화학공학소재연구정보센터

Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.151, No.3 Entire volume, number list
ISSN: 0013-4651 (Print) 

In this Issue (70 articles)

K1 - K11 Batteries, 1977 to 2002
Brodd RJ, Bullock KR, Leising RA, Middaugh RL, Miller JR, Takeuchi E
E85 - E91 Theory for the potential shift for OHads formation on the Pt skin on Pt3Cr(111) in acid
Roques RM, Anderson AB
E92 - E96 Underpotentially deposited layers of Bi on Au-(100) in HClO4 investigated by in situ STM
Hara M, Nagahara Y, Yoshimoto S, Inukai J, Itaya K
E97 - E101 In situ distance Tunneling Spectroscopy at Au-(111)/0.02 M HClO4 - From Faradaic regime to quantized conductance channels
Hugelmann M, Schindler W
F37 - F44 Organosilicate spin-on glasses - I. Effect of chemical modification on mechanical properties
Kim S, Toivola Y, Cook RF, Char K, Chu SH, Lee JK, Yoon DY, Rhee HW
F45 - F53 Organosilicate spin-on glasses - II. Effect of physical modification on mechanical properties
Toivola Y, Kim S, Cook RF, Char K, Lee JK, Yoon DY, Rhee HW, Kim SY, Jin MY
F54 - F58 Dielectric permittivity and intercalation parameters of Li ion intercalated atomic layer deposited ZrO2
Jonsson AK, Niklasson GA, Ritala M, Leskela M, Kukli K
F59 - F67 Electrical and physical characterization of zirconium-doped tantalum oxide thin films
Tewg JY, Kuo Y, Lu J, Schueler BW
H53 - H58 Development of a wide range pH sensor based on electrolyte-insulator-semiconductor structure with corrosion-resistant Al2O3-Ta2O5 and Al2O3-ZrO2 double-oxide thin films
Yoshida S, Hara N, Sugimoto K
H59 - H65 Fabrication, characterization, and thermal failure analysis of a micro hot plate chemical sensor substrate
Weiller BH, Fuqua PD, Osborn JV
H66 - H68 Fine control of the dopant level in cubic Y2O3 : Eu3+ phosphors
Silver J, Ireland TG, Withnall R
H69 - H73 Morphology control and optimization of luminescent property of YBO3 : Tb phosphor particles prepared by spray pyrolysis
Jung KY, Kim EJ, Kang YC
J21 - J25 Low-resistance silicon-germanium contact technology for modular integration of MEMS with electronics
Eyoum MA, King TJ
A341 - A353 Water management in PEM fuel cells
Berg P, Promislow K, St Pierre J, Stumper J, Wetton B
A354 - A357 Preparation of gas diffusion electrodes by electrophoretic deposition
Hayashi K, Furuya N
A358 - A367 Electron transport in PEFCs
Meng H, Wang CY
A368 - A373 Vanadium oxide films synthesized by CVD and used as positive electrodes in secondary lithium batteries
Mantoux A, Groult H, Balnois E, Doppelt P, Gueroudji L
A374 - A380 Structural and electrochemical properties of the La0.7Mg0.3Ni2.975-xCo0.525Mnx hydrogen storage electrode alloys
Pan HG, Liu YF, Gao MX, Zhu YF, Lei YQ, Wang QD
A381 - A388 Influence of ammonium on conductivity and water content of Nafion 117 membranes
Halseid R, Vie PJS, Tunold R
A389 - A393 Effect of La addition on the electrochemical properties of secondary zinc electrodes
Yang HB, Meng XL, Yang ED, Wang XD, Zhou ZX
A394 - A398 An approach to measuring locally resolved currents in polymer electrolyte fuel cells
Geiger AB, Eckl R, Wokaun A, Scherera GG
A399 - A406 Liquid water transport in gas diffusion layer of polymer electrolyte fuel cells
Pasaogullari U, Wang CY
A407 - A412 Hole and electron conductivities of 20 mol %-REO1.5 doped CeO2 (RE = Yb, Y, Gd, Sm, Nd, La)
Xiong YP, Yamaji K, Horita T, Sakai N, Yokokawa H
A413 - A417 Evaluation of the experimental model for methanol crossover in DMFCs
