3039 - 3045 |
Cyclic Voltammetry of a TCNQ(0/-1) Solid-State Redox Couple Role of Nucleation and Nonideality for a Square Scheme Surface Redox Reaction Chambers JQ, Scaboo K, Evans CD |
3046 - 3052 |
Optimizing Pyrolysis of Sugar Carbons for Use as Anode Materials in Lithium-Ion Batteries Xing W, Xue JS, Dahn JR |
3053 - 3057 |
Ins Situ Fourier-Transform Infrared-Diffuse Reflection Spectroscopy of Direct Methanol Fuel-Cell Anodes and Cathodes Fan QB, Pu C, Smotkin ES |
3058 - 3065 |
Feasibility Studies of a Fuel-Cell for Cogeneration of Homogeneously Catalyzed Acetaldehyde and Electricity from Ethanol Malhotra S, Datta R |
3065 - 3073 |
A Chemical Diffusion-Controlled Electrode-Reaction at the Compact La1-Xsrxmno3/Stabilized Zirconia Interface in Oxygen Atmospheres Mizusaki J, Saito T, Tagawa H |
3073 - 3079 |
Direct Methanol Fuel-Cell Cathodes with Sulfur and Nitrogen-Based Carbon Functionality Roy SC, Christensen PA, Hamnett A, Thomas KM, Trapp V |
3079 - 3082 |
Electrochemical Formation of Polyaniline in Selenic Acid Tang HQ, Kitani A, Shiotani M |
3083 - 3088 |
In-Situ Fe-57 Mossbauer-Spectroscopy Study of the Electrochemical-Behavior of an Iron-Substituted Nickel-Hydroxide Electrode Guerloudemourgues L, Fournes L, Delmas C |
3088 - 3094 |
Electronic-Structure of Passive Films Formed on Molybdenum-Containing Ferritic Stainless-Steels Hakiki NE, Belo MD |
3094 - 3099 |
Use of a Hydrogen Anode for Nitrate Waste Destruction Kalu EE, White RE, Hobbs DT |
3099 - 3108 |
The Performance and Stability of Ambient-Temperature Molten-Salts for Solar-Cell Applications Papageorgiou N, Athanassov Y, Armand M, Bonhote P, Pettersson H, Azam A, Gratzel M |
3109 - 3117 |
Electrochromic Behavior of Molybdenum Trioxide Thin-Films, Prepared by Thermal-Oxidation of Electrodeposited Molybdenum Trisulfide, in Mixtures of Nonaqueous and Aqueous-Electrolytes Laperriere G, Lavoie MA, Belanger D |
3117 - 3121 |
Electrodeposited Silver Arrays Fabricated Utilizing Self-Assembled Alkanethiolate Monolayer Photoresist Liang M, Lackey N, Carter S, Norton ML |
3122 - 3132 |
Mechanic Study of Copper Deposition Onto Gold Surfaces by Scaling and Spectral-Analysis of in-Situ Atomic-Force Microscopic Images Schmidt WU, Alkire RC, Gewirth AA |
3133 - 3138 |
Cells with Sodium-Hypochlorite or Chlorite and Anodes of Magnesium or Aluminum Brenner A |
3139 - 3144 |
Modeling of Plated Through-Hole Processes .1. Current Distribution Chern JW, Cheh HY |
3144 - 3148 |
Modeling of Plated Through-Hole Processes .2. Effect of Leveling Agents on Current Distribution Chern JW, Cheh HY |
3148 - 3152 |
Differential Measurement of Nonlinear Electrical Relaxation of Lithium Batteries Jamnik J, Gaberscek M, Pejovnik S |
3152 - 3157 |
An Organosulfur Polymer Cathode with a High-Current Capability for Rechargeable Batteries Sotomura T, Tatsuma T, Oyama N |
3157 - 3160 |
In-Situ Conductivity Measurements of Licoo2 Film During Lithium Insertion/Extraction by Using Interdigitated Microarray Electrodes Shibuya M, Nishina T, Matsue T, Uchida I |
3160 - 3166 |
Theoretical Aspects of Laminar-Flow in a Channel-Type Electrochemical-Cell as Applied to in-Situ Attenuated Total-Reflection Infrared-Spectroscopy Tolmachev YV, Wang ZH, Scherson DA |
3166 - 3172 |
Electrosynthesis of P-Hydroxybenzaldehyde from P-Hydroxymandelic Acid Using a Platinum-Electrode Gomis JA, Morallon E, Montiel V, Aldaz A |
3173 - 3178 |
