D49 - D54 |
Electro-oxidation of formic acid on highly dispersed platinum and perchlorate doped polypyrrole electrodes Becerik I, Kadirgan F |
D55 - D59 |
Conversion of CO2 to CO and hydrocarbons by plasma reaction Yoshida Z, Yosue H, Nogami G |
D60 - D64 |
Oxidation of 4-chlorophenol at boron-doped diamond electrode for wastewater treatment Rodrigo MA, Michaud PA, Duo I, Panizza M, Cerisola G, Comninellis C |
D65 - D73 |
Electrochemical copolymerization of diphenylamine and anthranilic acid with various feed ratios Wu MS, Wen TC, Gopalan A |
F83 - F91 |
Effect of post-treatment temperature on TiN barrier properties during a two-step annealing for (Ba, Sr)TiO3 dielectric film Yoon DS, Hong K, Roh JS |
F92 - F97 |
Carbon enhancement of SiO2 nucleation in buried oxide synthesis Efremov AA, Litovchenko VG, Romanova GP, Sarikov AV, Claeys C |
F98 - F101 |
Effect of fictive temperature on the polishing rate of thermally grown silicon dioxide Matthew I, Tomozawa M |
J25 - J30 |
Oxygen transport at the LaMnO3 film/yttria-stabilized zirconia interface under different cathodic overpotentials by secondary ion mass spectrometry Horita T, Yamaji K, Sakai N, Yokokawa H, Kato T |
A395 - A401 |
Concept of mismatch and relaxation explains DC and AC conductivities of fragile glass-forming ionic melts Funke K, Heimann B, Vering M, Wilmer D |
A402 - A410 |
Electrochemistry of InSb as a Li insertion host problems and prospects Hewitt KC, Beaulieu LY, Dahn JR |
A411 - A417 |
Experimental investigation of the porous nickel anode in the molten carbonate fuel cell Lindbergh G, Olivry M, Sparr M |
A418 - A421 |
Li conduction in sputtered amorphous Ta2O5 Frenning G, Engelmark F, Niklasson GA, Stromme M |
A422 - A426 |
Kinetic characterization of single particles of LiCoO2 by AC impedance and potential step methods Dokko K, Mohamedi M, Fujita Y, Itoh T, Nishizawa M, Umeda M, Uchida I |
A427 - A432 |
AC impedance investigation of samarium-doped ceria Zhan ZL, Wen TL, Tu HY, Lu ZY |
A433 - A442 |
Impedance of solid oxide fuel cell LSM/YSZ composite cathodes Jorgensen MJ, Mogensen M |
A443 - A447 |
Tape cast solid oxide fuel cells for the direct oxidation of hydrocarbons Park S, Gorte RJ, Vohs JM |
A448 - A455 |
Understanding the second electron discharge plateau in MnO2-based alkaline cells Patrice R, Gerand B, Leriche JB, Seguin L, Wang E, Moses R, Brandt K, Tarascon JM |
A456 - A462 |
Electrode reaction of La1-xSrxCoO3-d cathodes on La0.8Sr0.2Ga0.8Mg0.2O3-y electrolyte in solid oxide fuel cells Horita T, Yamaji K, Sakai N, Yokokawa H, Weber A, Ivers-Tiffee E |
A463 - A470 |
Diagnostic characterization of high power lithium-ion batteries for use in hybrid electric vehicles Zhang X, Ross PN, Kostecki R, Kong F, Sloop S, Kerr JB, Striebel K, Cairns EJ, McLarnon F |
A471 - A481 |
Flake Cu-Sn alloys as negative electrode materials for rechargeable lithium batteries Xia YY, Sakai T, Fujieda T, Wada M, Yoshinaga H |
A482 - A489 |
Enhanced structural stability and cyclability of Al-doped LiMn2O4 spinel synthesized by the emulsion drying method Myung ST, Komaba S, Kumagai N |
A490 - A495 |
Electrodissolution of zinc at the limiting current Barton SC, West AC |
A496 - A501 |
Current-time behavior of smooth and porous PtRu surfaces for methanol oxidation Hoster H, Iwasita T, Baumgartner H, Vielstich W |