Drake JA, Wilson W, Killeen K
A418 - A421 Direct internal reforming characteristics of SOFC with a thin SASZ electrolyte and a LNF cathode
Tabata Y, Orui H, Watanabe K, Chiba R, Arakawa M, Yamazaki Y
A422 - A426 Thermodynamics of lithium intercalation into graphites and disordered carbons
Reynier YF, Yazami R, Fultz B
A427 - A436 Characterization of lithium electrode in lithium imides/ethylene carbonate, and cyclic ether electrolytes - I. Surface morphology and lithium cycling efficiency
Ota H, Wang XM, Yasukawa E
A437 - A446 Characterization of lithium electrode in lithium imides/ethylene carbonate and cyclic ether electrolytes - II. Surface chemistry
Ota H, Sakata Y, Wang XM, Sasahara J, Yasukawa E
A447 - A451 Effective utilization of nanospaces in activated carbon for enhancing catalytic activity in fuel cell electrodes
Maruyama J, Abe I
A452 - A455 Structural evolution and stability of RF sputter deposited LixMn2-yO4 thin film cathodes
Chiu KF, Hsiao HH, Chen GS, Liu HL, Her JL, Lin HC
A456 - A462 Solvent diffusion model for aging of lithium-ion battery cells
Ploehn HJ, Ramadass P, White RE
A463 - A469 Trilayer membranes with a methanol-barrier layer for DMFCs
Si YC, Lin JC, Kunz HR, Fenton JM
A470 - A483 Electrochemical and in situ XRD studies of the Li reaction with combinatorially sputtered Mo1-xSnx (0 <= x <= 0.50) thin films
Bonakdarpour A, Hewitt KC, Turner RL, Dahn JR
A484 - A492 Suppression of structural fatigue by doping in spinel electrode probed by in situ bending beam method
Chung KY, Yoon WS, Kim KB, Yang XQ, Oh SM
B105 - B113 Investigation of filiform corrosion of epoxy-coated 1045 carbon steel by scanning Kelvin probe force microscopy
Leblanc PP, Frankel GS
B114 - B123 Mass-transfer enhancement in large-diameter pipeline under water/gas stationary slug flow
Wang HW, Dewald HD, Jepson WP
B124 - B133 Origins of electrochemical noise during pitting corrosion of aluminum
Sasaki K, Isaacs HS
B134 - B140 Algorithm for extracting corrosion parameters from the response of the steel-concrete system to a current pulse
Feliu V, Gonzalez JA, Feliu S
B141 - B150 Effect of water-vapor-induced Cr vaporization on the oxidation of austenitic stainless steels at 700 and 900 degrees C - Influence of Cr/Fe ratio in alloy and Ce additions
Asteman H, Svensson JE, Johansson LG
B151 - B159 Interactions of the components of chromate conversion coating with the constituents of aluminum alloy AA2024-T3
Chidambaram D, Clayton CR, Halada GP
B160 - B164 Synchrotron radiation based grazing angle infrared Spectroscopy of chromate conversion coatings formed on aluminum alloys
Chidambaram D, Halada GP, Clayton CR
B165 - B171 In situ studies of filiform corrosion of iron
Weissenrieder J, Leygraf C
B172 - B178 Use of quantum chemistry results in 3D modeling of corrosion of iron-chromium alloys
Diawara B, Legrand M, Legendre JJ, Marcus P
B179 - B187 Electrochemical studies of AC/DC anodized Mg alloy in NaCl solution
Xia SJ, Yue R, Rateick RG, Birss VI
B188 - B194 Effect of heat-treatment on characteristics of anodized aluminum oxide formed in ammonium adipate solution
Chang JK, Lin CM, Liao CM, Chen CH, Tsai WT
B195 - B205 Influence of nanothick layers of DLC on the rates of electrochemical reduction reactions on magnetic hard disks
Jung SY, Devine TM
C155 - C160 Study of the electrodeposition of rhodium on polycrystalline gold electrodes by quartz microbalance and voltammetric techniques
