Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.144, No.2 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (66 articles)

399 - 408	Composite Electrolytes Prepared from Fumed Silica, Polyethylene Oxide Oligomers, and Lithium Salk Fan J, Fedkiw PS
408 - 417	Electrochemically Active Licoo2 and LiNiO2 Made by Cationic Exchange Under Hydrothermal Conditions Larcher D, Palacin MR, Amatucci GG, Tarascon JM
418 - 423	The Migration of Fluoride Ions in Growing Anodic Oxide-Films on Tantalum Shimizu K, Kobayashi K, Thompson GE, Skeldon P, Wood GC
423 - 428	Direct Methanol Oxidation on Platinum-Electrodes with Ruthenium Adatoms in Hot Phosphoric-Acid Watanabe M, Genjima Y, Turumi K
428 - 436	An Attempt to Quantify Electrodeposit Metallographic Growth Structures Winand R, Vanham P, Colin R, Milojevic D
436 - 442	Use of Polyaniline and Its Derivatives in Corrosion Protection of Copper and Silver Brusic V, Angelopoulos M, Graham T
443 - 449	In-Situ Conductivity Study of the Corrosion Layers on Lead-Tin Alloy in Sulfuric-Acid Mattesco P, Bui N, Simon P
450 - 454	Cathodic Protection of a Plane with Parallel Cylindrical Anodes Newman J
455 - 460	Electrochemical Fabrication of Sharp Nickel Tips in H2SO4 Solutions Nikolova MS, Natarajan A, Searson PC, Chakarova GS, Macaulay JM
461 - 466	Morphology and Structure of Water-Formed Oxides on Ternary Mgal Alloys Nordlien JH, Nisancioglu K, Ono S, Masuko N
466 - 470	Shape Evolution of Electrodeposited Copper Bumps with High Peclet Numbers Kondo K, Fukui K, Yokoyama M, Shinohara K
471 - 476	Fabrication of Nickel Microbump on Aluminum Using Electroless Nickel-Plating Watanabe H, Honma H
477 - 481	Electrochromism of Polyaniline Film Incorporating a Red Quinone 1-Amino-4-Bromoanthraquinone-2-Sulfonate Yano J
481 - 484	Atomic-Force Microscopy Study of Surface-Morphology of Zinc-Iron Electrodeposits Czerwinski F, Kondo K, Szpunar JA
485 - 493	Electrochemical and in-Situ Raman-Spectroscopic Characterization of Nickel-Hydroxide Electrodes Kostecki R, Mclarnon F
493 - 496	In-Situ Monitoring of Electrochemical Processes at the (100)P-Si/Aqueous NH4(F) Electrolyte Interface by Photoluminescence Rappich J, Timoshenko VY, Dittrich T
497 - 502	Manifestation of Photocatalysis Process Variables in a Titanium Dioxide-Based Slurry Photoelectrochemical Cell Lin WY, Detacconi NR, Smith RL, Rajeshwar K
503 - 510	A Mathematical-Model for Predicting Nonuniform Electrochemical Impregnation of Nickel-Hydroxide Nagarajan GS, Ho CH, Vanzee JW
511 - 519	Studies of the Hydrogen Evolution Reaction an Ni-P Electrodes Shervedani RK, Lasia A
520 - 524	Synthesis of Nanocrystalline VO2 and Its Electrochemical-Behavior in Lithium Batteries Tsang C, Manthiram A
524 - 532	A Stable Thin-Film Lithium Electrolyte - Lithium Phosphorus Oxynitride Yu XH, Bates JB, Jellison GE, Hart FX
532 - 539	Electrochemical-Behavior of Molten V2O5-K2S2O7-Khso4 Systems Petrushina IM, Bjerrum NJ, Berg RW, Cappeln F
539 - 545	Electrocatalytic Formation of CH4 from CO2 on a Pt Gas-Diffusion Electrode Hara K, Sakata T
546 - 553	Semiconductor Electrochemistry of Particulate Pyrite - Mechanisms and Products of Dissolution Wei DW, Osseoasare K