A502 - A505 |
Nonelectrochemical pathway of methanol oxidation at a platinum-catalyzed oxygen gas diffusion electrode Vielstich W, Paganin VA, Lima FHB, Ticianelli EA |
A506 - A512 |
Pyrolytic carbon deposition on porous cathode tubes and its use as an interlayer for solid oxide fuel cell zirconia electrolyte fabrication Basu RN, Altin O, Mayo MJ, Randall CA, Eser S |
A513 - A519 |
Development and characterization of acid-doped polybenzimidazole/sulfonated polysulfone blend polymer electrolytes for fuel cells Hasiotis C, Qingfend L, Deimede V, Kallitsis JK, Kontoyannis CG, Bjerrum NJ |
A520 - A523 |
Electrical conductivity of ZrO2-Sc2O3 doped with HfO2, CeO2, and Ga2O3 Arachi Y, Asai T, Yamamoto O, Takeda Y, Imanishi N, Kawate K, Tamakoshi C |
B163 - B173 |
Characterization of corrosion interfaces by the scanning Kelvin probe force microscopy technique Guillaumin V, Schmutz P, Frankel GS |
B174 - B185 |
Pit initiation on stainless steels in 1 M NaCl with and without mechanical stress Suter T, Webb EG, Bohni H, Alkire RC |
B186 - B195 |
Microelectrochemical measurements of the dissolution of single MnS inclusions, and the prediction of the critical conditions for pit initiation on stainless steel Webb EG, Suter T, Alkire RC |
B196 - B207 |
Oxygen reduction reaction kinetics on chromate conversion coated Al-Cu, Al-Cu-Mg, and Al-Cu-Mn-Fe intermetallic compounds Ilevbare GO, Scully JR |
B208 - B216 |
Studies on electrochemical behavior of copper in aerated NaBr solutions with Schiff base, N,N '-o-phenylen-bis(3-methoxysalicylidenimine) Ma H, Chen SH, Niu L, Shang SX, Li SL, Zhao SY, Quan ZL |
C327 - C332 |
Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - I. Chemical formulation and reaction mechanisms Tseng WT, Lo CH, Lee SC |
C333 - C338 |
Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - II. Kinetics and microstructure Tseng WT, Lo CH, Lee SC |
C339 - C347 |
Infrared studies of benzotriazole on copper electrode surfaces - Role of chloride in promoting reversibility Biggin ME, Gewirth AA |
C348 - C352 |
Electrochemistry of hypochlorite at silicon in alkaline etchants - Applications in device fabrication Xia XH, Kelly JJ |
C353 - C356 |
Etch behavior of PB(ZrxTi1-x)O-3 films using a TiO2 hard mask Chung CW, Chung I |
C357 - C362 |
CdS and ZnS deposition on Ag(111) by electrochemical atomic layer epitaxy Innocenti M, Pezzatini G, Forni F, Foresti ML |
C363 - C368 |
Rapid prototyping of masks for through-mask electrodeposition of thick metallic components Wang WH, Holl MR, Schwartz DT |
C369 - C375 |
Effect of the electrosynthesis method on the surface morphology of the polypyrrole film - An atomic force microscopy study Hernandez-Perez T, Morales M, Batina N, Salmon M |
C376 - C382 |
Direct numerical simulation of nucleation and three-dimensional, diffusion-controlled growth Cao Y, Searson PC, West AC |
C383 - C389 |
Mechanistic study and characterization of 3C-SiC(100) grown on Si(100) Kim KC, Park CI, Roh JI, Nahm KS, Hahn YB, Lee YS, Lim KY |
C390 - C394 |
Investigations of chemical vapor deposition of GaN using synchrotron radiation Thompson C, Stephenson GB, Eastman JA, Munkholm A, Auciello O, Murty MVR, Fini P, DenBaars SP, Speck JS |
C395 - C402 |
