| 4335 - 4338 |
Phase separation tendencies of aluminum-doped transition-metal oxides (LiAl1-xMxO2) in the alpha-NaFeO2 crystal structure
Buta S, Morgan D, Van der Ven A, Aydinol MK, Ceder G |
| 4339 - 4347 |
Electrochemical studies of substituted spinel thin films
Striebel KA, Rougier A, Horne CR, Reade RP, Cairns EJ |
| 4348 - 4353 |
Investigation of ramsdellite titanates as possible new negative electrode materials for Li batteries
Gover RKB, Tolchard JR, Tukamoto H, Murai T, Irvine JTS |
| 4354 - 4359 |
Influence of ionomer content in catalyst layers on direct methanol fuel cell performance
Thomas SC, Ren X, Gottesfeld S |
| 4360 - 4365 |
Double-layer capacitance in a dual lithium ion insertion cell
Ong IJ, Newman J |
| 4366 - 4370 |
A new activation process for a Zr-based alloy as a negative electrode for Ni/MH electric vehicle batteries
Yu JS, Lee H, Lee SM, Lee JY |
| 4371 - 4374 |
Synthesis and lithium intercalation properties of nanocrystalline lithium iron oxides
Kim J, Manthiram A |
| 4375 - 4379 |
Li/beta-VOPO4: A new 4 V system for lithium batteries
Gaubicher J, Le Mercier T, Chabre Y, Angenault J, Quarton M |
| 4380 - 4385 |
Application of a crystallographic index for improvement of the electrolytic properties of the CeO2-Sm2O3 system
Mori T, Ikegami T, Yamamura H |
| 4386 - 4392 |
Stability of AB ' B-1/2 '' O-1/2(3)-type mixed perovskite proton conductors
Bhide SV, Virkar AV |
| 4393 - 4400 |
In situ concentration cartography in the neighborhood of dendrites growing in lithium/polymer-electrolyte/lithium cells
Brissot C, Rosso M, Chazalviel JN, Lascaud S |
| 4401 - 4405 |
The insertion mechanism of lithium into Mg2Si anode material for Li-ion batteries
Kim H, Choi J, Sohn HJ, Kang T |
| 4406 - 4409 |
Solar cell module coated with fluorescent coloring agent
Maruyama T, Bandai J |
| 4410 - 4418 |
Ionic conductivity and electrochemical characterization of novel microporous composite polymer electrolytes
Xu W, Siow KS, Gao ZQ, Lee SY |
| 4419 - 4423 |
The influence of adsorbed oxo-Cr(VI) species on the zeta potential in the porous oxide of anodized aluminum
Kendig M, Addison R, Jeanjaquet S |
| 4424 - 4428 |
The electrochemical characteristics of bulk-synthesized Al2CuMg
Buchheit RG, Montes LP, Martinez MA, Michael J, Hlava PF |
| 4429 - 4438 |
Effects of Nb and Zr alloying additions on the activation behavior of Ti in hydrochloric acid
Yu SY, Brodrick CW, Ryan MP, Scully JR |
| 4439 - 4448 |
Stress-corrosion cracking of low-dielectric-constant spin-on-glass thin films
Cook RF, Liniger EG |
| 4449 - 4454 |
Probing coating degradation on AA2024-T3 using local electrochemical and chemical techniques
Mierisch AM, Yuan J, Kelly RG, Taylor SR |
| 4455 - 4460 |
Atomic force microscopy study of microbiologically influenced corrosion of mild steel
Xu LC, Fang HHP, Chan KY |
| 4461 - 4472 |
Influence of dichromate ions on corrosion of pure aluminum and AA2024-T3 in NaCl solution studied by AFM scratching
Schmutz P, Frankel GS |
| 4473 - 4476 |
A kinetic study of direct copper plating via Pd catalyst and S ligand
Yang CH, Wang YY, Wan CC |
| 4477 - 4484 |
Control of composition and conduction type of CdTe film electrodeposited from ammonia alkaline aqueous solutions
Murase K, Watanabe H, Mori S, Hirato T, Awakura Y |
| 4485 - 4489 |
Alternatives to hydrogen fluoride for photoelectrochemical etching of silicon
Rieger MM, Flake JC, Kohl PA |
| 4490 - 4498 |
Nucleation and adhesion of diamond films on Co cemented tungsten carbide
Polini R, Santarelli M, Traversa E |
| 4499 - 4503 |
Transport phenomena that control electroplated copper filling of submicron vias and trenches
Takahashi KM, Gross ME |
| 4504 - 4513 |
Investigation of electrocodeposition using a rotating cylinder electrode
Stojak JL, Talbot JB |
| 4514 - 4516 |
A study of hydrogen evolution at irradiated p-InP electrodes in nitric acid solutions
Quinlan KP |
| 4517 - 4521 |
Preparation of transparent and conductive zinc oxide films by optimization of the two-step electrolysis technique
Izaki M |
| 4522 - 4525 |
Preparation of ultrathin layers of polythiophene covalently bonded to silicon
Fikus A, Plieth W, Appelhans D, Ferse D, Adler HJ, Adolphi B, Schmitt FJ |
| 4526 - 4534 |
Electrolytic preparation of isotopically enriched hard chromium layers on gold backings for nuclear reaction studies
