Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.146, No.4 Entire volume, number list

ISSN: 0013-4651 (Print)

In this Issue (62 articles)

1245 - 1250	Electrochemical properties of Zr-V-Ni system hydrogen storage alloys Yang XG, Zhang WK, Lei YQ, Wang QD
1251 - 1255	Preparation and characterization of Ni/Al-layered double hydroxide Sugimoto A, Ishida S, Hanawa K
1256 - 1261	Aromatic compounds as redox shuttle additives for 4 V class secondary lithium batteries Adachi M, Tanaka K, Sekai K
1262 - 1269	Ab initio study on interaction and stability of lithium-doped amorphous carbons Ago H, Kato M, Yahara K, Yoshizawa K, Tanaka K, Yamabe T
1270 - 1272	Electroless copper deposition in the photographic gelatin layer Zhang YH, Yan TT, Yu SQ, Zhuang SY
1273 - 1278	Development of solid-oxide fuel cells that operate at 500 degrees C Doshi R, Richards VL, Carter JD, Wang XP, Krumpelt M
1279 - 1289	Solid-state electrochemical kinetics of Li-ion intercalation into Li1-xCoO2: Simultaneous application of electroanalytical techniques SSCV, PITT, and EIS Levi MD, Salitra G, Markovsky B, Teller H, Aurbach D, Heider U, Heider L
1290 - 1295	Contribution of the internal active three-phase zone of Ni-zirconia cermet anodes on the electrode performance of SOFCs Nakagawa N, Nakajima K, Sato M, Kato K
1296 - 1304	Rotating disk electrode measurements on the CO tolerance of a high-surface area Pt/Vulcan carbon fuel cell catalyst Schmidt TJ, Gasteiger HA, Behm RJ
1305 - 1309	Degradation of La0.6Sr0.4Fe0.8Co0.2O3-delta in carbon dioxide and water atmospheres Benson SJ, Waller D, Kilner JA
1310 - 1317	Examination of the corrosion behavior of aluminum current collectors in lithium/polymer batteries Chen YF, Devine TM, Evans JW, Monteiro OR, Brown IG
1318 - 1325	Electrochemical behavior of lithium in alkaline aqueous electrolytes - I. Thermodynamics Pensado-Rodriguez O, Urquidi-Macdonald M, Macdonald DD
1326 - 1335	Electrochemical behavior of lithium in alkaline aqueous electrolytes - II. Point defect model Pensado-Rodriguez O, Flores JR, Urquidi-Macdonald M, Macdonald DD
1336 - 1340	The development of LiFeO2-LiCoO2-NiO cathodes for molten carbonate fuel cells Bloom I, Lanagan MT, Krumpelt M, Smith JL
1341 - 1345	Determination of the oxygen permeation flux through La0.75Ca0.25CrO3-delta by an electrochemical method Sakai N, Yamaji K, Horita T, Yokokawa H, Kawada T, Dokiya M, Hiwatashi K, Ueno A, Aizawa M
1346 - 1350	Composites of V2O5 aerogel and nickel fiber as high rate intercalation electrodes Parent MJ, Passerini S, Owens BB, Smyrl WH
1351 - 1354	Cathode of LiMgyMn2-yO4 and LiMgyMn2-yO4-delta spinel phases for lithium secondary batteries Hayashi N, Ikuta H, Wakihara M
1355 - 1360	Doped vanadium oxides as host materials for lithium intercalation Coustier F, Hill J, Owens BB, Passerini S, Smyrl WH
1361 - 1369	Evaluation of lead anode reactions in acid sulfate electrolytes - I. Lead alloys with cobalt additives Yu P, O'Keefe TJ
1370 - 1374	Material balance modification in one-dimensional modeling of porous electrodes Jain M, Weidner JW
1375 - 1379	Lithium insertion into mesoscopic and single-crystal TiO2 (rutile) electrodes Kavan L, Fattakhova D, Krtil P
1380 - 1385	The behavior of copper and lead during heat-treatment and surface treatment of aluminium capacitor Ashitaka Z, Thompson GE, Skeldon P, Wood GC, Shimizu K
1386 - 1391	Copper corrosion in industrial waters - A multimethod analysis Monticelli C, Fonsati M, Meszaros G, Trabanelli G
1392 - 1396	Characterization of electrolytic ZrO2 coating on AISI 316L stainless steel Yen SK
1397 - 1406	Passivation of stainless steels in hydrochloric acid Wegrelius L, Falkenberg F, Olefjord I
1407 - 1411	Mechanism of the chemical deposition of nickel on silicon wafers in aqueous solution Takano N, Hosoda N, Yamada T, Osaka T
1412 - 1420	Electroreduction of Co2+ and Ni2+ at III-V semiconductors and properties of the semiconductor/metal interfaces formed Strubbe K, Vereecken PM, Gomes WP
1421 - 1430	Channel-constrained electroless metal deposition on ligating self-assembled film surfaces Chen MS, Brandow SL, Dulcey CS, Dressick WJ, Taylor GN, Bohland JF, Georger JHG, Pavelchek EK, Calvert JM
1431 - 1435	Characterization of NixFe1-x(0.10 < x < 0.95) electrodeposition from a family of sulfamate-chloride electrolytes Leith SD, Ramli S, Schwartz DT
1436 - 1441	Electrochemical deposition of copper on n-Si/TiN Oskam G, Vereecken PM, Searson PC
1442 - 1447	Inhibition of alumina deposition during tungsten chemical mechanical planarization through the use of citric acid Zhang L, Raghavan S, Meikle S, Hudson G