Photocurrent Losses in Nanocrystalline/Nanoporous TiO2 Electrodes Due to Electrochemically Active Species in the Electrolyte Rensmo H, Lindstrom H, Sodergren S, Willstedt AK, Solbrand A, Hagfeldt A, Lindquist SE |
3178 - 3186 |
Electrochemical-Behavior of Boron in LiF-NaF-KF-Melts Polyakova LP, Bukatova GA, Polyakov EG, Christensen E, Vonbarner JH, Bjerrum NJ |
3186 - 3191 |
Investigation of Alkali Carbonate Transport Toward the Catalyst in Internal Reforming Mcfcs Berger RJ, Doesburg EB, Vanommen JG, Ross JR |
3192 - 3198 |
Semiconductor Electrochemistry of Particulate Pyrite - Dissolution via Hole and Electron Pathways Wei D, Osseoasare K |
3198 - 3203 |
X-Ray-Absorption Studies of ZnCl2-Peo and Mixed Salt ZnCl2/KCl-Peo and ZnCl2/CsCl-Peo Complexes Mcbreen J, Yang XQ, Lee HS, Okamoto Y |
3203 - 3213 |
Characterization of Thin-Film Rechargeable Lithium Batteries with Lithium Cobalt Oxide Cathodes Wang B, Bates JB, Hart FX, Sales BC, Zuhr RA, Robertson JD |
3214 - 3222 |
Analytic Solution for Charge-Transport and Chemical-Potential Variation in Single-Layer and Multilayer Devices of Different Mixed-Conducting Oxides Yuan S, Pal U |
3223 - 3238 |
Multiphase Mathematical-Model of a Nickel/Hydrogen Cell Devidts P, Delgado J, White RE |
3239 - 3244 |
Colloidal Processing of Baceo3-Based Electrolyte Films Agarwal V, Liu ML |
3245 - 3251 |
Kinetics and Mechanism of the Etching of CoSi2 in HF-Based Solutions Baklanov MR, Badmaeva IA, Donaton RA, Sveshnikova LL, Storm W, Maex K |
3251 - 3256 |
Thermodynamics of the Formation of Tin from TiCl4-NH3-H-2 on a Patterned Oxidized Silicon Substrate Bouteville A, Imhoff L, Remy JC |
3257 - 3266 |
Reaction of 1,1,1,5,5,5-Hexafluoro-2,4-Pentanedione (H(+)Hfac) with Iron and Iron-Oxide Thin-Films George MA, Hess DW, Beck SE, Young K, Bohling DA, Voloshin G, Lane AP |
3266 - 3270 |
Etching of Tantalum in Fluorine-Containing High-Density Plasmas Hsiao R, Miller D |
3271 - 3273 |
Wet Chemical Etching of High-Quality V-Grooves with (111)A Sidewalls on (001)InP Kappelt M, Bimberg D |
3273 - 3278 |
The Role of Metal-Hydrides in Electrode-Reactions on Metal-Oxide Semiconductors Ohkubo S, Ashida Y, Utsumi I, Hongo K, Nogami G |
3279 - 3284 |
Identification and Removal of Trace Organic Contamination on Silicon-Wafers Stored in Plastic Boxes Saga K, Hattori T |
3285 - 3290 |
High-Density Etching of Group-III Nitride Ternary Films Shul RJ, Howard AJ, Pearton SJ, Abernathy CR, Vartuli CB |
3290 - 3296 |
On the Role of Chlorine in Selective Silicon Epitaxy by Chemical-Vapor-Deposition Violette KE, Oneil PA, Ozturk MC, Christensen K, Maher DM |
3297 - 3301 |
Electromigration Characteristics of Sputtered Tin/Ti/Alsicu/Tion/Ti Interconnects with Aluminum Reflow Yamaha T, Naito M |
3302 - 3307 |
Characteristics of Top-Gate Polysilicon Thin-Film Transistors Fabricated on Fluorine-Implanted and Crystallized Amorphous-Silicon Films Yang CK, Lei TF, Lee CL |
3307 - 3316 |
The Effect of Postcure Annealing on the Protective Properties of Polyimides on Chromium Substrates Mitton DB, Latanision RM, Bellucci F |
3316 - 3322 |
Initiation and Formation of Porous GaAs Schmuki P, Fraser J, Vitus CM, Graham MJ, Isaacs HS |
3323 - 3327 |
Impact of the Electrochemical Properties of Silicon-Wafer Surfaces on Copper Outplating from HF Solutions Teerlinck I, Mertens PW, Schmidt HF, Meuris M, Heyns MM |
3327 - 3332 |
Grain-Size Internal-Stress Relationship in Iron-Nickel Alloy Electrodeposits Czerwinski F |
3333 - 3335 |