Langerock S, Heerman L
C161 - C167 Electrodeposition of ZnTe film with high current efficiency at low overpotential from a citric acid bath
Ishizaki T, Ohtomo T, Fuwa A
C168 - C175 Comparison of microstructures of CdTe layers electrodeposited from basic ammoniacal and acidic sulfate electrolytes
Miyake M, Inui H, Murase K, Hirato T, Awakura Y
C176 - C181 Growth of (Ti, Zr)N films on Si by DC reactive sputtering of TiZr in N2/Ar gas mixtures - Effect of flow ratio
Kuo YL, Lee C, Lin JC, Peng CH, Chen LC, Hsieh CH, Shue SL, Liang MS, Daniels BJ, Huang CL, Lai CH
C182 - C186 Investigation of CVD processes to perform dense alpha-alumina coating on superalloys
Bahlawane N, Blittersdorf S, Kohse-Hoinghaus K, Atakan B, Muller J
C187 - C193 Zirconium behavior in molten LiCl-KCl eutectic
Sakamura Y
C194 - C199 Kinetics of two-phase electrocrystallization processes - II. Generalized form of the transients
Abyaneh MY
C200 - C203 A method for copper film deposition with Cl-2 plasma
Sakamoto H, Ogura Y, Ooba Y, Nishimori T, Yahata N
C204 - C209 Effect of acidity on defectivity and film properties of electroplated copper films
Lee DW, Pyo SG, Ko CJ, Lee MH, Kim S, Lee JG
C210 - C214 Single-source chemical vapor deposition of 3C-SiC films in a LPCVD reactor - I. Growth, structure, and chemical characterization
Wijesundara MBJ, Valente G, Ashurst WR, Howe RT, Pisano AP, Carraro C, Maboudian R
C215 - C219 Single-source CVD of 3C-SiC films in a LPCVD reactor - II. Reactor modeling and chemical kinetics
Valente G, Wijesundara MBJ, Maboudian R, Carraro C
C220 - C228 Effect of potential on the early stages of nucleation and growth during silver electrocrystallization in ammonium medium on vitreous carbon
Miranda-Hernandez M, Gonzalez I
E102 - E109 Electrochemical porosimetry
Song HK, Sung JH, Jung YH, Lee KH, Dao LH, Kim MH, Kim HN
E110 - E118 Evolution from hydrogen bond to proton transfer pathways in the electroreduction of alpha-NH-quinones in acetonitrile
Macias-Ruvalcaba NA, Gonzalez I, Aguilar-Martinez M
G163 - G166 Investigation of GaAs dry etching in a planar inductively coupled BCl3 plasma
Lim WT, Baek IG, Jung PG, Lee JW, Cho GS, Lee JI, Cho KS, Pearton SJ
G167 - G170 Effect of mechanical and electrical stresses on the performance of an a-Si : H TFT on plastic substrate
Won SH, Chung JK, Lee CB, Nam HC, Hur JH, Jang J
G171 - G174 Influence of codoping rare-earth ion on lasting phenomena of Eu-doped strontium aluminate phosphor
Ohta M, Takami M
G175 - G180 Factors in electrochemical nanostructure fabrication using electron-beam induced carbon masking
Djenizian T, Santinacci L, Schmuki P
G181 - G184 Observation of a sharp notch at a Si-PN junction formed by anodization in HF solution
Unagami T
G185 - G189 Effect of slurry ionic salts at dielectric silica CMP
Choi W, Mahajan U, Lee SM, Abiade J, Singh RK
G190 - G195 GaN MSM ultraviolet photodetectors with transparent and thermally stable RuO2 and IrO2 Schottky contacts
Kim JK, Lee JL
G196 - G199 Impact of novel pad groove designs on removal rate and uniformity of dielectric and copper CMP
Doy TK, Seshimo K, Suzuki K, Philipossian A, Kinoshita M
G200 - G204 Anodic oxidation of GaN in N-methylacetamide for electrical profiling of doped layers in GaN
Matsunaga S, Yoshida S, Kawaji T, Inada T
G205 - G215 Tribological issues and modeling of removal rate of low-k films in CMP
Thagella S, Sikder AK, Kumar A