Klein ATJ, Rosch F, Qaim SM |
| 4535 - 4538 |
Comparison of chemically and electrochemically synthesized polyaniline films
Hatchett DW, Josowicz M, Janata J |
| 4539 - 4543 |
Use of an acidic Fe/O-2 cell for wastewater treatment: Degradation of aniline
Brillas E, Sauleda R, Casado J |
| 4544 - 4550 |
In situ optoelectrochemical approach for the dynamic property study of polypyrrole thin film by quartz crystal combined with UV-visible advanced design
Kim JM, Chang SM, Muramatsu H |
| 4551 - 4558 |
The influence of surface interactions on the reversibility of ferri/ferrocyanide at boron-doped diamond thin-film electrodes
Granger MC, Swain GM |
| 4559 - 4564 |
The adsorption behavior of a rutheninm-based sensitizing dye to nanocrystalline TiO2 - Coverage effects on the external and internal sensitization quantum yields
Fillinger A, Parkinson BA |
| 4565 - 4568 |
Compatibility of the low-dielectric-constant poly(arylether) with the electroless copper deposition solution
Hsu DT, Iskandar M, Shi FG, Lopatin S, Shacham-Diamand Y, Tong HY, Zhao B, Brongo M, Vasudev PK |
| 4569 - 4579 |
Differential thermal analysis of glass mixtures containing SiO2, GeO2, B2O3, and P2O5
Croswell RT, Reisman A, Simpson DL, Temple D, Williams CK |
| 4580 - 4585 |
Reactions in the system O-2-NO-SiO2 in a conventional furnace -I. Oxygen exchange reactions
Akermark T, Ganem JJ, Trimaille I, Rigo S |
| 4586 - 4589 |
Reactions in the system O-2-NO-SiO2 in a conventional furnace -II. Chemical reactions between O-2 and NO
Akermark T, Ganem JJ, Trimaille I, Rigo S |
| 4590 - 4596 |
Thermal decomposition of low dielectric constant pulsed plasma fluorocarbon films - I. Effect of precursors and substrate temperature
Cruden B, Chu K, Gleason K, Sawin H |
| 4597 - 4604 |
Thermal decomposition of low dielectric constant pulsed plasma fluorocarbon films - II. Effect of postdeposition annealing and ambients
Cruden B, Chu K, Gleason K, Sawin H |
| 4605 - 4610 |
Selective area excimer-laser crystallization of amorphous silicon thin films
Viatella J, Lee SM, Singh RK |
| 4611 - 4618 |
Properties of Si1-x-yGexCy epitaxial films grown by ultrahigh vacuum chemical vapor deposition
John S, Quinones EJ, Ferguson B, Ray SK, Anantharam B, Middlebrooks S, Mullins CB, Ekerdt J, Rawlings J, Banerjee SK |
| 4619 - 4625 |
Validation of a large area three-dimensional erosion simulator for chemical mechanical polishing
Runnels SR, Miceli F, Kim I |
| 4626 - 4629 |
Fluorine incorporation effects in Cl-2 plasma etching of silicon: Quadrupole mass spectrometer analysis
Kang SY, Lee SK, Lee HJ, Kwon KH, Choi BG, Song YH, Lee JH, Cho KI |
| 4630 - 4633 |
Oxidation behavior of nitrogen implanted dichlorosilane-based W-polycide gate
Kim HS, Yeo IS, Lee SM, Lee SD, Lee SK |
| 4634 - 4639 |
The effect of the nucleation temperature on the variation of the microstructure of Czochralski silicon after two- and three-step anneals
Kung CY, Tsuy FC, Lee HM |
| 4640 - 4646 |
Surface recombination velocity from photocurrent measurements -Validation and applications
Polignano ML, Bellafiore N, Caputo D, Caricato AP, Modelli A, Zonca R |
| 4647 - 4653 |
Chemical mechanical polishing of Al and SiO2 thin films: The role of consumables
Hernandez J, Wrschka P, Hsu Y, Kuan TS, Oehrlein GS, Sun HJ, Hansen DA, King J, Fury MA |
| 4654 - 4658 |
Control of Y2O3 : Eu spherical particle phosphor size, assembly properties, and performance for FED and HDTV
Jing X, Ireland T, Gibbons C, Barber DJ, Silver J, Vecht A, Fern G, Trowga P, Morton DC |
| 4659 - 4665 |
Bifurcation analysis of thermal runaway in microwave heating of ceramics
Gupta N, Midha V, Balakotaiah V, Economou DJ |
| 4666 - 4671 |
Influence of the composition on the copper diffusion in copper sulfides - Study by impedance spectroscopy
Cassaignon S, Sanchez S, Guillemoles JF, Vedel J, Meier HG |
| 4672 - 4675 |
Oxygen self-diffusion in cylindrical single-crystal mullite
Ikuma Y, Shimada E, Sakano S, Oishi M, Yokoyama M, Nakagawa ZE |
| 4676 - 4676 |
Report on the electrolytic industries for the year 1998 (vol 146, pg 3924, 1999)
Mah DT, Weidner JW, Motupally S |
| 4676 - 4676 |
Transport phenomena in chemical mechanical polishing (vol 146, pg 4263, 1999)
Subramanian RS, Zhang L, Babu SV |
