 서형탁 Korean Journal of Materials Research, 24(12), 682, 2014 |
| 3 |
태양광 실리콘 웨이퍼 세정제 개발 배수정, 이호열, 이종기, 배재흠, 이동기 Clean Technology, 18(1), 43, 2012 |
| 4 |
Role of cleaning methods on bond quality of Ti coated glass/imidex system Lubna N, Auner G, Patwa R, Herfurth H, Newaz G Applied Surface Science, 257(10), 4749, 2011 |
| 5 |
Effects of water and iso-propyl alcohol relative humidities on single wafer cleaning system performance Koo J, Kim T, Jung C, Lee J, Kim T International Journal of Heat and Mass Transfer, 50(21-22), 4275, 2007 |
| 6 |
Surfactant-aided supercritical carbon dioxide drying for photoresists to prevent pattern collapse Lee MY, Do KM, Ganapathy HS, Lo YS, Kim JJ, Choi SJ, Lim KT Journal of Supercritical Fluids, 42(1), 150, 2007 |
| 7 |
불산-오존-희석 암모니아수 세정에 의한 실리콘 웨이퍼 표면의 미세입자 제거 이건호, 배소익 Korean Chemical Engineering Research, 45(2), 203, 2007 |
| 8 |
[기획특집-초임계유체 활용기술] 초임계 이산화탄소를 이용한 웨이퍼 세정기술 한갑수, 임종성, 유기풍 Prospectives of Industrial Chemistry, 9(1), 2, 2006 |
| 9 |
Effects of wafer cleaning on the interconnect structure and its electrical properties during the Al dual damascene process for the fabrication of sub-100 nm memory devices Ryu HK, Kim YW, Shin CB, Kim CK Journal of Chemical Engineering of Japan, 38(11), 922, 2005 |
| 10 |
실리콘 Intrinsic Gettering 기술의 이해와 응용 최광수 Korean Journal of Materials Research, 14(1), 9, 2004 |