554 - 557	A Cell for in-Situ X-Ray-Diffraction Based on Coin Cell Hardware and Bellcore Plastic Electrode Technology Richard MN, Koetschau I, Dahn JR
558 - 566	Oxide Film Formation at a Microcrystalline Al-Alloy in Room-Temperature Neutral Borate Solution Thomas SC, Birss VI
566 - 572	Electrochemical-Behavior of Sol-Gel Produced Ni and Ni-Co Oxide-Films Serebrennikova I, Birss VI
573 - 581	Activation of Ruthenium Oxide, Iridium Oxide, and Mixed Ruxir1-X Oxide Electrodes During Cathodic Polarization and Hydrogen Evolution Blouin M, Guay D
582 - 585	Reaction-Zone Expansions and Mechanism of the O-2, Ag/Yttria-Stabilized Zirconia Electrode-Reaction Jimenez R, Kloidt T, Kleitz M
586 - 594	Investigations of Thiosulfate Accumulation on 304-Stainless-Steel in Neutral Solutions by Radioactive Labeling, Electrochemistry, Auger-Electron and X-Ray Photoelectron-Spectroscopy Methods Thomas AE, Kolics A, Wieckowski A
595 - 599	Tungsten-Oxide Thin-Films Chemically Vapor-Deposited at Low-Pressure by W(Co)(6) Pyrolysis Davazoglou D, Moutsakis A, Valamontes V, Psycharis V, Tsamakis D
600 - 605	Observation of Defects in Thermal Oxides of Polysilicon by Transmission Electron-Microscopy Using Copper Decoration Itsumi M, Akiya H, Tomita M, Ueki T, Yamawaki M
605 - 616	Nanoscale Lithography of Silicon Dioxide Using Electron-Beam Patterned Carboxylic-Acids as Localized Etch Initiators Whidden TK, Yang SJ, Jenkinsgray A, Pan M, Kozicki MN
617 - 621	Optimization of Photocurable Polyurethane Membrane-Composition for Ammonium Ion Sensor Bratov A, Abramova N, Munoz J, Dominguez C, Alegret S, Batroli J
622 - 627	Structural Quality of Directly Bonded Silicon-Wafers with Regularly Grooved Interfaces Kim ED, Kim SC, Park JM, Grekhov IV, Argunova TS, Kostina LS, Kudryavtzeva TV
627 - 633	Effects of Bromine-Methanol and Hydrogen-Chloride Pretreatments on Pt/Al/N-InP Diodes Huang WC, Lei TF, Lee CL
634 - 640	Kinetics of Power Deposition and Silane Dissociation in Radiofrequency Discharges Spiliopoulos N, Mataras D, Rapakoulias DE
641 - 646	Configurational and Electrical Behavior of Ni-YSZ Cermet with Novel Microstructure for Solid Oxide Fuel-Cell Anodes Itoh H, Yamamoto T, Mori M, Horita T, Sakai N, Yokokawa H, Dokiya M
647 - 652	Spectral Shifts of Electroluminescence from Porous N-Si Under Cathodic Bias Lim JE, Chae WS, Lee Y, Kim KJ
652 - 657	The Prevention of Si Pitting in Hydrofluoric-Acid Cleaning by Additions of Hydrochloric-Acid Chung BC, Marshall GA, Pearce CW, Yanders KP
658 - 663	Use of Sibn and Sibon Films Prepared by Plasma-Enhanced Chemical-Vapor-Deposition from Borazine as Interconnection Dielectrics Kane WF, Cohen SA, Hummel JP, Luther B, Beach DB
664 - 669	Rapid Thermal-Process for Enhancement of Collimated Titanium Nitride Barriers Kim SD, Jin SG, Hong MR, Kim CT
669 - 673	Importance of High-Energy Photons in the Curing of Spin-on Low Dielectric-Constant Interconnect Materials Sharangpani R, Cherukuri KC, Singh R
674 - 678	Control of N-Type Dopant Transitions in Low-Temperature Silicon Epitaxy Kamins TI, Lefforge D
679 - 682	Analysis of Silicon Surface in Connection with Its Unique Electrochemical and Etching Behavior Fukidome H, Ohno T, Matsumura M
