검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Advances in Particle Removal without Damage Snow JT, Miya K, Sato M, Kato M, Tanaka T Particulate Science and Technology, 33(5), 554, 2015 |
| 2 |
Characterization of critically cleaned sapphire single-crystal substrates by atomic force microscopy, XPS and contact angle measurements Zhang D, Wang Y, Gan Y Applied Surface Science, 274, 405, 2013 |
| 3 |
Improvement of LC Alignment by Control of UV Irradiation and Wet Cleaning for a Photo-Degradable Polyimide Layer Lee JJ, Kim EJ, Paek SH Molecular Crystals and Liquid Crystals, 539, 196, 2011 |
| 4 |
Study of the surface cleaning of GOI and SGOI substrates for Ge epitaxial growth Moriyama Y, Hirashita N, Usuda K, Nakaharai S, Sugiyama N, Toyoda E, Takagi S Applied Surface Science, 256(3), 823, 2009 |
| 5 |
대체 세정제의 선정을 위한 세정성 평가방법 연구 신진호, 이재훈, 배재흠, 이민재, 황인국 Clean Technology, 15(2), 81, 2009 |
| 6 |
Wet cleaning and surface characterization of Si1-xGex virtual substrates after a CMP step Abbadie A, Hartmann JM, Besson P, Rouchon D, Martinez E, Holliger P, Di Nardo C, Campidelli Y, Billon T Applied Surface Science, 254(21), 6793, 2008 |
| 7 |
Silicon surface wet cleaning and chemical oxide growth by a novel treatment in aqueous chlorine solutions Chemla M, Durand-Vidal S, Zanna S, Petitdidier S, Levy D Electrochimica Acta, 49(21), 3545, 2004 |
| 8 |
Optimized surface pretreatments for copper electroplating Kim JJ, Kim SK Applied Surface Science, 183(3-4), 311, 2001 |