D1 - D3 |
Electroreduction of benznidazole in dimethylsulfoxide Arguelho MLPM, Silva GM, Stradiotto NR |
D4 - D8 |
An alkene-NOx cell for the wacker-type oxidation of alkenes Otsuka K, Yamanaka I, Nishi A |
D9 - D17 |
Electrochemical synthesis of a polyaniline-based conducting copolymer with -S-S-links Wen TC, Huang LM, Gopalan A |
F9 - F11 |
Nonuniform distribution of trapped charges in electron injection stressed SiO2 films Yamabe K, Liao K, Minemura H, Murata M |
H7 - H12 |
Electrochromism of mixed tungsten-vanadium oxide thin films grown by pulsed laser deposition Rougier A, Blyr A, Quede A |
J1 - J6 |
Reactor flush time correction in relaxation experiments den Otter MW, Bouwmeester HJM, Boukamp BA, Verweij H |
B59 - B67 |
Thermodynamic analysis of silica refractory corrosion in glass-melting furnaces Allendorf MD, Spear KE |
B68 - B78 |
Influence of niobium and zirconium alloying additions on the anodic dissolution behavior of activated titanium in HCl solutions Yu SY, Scully JR, Vitus CM |
B79 - B85 |
Kinetic and magic angle spinning-nuclear magnetic resonance studies of dry oxidation of beta-sialon powders Kiyono H, Shimada S |
B86 - B91 |
Kinetic and magic angle spinning-nuclear magnetic resonance studies of wet oxidation of beta-sialon powders Kiyono H, Shimada S, MacKenzie KJD |
B92 - B100 |
Positron annihilation spectroscopy study of interfacial defects formed by dissolution of aluminum in aqueous sodium hydroxide Hebert KR, Wu HQ, Gessmann T, Lynn K |
C71 - C80 |
Electroless plating of copper and nickel on surface-modified poly(tetrafluoroethylene) films Zhang MC, Kang ET, Neoh KG, Tan KL |
C81 - C87 |
Stability of sputter-deposited amorphous Mn-Ta alloys in chloride-free and chloride-containing H2SO4 solutions Ismail KM, El-Moneim AA, Badawy WA |
C88 - C94 |
Electrodeposition of silver aluminum alloys from a room-temperature chloroaluminate molten salt Zhu Q, Hussey CL, Stafford GR |
C95 - C101 |
Copper electrodeposition and dissolution on tetrahedral amorphous carbon incorporating nitrogen Yoo K, Miller B, Shi X, Kalish R |
E61 - E65 |
Cation capturing ability and the potential response of a poly(o-aminophenol) film electrode to dissolved ferric ions Yano J, Kawakami H, Yamasaki S, Kanno Y |
E66 - E72 |
Lead dioxide deposition and electrocatalysis at highly boron-doped diamond electrodes in the presence of ultrasound Saterlay AJ, Wilkins SJ, Holt KB, Foord JS, Compton RG, Marken F |
E73 - E78 |
Theoretical analysis of the pulse-clamp method as applied to neural stimulating electrodes Stefan IC, Tolmachev YV, Nagy Z, Minkoff M, Merrill DR, Mortimer JT, Scherson DA |
E79 - E84 |
Investigation of hydrophobicity/hydrophilicity transitions with an electrochemical quartz crystal microbalance Jeffrey M, Woods R |
E85 - E91 |
The effect of doping with Ti(IV) and Sn(IV) on oxygen reduction at hematite electrodes Balko BA, Clarkson KM |
E92 - E96 |
Limiting current density on a line electrode in impinging slot-jet flows Chalupa R, Chen MY, Modi V, West AC |
E97 - E104 |
Dependence of the voltammetric oxidation of the photovoltaic sensitizer [(H-3-tctpy)Ru-II(NCS)(3)](-) on the electrode material, solvent, and isomeric purity Wolfbauer G, Bond AM, Deacon GB, Howitt J, MacFarlane D, Spiccia L |
F12 - F20 |
The use of infrared spectroscopic ellipsometry for the thickness determination and molecular characterization of thin films on aluminum Schram T, Terryn H |
F21 - F25 |
Application of charge-based capacitance measurement technique in characterization of hydrogen silsesquioxane Siew YK, Sarkar G, Hu X, Lee LP, Chan L, See A |
F26 - F29 |
Structural and optical characteristics of gallium oxide thin films deposited by ultrasonic spray pyrolysis Ortiz A, Alonso JC, Andrade E, Urbiola C |
F30 - F34 |
Improvement in integration issues for organic low-k hybrid-organic-siloxane-polymer Liu PT, Chang TC, Su H, Mor YS, Yang YL, Chung H, Hou J, Sze SM |
F35 - F41 |
Development of dielectric properties of niobium oxide, tantalum oxide, and aluminum oxide based nanolayered materials Kukli K, Ritala M, Leskela M |
G25 - G28 |
Comparison of dry and wet etch processes for patterning SiO2/TiO2 distributed Bragg reflectors for vertical-cavity surface-emitting lasers Dang G, Cho H, Ip KP, Pearton SJ, Chu SNG, Lopata J, Hobson WS, Chirovsky LMF, Ren F |
G29 - G35 |