1448 - 1454	Photoluminescence as an in situ probe for copper electrodeposition on p-GaAs Sutter EMM, Gerard I, Etcheberry A
1455 - 1460	A comparative study of film properties of chemical vapor deposited TiN films as diffusion barriers for Cu metallization Kim SH, Chung DS, Park KC, Kim KB, Min SH
1461 - 1464	Effect of ethylenediamine on the electrodeposition of Ni-Fe alloys Harris TM, Wilson JLS, Bleakley M
1465 - 1468	Comparison of Cl-2/He, Cl-2/Ar, and Cl-2/Xe plasma chemistries for dry etching of NiFe and NiFeCo Jung KB, Cho H, Hahn YB, Hays DC, Lambers ES, Park YD, Feng T, Childress JR, Pearton SJ
1469 - 1471	Electrochemical characterization of highly boron-doped diamond microelectrodes in aqueous electrolyte Sarada BV, Rao TN, Tryk DA, Fujishima A
1472 - 1477	Anodic behavior of carbon electrodes in CaO-CaCl2 melts at 1123 K Mohamedi M, Borresen B, Haarberg GM, Tunold R
1478 - 1485	Electrochemical oxidation of 4-methyl-1,4-dihydropyridines in protic and aptrotic media - Spin trapping studies Nunez-Vergara LJ, Sturm JC, Alvarez-Lueje A, Olea-Azar C, Sunkel C, Squella JA
1486 - 1491	Electromotive force of hydrogen isotope cell with a high temperature proton-conducting solid electrolyte CaZr0.90In0.10O3-alpha Matsumoto H, Takeuchi K, Iwahara H
1492 - 1495	Cathodically promoted addition of nitroalkanes to ferrocenecarboxaldehyde Niazimbetova ZI, Evans DH, Guzei IA, Incarvito CD, Rheingold AL
1496 - 1499	Study of adsorption of iodide ions on gold electrode by a laser-beam deflection method compared with a piezoelectric technique Ueno K, Seo M
1500 - 1504	Heteroepitaxial growth of yttria-stabilized zirconia on silicon (100) by reactive sputtering with an electron cyclotron resonance source Lille J, Varhue WJ, Mongeon S
1505 - 1509	Surface quality of tribochemically polished silicon nitride Hah SR, Burk CB, Fischer TE
1510 - 1516	Optimization of multilayer thin film passivation processes for improving cache memory device performance Lin CF, Tseng WT, Feng MS
1517 - 1522	Etch-induced physical damage and contamination during highly selective oxide etching using C4F8/H-2 helicon wave plasmas Kim HS, Lee WJ, Yeom GY, Kim JH, Whang KW
1523 - 1528	Contact mechanics and lubrication hydrodynamics of chemical mechanical polishing Tichy J, Levert JA, Shan L, Danyluk S
1529 - 1535	Bias dependent contrast mechanisms in EBIC images of MOS capacitors Kirk HR, Radzimski Z, Romanowski A, Rozgonyi GA
1536 - 1539	A thermal model for the initiation of programming in metal-to-metal amorphous-silicon antifuses Vasudevan N, Massoud HZ, Fair RB
1540 - 1545	Dark currents in HgCdTe photodiodes passivated with ZnS/Cds Juang FS, Su YK, Chang SJ, Chang SM, Shu FS, Chiang CD, Cherng YT, Sun TP
1546 - 1548	Instability of amorphous Ru-Si-O thin films under thermal oxidation Gasser SM, Ruiz R, Kolawa E, Nicolet MA
1549 - 1556	Characterization of the post dry-etch cleaning of silicon for Ti-self-aligned silicide technology Kim YB, Baklanov MR, Conard T, de Potter M, Vanhaeleemeersch S
1557 - 1564	Low thermal budget surface preparation for selective epitaxy a study on process robustness Celik SM, Ozturk MC
1565 - 1569	Interfacial properties in liquid phase growth of SiC Syvajarvi M, Yakimova R, Janzen E
1570 - 1574	Effect of substrate on "on-resistance" of a power metal-oxide semiconductor field-effect transistor device Chiou HD, Gaffney K, DeNicholas J, Chang G, Lu SF
1575 - 1578	Thermal donor and oxygen precipitate formation in silicon during 450 degrees C treatments under atmospheric and enhanced pressure Antonova IV, Popov VP, Plotnikov AE, Misiuk A
1579 - 1582	Degradation of reactively sputtered Ti-Si-N films used as a barrier layer in titanium silicide/polycrystalline Si gate electrodes Park JS, Sohn DK, Lee BH, Bae JU, Byun JS, Park JW
1583 - 1592	Effective improvement on barrier capability of chemical vapor deposited WSix using N-2 plasma treatment Wang MT, Lin YC, Wang CC, Chen MC
1593 - 1596	Stimulated orientation of Si films by solid-phase recrystallization on a ZnS film/glass substrate Unagami T
1597 - 1601	The effect of Al0.7Ga0.3As etch stop removal on the preparation of wafer-bonded compliant substrates Zhang C, Lubyshev D, Jackson TN, Miller DL, Mayer TS
1602 - 1607	Copper/benzocyclobutene interconnects for sub-100 nm integrated circuit technology: Elimination of high-resistivity metallic liners and high-dielectric constant polish stops Neirynck JM, Gutmann RJ, Murarka SP
1608 - 1611	An oxygen sensor using a process of high-temperature oxidation of metal Kawamura K, Kaimai A, Nigara Y, Kawada T, Mizusaki J
1612 - 1612	Proton and methanol transport in poly(perfluorosulfonate) membranes containing Cs+ and H+ cations (vol 145, pg 3798, 1998) Tricoli V