Luminescence Characteristics of the Lanthanide Complex Incorporated into an Ormosil Matrix Using a Sol-Gel Method Jin T, Tsutsumi S, Deguchi Y, Machida K, Adachi G |
3336 - 3342 |
Platinization of Shapable Electroconductive Polymer Film for an Improved Glucose Sensor Khan GF, Wernet W |
3343 - 3348 |
Electrodeposited Magnetic-Alloys for Surface Micromachining Lochel B, Maciossek A |
3348 - 3353 |
Optical Switching of Y-Hydride Thin-Film Electrodes - A Remarkable Electrochromic Phenomenon Notten PH, Kremers M, Griessen R |
3354 - 3358 |
On Electron Conduction and Trapping in Simox Dielectric Hall S, Wainwright SP |
3359 - 3365 |
Passivation of Sodium-Ions in Metal-Oxide-Semiconductor Structures by Annealing with Ultraviolet-Light Itsumi M, Akiya H, Nakayama S, Yoshino H |
3366 - 3371 |
Electrical and Physical Characterization of Tetraethylorthosilicate-O-3 Borophosphosilicate Glass Iyer R, Thakur RP, Rhodes H, Liao R, Rosler R, Yieh E |
3372 - 3376 |
Thermal Oxynitridation of Silicon in N2O Ambients Kim K, Lee YH, Suh MS, Youn CJ, Lee KB, Lee HJ |
3377 - 3383 |
Electron Traps and Excess Current-Induced by Hot-Hole Injection into Thin SiO2-Films Kobayashi K, Teramoto A, Matsui Y, Hirayama M, Yasuoka A, Nakamura T |
3383 - 3388 |
Influence of Cooling Condition During Crystal-Growth of Cz-Si on Oxide Breakdown Property (Reprinted from Oyo-Butsuri, Vol 65, 1996) Iwasaki T, Tsumori Y, Nakai K, Haga H, Kojima K, Nakashizu T |
3389 - 3393 |
Distribution of Residual-Stresses in Boron-Doped P(+) Silicon Films Ning XJ |
3394 - 3396 |
Extremely High Etch Rates of in-Based III-V Semiconductors in Bcl(3)/N-2 Based Plasma Ren F, Hobson WS, Lothian JR, Lopata J, Pearton SJ, Caballero JA, Cole MW |
3397 - 3404 |
Particle-Size Distribution in a Low-Pressure SiH4-O2-He Chemical-Vapor-Deposition Reactor - Experimental and Numerical Results Whitby E, Hoshino M |
3404 - 3409 |
Improved Within-Wafer Uniformity Modeling Through the Use of Maximum-Likelihood-Estimation of the Mean and Covariance Surfaces Davis JC, Hughesoliver JM, Lu JC, Gyurcsik RS |
3410 - 3427 |
Report of the Electrolytic Industries for the Year 1995 Pillay G, Chen CP |
L223 - L225 |
Determination of Mixtures of Polysulfides by Cyclic Voltammetry Leguillanton G, Do QT, Elothmani D |
L225 - L228 |
Possible Cause of the Memory Effect Observed in Nickel-Cadmium Secondary Batteries Sato Y, Ito K, Arakawa T, Kobayakawa K |
L229 - L231 |
Surface Exchange Properties of Ce0.9Gd0.1O2-X Coated with La1-Xsrxfeyco1-Yo3-Delta Sirman JD, Kilner JA |
L231 - L234 |
Synthesis and Low-Voltage Characteristics of Catio3-Pr Luminescent Powders Cho SH, Yoo JS, Lee JD |
L234 - L235 |
Luminescence of Cs2Nbof5 - Vibrational Structure in (Nbof5)(2-) Luminescence Srivastava AM, Ackerman JF |
L235 - L237 |
A New Potentiometric Sensor for the Detection of Trace Metallic Contaminants in Hydrofluoric-Acid Chyan OM, Chen JJ, Chien HY, Wu JJ, Liu M, Sees JA, Hall LH |
L238 - L240 |
Electrochemical-Behavior of Boron-Doped Diamond Electrodes Vinokur N, Miller B, Avyigal Y, Kalish R |
L241 - L243 |
Sodium-Ion Conductor Based Sensor Attached with NaNO2 for Amperometric Detection of NO2 Miura N, Iio M, Lu GY, Yamazoe N |
L243 - L246 |
The Direct Observation of Grown-in Laser Scattering Tomography Defects in Czochralski Silicon Nishimura M, Yoshino S, Motoura H, Shimura S, Mchedlidze T, Hikone T |
L246 - L248 |
Selective Dry-Etching of III-V Nitrides in Cl-2/Ar, CH4/H-2/Ar, ICI/Ar, and IBr/Ar Vartuli CB, Pearton SJ, Mackenzie JD, Abernathy CR, Shul RJ |