Characterization of Gd2O3 films deposited on Si(100) by electron-beam evaporation Landheer D, Gupta JA, Sproule GI, McCaffrey JP, Graham MJ, Yang KC, Lu ZH, Lennard WN |
G36 - G42 |
Crystal surface defects and oxygen gettering in thermally oxidized bonded SOI wafers Papakonstantinou P, Somasundram K, Cao X, Nevin WA |
G43 - G49 |
Arsenic redistribution during rapid thermal chemical vapor deposition of TiSi2 on Si Fang H, Ozturk MC, O'Neil PA, Seebauer EG |
G50 - G54 |
Effects of Ge content on the oxidation behavior of poly-Si1-xGex layers for gate electrode application Ahn TH, Yee IS, Kim TK, Joo MS, Kim HS, Kim JJ, Joung JH, Park JW |
G55 - G58 |
Negative bias dependence of sulfur and fluorine incorporation in diamond films etched by an SF6 plasma Teii K, Hori M, Goto T |
G59 - G62 |
Highly selective photoresist ashing by addition of ammonia to plasma containing carbon tetrafluoride Saito M, Eto H, Omiya K, Homma T, Nagatomo T |
G63 - G67 |
The effects of surface capping during annealing on the microstructure of ultrathin SIMOX materials Johnson B, Tan Y, Anderson P, Seraphin S, Anc MJ |
G68 - G72 |
Use of selective anodic bonding to create micropump chambers with virtually no dead volume Veenstra TT, Berenschot JW, Gardeniers JGE, Sanders RGP, Elwenspoek MC, van den Berg A |
G73 - G77 |
Modeling and characterization of tungsten chemical and mechanical polishing processes Zabasajja J, Merchant T, Ng B, Banerjee S, Green D, Lawing S, Kura H |
G78 - G81 |
Evolution of the Cu-Al alloy/SiO2 interfaces during bias temperature stressing Wang PI, Murarka SP, Yang GR, Lu TM |
G82 - G90 |
Modeling of silicon dioxide chemical vapor deposition from tetraethoxysilane and ozone Romet S, Couturier MF, Whidden TK |
G91 - G94 |
A rugged oxygen gas sensor with solid reference for high temperature applications Chowdhury AKMS, Akbar SA, Kapileshwar S, Schorr JR |
H13 - H16 |
Optical and structural characterization of erbium-doped TiO2 xerogel films processed on porous anodic alumina Gaponenko NV, Sergeev OV, Stepanova EA, Parkun VM, Mudryi AV, Gnaser H, Misiewicz J, Heiderhoff R, Balk LJ, Thompson GE |
H17 - H20 |
Characteristics of diamond film gas sensors upon exposure to semiconductor doping gases Hayashi K, Yokota Y, Tachibana T, Kobashi K, Fukunaga T, Takada T |
A121 - A125 |
A photorechargeable metal hydride/air battery Akuto K, Sakurai Y |
A126 - A131 |
Dependence of SOFC cathode degradation by chromium-containing alloy on compositions of electrodes and electrolytes Matsuzaki Y, Yasuda I |
A132 - A136 |
Investigation of the inner structures of ZEBRA cells with a microtomograph Steinbock L, Dustmann CH |
A137 - A148 |
Nuclear magnetic resonance and voltammetry studies of carbon monoxide adsorption and oxidation on a carbon-supported platinum fuel cell electrocatalyst Rush BM, Reimer JA, Cairns EJ |
A149 - A155 |
Photoelectrochemical properties of nano- to microstructured ZnO electrodes Keis K, Vayssieres L, Rensmo H, Lindquist SE, Hagfeldt A |
A156 - A163 |
Conducting polymer with metal oxide for electrochemical capacitor - Poly(3,4-ethylenedioxythiophene) RuOx electrode Hong JI, Yeo IH, Paik WK |
A164 - A170 |
A high-rate, high-capacity, nanostructured Sn-based anode prepared using sol-gel template synthesis Li NC, Martin CR |
A171 - A182 |
Failure mechanism and improvement of the elevated temperature cycling of LiMn2O4 compounds through the use of the LiAlxMn2-xO4-zFz solid solution Amatucci GG, Pereira N, Zheng T, Tarascon JM |
B101 - B109 |
Atomic force microscopy study of anodic etching of aluminum -Etching morphology development and caustic pretreatment Martin T, Hebert KR |
C102 - C105 |
Electrochemical behavior of silver in 1-ethyl-3-methylimidazolium tetrafluoroborate molten salt Katayama Y, Dan S, Miura T, Kishi T |
C106 - C109 |
Composite plating of Ni/SiC using a cationic surfactant with an azobenzene group Shrestha NK, Miwa I, Saji T |
C110 - C118 |
Electrochemical quartz crystal microbalance study of the electrodeposition mechanisms of CuInSe2 thin films Kemell M, Saloniemi H, Ritala M, Leskela M |
C119 - C123 |
The electrochemical deposition of nanostructured cobalt films from lyotropic liquid crystalline media Bartlett PN, Birkin PN, Ghanem MA, de Groot P, Sawicki M |
C124 - C130 |
Localized electrodeposition using a scanning tunneling microscope tip as a nanoelectrode Schindler W, Hofmann D, Kirschner J |