Galvanostatic pulse plating of Cu-Al alloy in a room-temperature chloroaluminate molten salt - Rotating ring-disk electrode studies Zhu Q, Hussey CL |
E177 - E182 |
Electrocatalytic hydrogenation of C2H4 on PtO2 powder - A study of surface processes occurring at powder materials by cavity microelectrode Cachet-Vivier C, Vivier V, Cha CS, Nedelec JY, Yu LT |
E183 - E188 |
Computation of thermodynamic oxidation potentials of organic solvents using density functional theory Zhang XR, Pugh JK, Ross PN |
E189 - E202 |
Electrode work function and absolute potential scale in solid-state electrochemistry Tsiplakides D, Vayenas CG |
E203 - E214 |
Oxygen permeation through cobalt-containing perovskites -Surface oxygen exchange vs. lattice oxygen diffusion Huang KQ, Goodenough JB |
E215 - E218 |
Square-wave voltammetry of ClO4--doped poly(phenylenesulfidephenyleneamine) Li GF, Josowicz M, Janata J |
E219 - E226 |
Electrochemical properties of Li3N dissolved in molten LiCl at 900 K Okabe TH, Horiuchi A, Jacob KT, Waseda Y |
E227 - E232 |
Formation and characterization of heteropolyacid/polycation multilayer films on gold electrode Cheng ZL, Cheng L, Dong SJ, Yang XR |
E233 - E236 |
New methods of spectral analysis of current oscillations of electrochemical processes Darowicki K, Krakowiak A, Zielinski A |
E237 - E240 |
Extended electrical transport measurements on the mixed conductor Ag3.0CS2 LeMaire PK, Speel R, Ruotolo R |
F102 - F107 |
Electrical properties and temperature-humidity studies of fluorocarbon films deposited from pentafluoroethane/argon plasmas Agraharam S, Hess DW, Kohl PA, Allen SAB |
G237 - G240 |
Etch characteristics of Cr by using Cl-2/O-2 gas mixtures with electron cyclotron resonance plasma Kang SY, Kwon KH, Kim SI, Lee SK, Jung MY, Cho YR, Song YH, Lee JH, Cho KI |
G241 - G248 |
Removal efficiency of metallic impurities on various substrates in HF-based solutions Choi GM, Ohmi T |
G249 - G253 |
Material analysis on degradation phenomena caused by hot carrier in 0.35 mu m WSi gate GaAs heterostructure insulated gate field effect transistors Ohshika K, Yamashita T, Fukui M, Yanazawa H, Takatani S, Matsumoto H |
G254 - G257 |
Dry etching of GaN/InGaN multiquantum wells using inductively coupled Cl2OCH4OH2/Ar plasma Lee JM, Kim SW, Park SJ |
G258 - G264 |
Effects of the process variable on sputtered TiSix polycide gate electrodes for sub-0.15 mm memory device application Kim SD, Hwang IS, Rhee JK, Suh YS, Park DG |
G265 - G270 |
Ultraclean two-stage aerosol reactor for production of oxide-passivated silicon nanoparticles for novel memory devices Ostraat ML, De Blauwe JW, Green ML, Bell LD, Atwater HA, Flagan RC |
G271 - G274 |
Investigation of polycrystalline nickel silicide films as a gate material Qin M, Poon VMC, Ho SCH |
G275 - G278 |
Preparation of thin dielectric film for nonvolatile memory by thermal oxidation of Si-rich LPCVD nitride Wong H, Poon MC, Gao Y, Kok TCW |
G279 - G282 |
Thermally induced Si(100)/SiO2 interface degradation in poly-Si/SiO2/Si structures Afanas'ev VV, Stesmans A |
G283 - G290 |
Fingering instability and maximum radius at high rotational bond number Wang MW, Chou FC |
G291 - G296 |
Improvement on the reliability of flash EEPROM by annealing after self-aligned source dry etching Park SW, Kim DJ, Dong CD, Kwak NY, Kong YT, Lee CH, Lee SC, Park SH, Kim JW, Yang HS |