683 - 686	Field-Aided Thermal Chemical-Vapor-Deposition of Copper Using Cu(I) Organometallic Precursor Lee WJ, Rha SK, Lee SY, Park CO
687 - 694	Cerium Concentration and Temperature-Dependence of the Luminescence of Srga2S4-Ce,Na, a Blue-Emitting Material for Electroluminescent and High-Current Density Cathodoluminescent Displays Ronotlimousin I, Garcia A, Fouassier C, Barthou C, Benalloul P, Benoit J
694 - 697	Initial Growth-Processes in the Epitaxy of Ge and GeH4 on Oxidized Si Substrates Angermeier D, Kuhn WS, Druihle R, Ballutaud D, Triboulet R
698 - 704	Quantitative Study of Charge-to-Breakdown of Thin Gate Oxide for a P(+)-Poly-Si Metal-Oxide-Semiconductor Capacitor Wang LS, Lin MS
704 - 707	Thin-Film Energy-Controlled Variable Color Cathodoluminescent Screens Bondar VD, Grytsiv MY, Groodzinsky AS, Vasyliv MY, Chakhovskoi AG, Hunt CE, Malinowski ME, Felter TE
708 - 717	Physical Models of Boron-Diffusion in Ultrathin Gate Oxides Fair RB
717 - 720	Chemical Compatibility of (La0.6Ca0.4)(X)Fe(0.8)M(0.2)O(3) with Yttria-Stabilized Zirconia Kindermann L, Das D, Nickel H, Hilpert K, Appel CC, Poulson FW
721 - 732	Radio-Frequency Diagnostics for Plasma Etch Systems Bushman S, Edgar TF, Trachtenberg I
732 - 736	Photoreflectance Study of the Long-Term Stability of Various Surface Chemical Treatments on (001)N-GaAs Geisz JF, Safvi SA, Kuech TF
736 - 742	Characterization of KtiOPO4 Thin-Films Grown by Spray-Pyrolysis Golego N, Cocivera M
742 - 748	Organic Electroluminescence Device Based on an Electrodeposited Poly(3-Substituted Thiophene) Film Osaka T, Komaba S, Fujihana K, Okamoto N, Momma T, Kaneko N
749 - 753	Trap Generation in Buried Oxides of Silicon-on-Insulator Structures by Vacuum-Ultraviolet Radiation Afanasev VV, Stesmans A, Revesz AG, Hughes HL
753 - 758	Rapid Thermal-Processing of Semiconductor Wafers - An Optimized Approach Using Gas Conduction in the Molecular Regime Daviet JF
758 - 764	Electrical Characterization of Highly Reliable 8 nm Oxide Ghidini G, Alessandri M, Clementi C, Drera D, Pellizzer F
764 - 772	A Numerical Study of the Effects of Electromagnetic Stirring on the Distributions of Temperature and Oxygen Concentration in Silicon Double-Crucible Czochralski Processing Ono N, Trapaga G
L15 - L17	Reexamination of Pressure and Speed Dependences of Removal Rate During Chemical-Mechanical Polishing Processes Tseng WT, Wang YL
L17 - L19	Potentiometric Investigation of Silicon Electrode Immersed in Alkaline Hydrogen-Peroxide Solution Containing Trace-Level of Iron Chyan OM, Chen JJ, Chen LG, Xu F
L20 - L22	Effect of Electrolyte-Composition on the Performance of Sodium/Polymer Cells Doeff MM, Ferry A, Ma YP, Ding L, Dejonghe LC
L23 - L26	Membrane-Supported Nonvolatile Acidic Electrolytes Allow Higher Temperature Operation of Proton-Exchange Membrane Fuel-Cells Malhotra S, Datta R
L27 - L28	Lipophilic Ionic Sites for Solvent Polymeric Membrane pH Electrodes Based on 4’,5’-Dibromofluorescein Octadecylester as Electrically Charged Carrier Mi YM, Bakker E
L29 - L31	Analysis of GaAs Substrate Removal Etching with Citric Acid-H2O2 and Nh4Oh-H2O2 for Application to Compliant Substrates Cartercoman C, Bicknelltassius R, Benz RG, Brown AS, Jokerst NM