2517 - 2522 |
Preparation and Electrochemistry of a Modified Electrode by Electro-Oxidative Polymerization of Copper and Cobalt Complexes of 2,6-Diacetylpyridine Mono(Ethylenediamine) Azzem MA, Elsaied FA, Aboutabl MA, Mohamed ZF |
2523 - 2527 |
Scanning Electrochemical Microscopy .31. In-Situ Monitoring of Thickness Changes of Thin-Films on Electrodes Wei C, Bard AJ |
2527 - 2531 |
New Class of Electrochemically and Thermally Stable Lithium-Salts for Lithium Battery Electrolytes .1. Synthesis and Properties of Lithium bis(1,2-Benzenediolato(2-)-O,O’)Borate Barthel J, Wuhr M, Buestrich R, Gores HJ |
2532 - 2538 |
Spectroscopy, Electrochemistry, and Spectroelectrochemistry of Rhenium Chlorides in the AlCl3-Naclsat Melt Hondrogiannis EM, Mamantov G |
2539 - 2544 |
Photoresponse of Electrochemically and Spray-Pyrolytically Deposited CdTe Thin-Film Electrodes Khan SU, Zhang SM |
2544 - 2550 |
Electrochemical Insertion of Magnesium into Hydrated Vanadium Bronzes Novak P, Scheifele W, Joho F, Haas O |
2551 - 2557 |
Some Aspects of Limn2O4 Electrochemistry in the 4 Volt Range Pistoia G, Zane D, Zhang Y |
2558 - 2563 |
Structural Considerations of Layered and Spinel Lithiated Oxides for Lithium Ion Batteries Thackeray MM |
2564 - 2571 |
Rechargeable Lithium-Ion Cells Using Graphitized Mesophase-Pitch-Based Carbon-Fiber Anodes Takami N, Satoh A, Hara M, Ohsaki T |
2572 - 2576 |
Influences of Both Carbon Supports and Heat-Treatment of Supported Catalyst on Electrochemical Oxidation of Methanol Uchida M, Aoyama Y, Tanabe M, Yanagihara N, Eda N, Ohta A |
2577 - 2581 |
Mobility and Ionic Association of Lithium-Salts in a Propylene Carbonate-Ethyl Methyl Carbonate Mixed-Solvent Ue M, Mori S |
2581 - 2590 |
Lithium Insertion in High-Capacity Carbonaceous Materials Zheng T, Liu YH, Fuller EW, Tseng S, Vonsacken U, Dahn JR |
2591 - 2594 |
Corrosion and Protection of a Conductive Silver Paste Brusic V, Frankel GS, Roldan J, Saraf R |
2594 - 2597 |
Rupture of an Oxide Blister Ryan RL, Mccafferty E |
2598 - 2604 |
Direct Electroplating on Nonconductors Weng DC, Landau U |
2604 - 2611 |
Crystallographic Texture and Microstructure of Electrogalvanized Layer in Acid Sulfate-Solution Yim YB, Hwang WS, Hwang SK |
2612 - 2617 |
Electrochemical Properties of Metalloporphyrin-Clay Complex-Modified Electrode Systems - Investigation as Oxygen Sensors Yuasa M, Nagaiwa T, Kato M, Sekine I, Hayashi S |
2618 - 2620 |
Oxidation of Thiosulfate to Sulfate at Glassy-Carbon Electrodes Feng JR, Johnson DC, Lowery SN |
2621 - 2624 |
An Investigation of Anodes for Direct-Oxidation of Carbon in Solid Oxide Fuel-Cells Horita T, Sakai N, Kawada T, Yokokawa H, Dokiya M |
2625 - 2630 |
Displacement of the Bandedges of Galnp(2) in Aqueous-Electrolytes Induced by Surface Modification Kocha SS, Turner JA |
2631 - 2642 |
A Mathematical-Model of the Oxygen-Recombination Lead-Acid Cell Bernardi DM, Carpenter MK |
2642 - 2649 |
Study of CdS Epitaxial-Films Chemically Deposited from Aqueous-Solutions on InP Single-Crystals Froment M, Bernard MC, Cortes R, Mokili B, Lincot D |
2650 - 2654 |
The AC-Impedance Response of the Physical Interface Between Yttria-Stabilized Zirconia and YBa2Cu3O7-X Fletcher JG, West AR, Irvine JT |
2655 - 2658 |
Use of Anions of C-60 as Electrogenerated Bases Niyazymbetov ME, Evans DH |
2659 - 2664 |
Active Reaction Sites for Oxygen Reduction in La0.9Sr0.1Mno3/YSZ Electrodes Lee HY, Cho WS, Oh SM, Wiemhofer HD, Gopel W |
2665 - 2669 |
Impedance and Microwave Reflectivity Measurements on N-Si in 1M LiCl Methanol .1. Depletion and Inversion Layer Formation Schlichthorl G, Peter LM |
2670 - 2674 |
Modeling of Proton-Exchange Membrane Fuel-Cell Performance with an Empirical-Equation Kim J, Lee SM, Srinivasan S, Chamberlin CE |
2675 - 2681 |
Cathodic Behavior of RuO2-Doped Ni/Co3O4 Electrodes in Alkaline-Solutions - Surface Characterization Krstajic N, Trasatti S |
2682 - 2689 |
Copper Electropolishing in Concentrated Phosphoric-Acid .1. Experimental Findings Vidal R, West AC |
2689 - 2694 |
Copper Electropolishing in Concentrated Phosphoric-Acid .2. Theoretical Interpretation Vidal R, West AC |
2695 - 2698 |
Electrochemical Determination of the Diffusion-Coefficient of Hydrogen Through an Lani4.25Al0.75 Electrode in Alkaline Aqueous-Solution Zheng G, Popov BN, White RE |
2699 - 2703 |
Hydrous Ruthenium Oxide as an Electrode Material for Electrochemical Capacitors Zheng JP, Cygan PJ, Jow TR |
2704 - 2709 |
Synthetic Diamond Electrodes - Photoelectrochemical Investigation of Undoped and Boron-Doped Polycrystalline Thin-Films Sakharova AY, Pleskov YV, Diquarto F, Piazza S, Sunseri C, Teremetskaya IG, Varnin VP |
2710 - 2716 |
Some Structural and Textural Aspects of Tribasic Lead Sulfate Precipitation During the Mixing of Lead-Acid-Battery Positive Paste Vallatjoliveau F, Delahayevidal A, Figlarz M, Deguibert A |
2717 - 2721 |
Identification of Si/SiO2 Interface Properties in Thin-Film Transistors with Charge-Pumping Technique Balasinski A, Worley J, Huang KW, Liou FT |
2721 - 2726 |
Charge-Carrier Injection into the Buried Oxide of Wafer-Bonded Silicon-on-Insulator Materials Bengtsson S, Ericsson P, Sodervall U, Mitani K, Abe T |
2726 - 2730 |
Plasma Chemical-Vapor-Deposition of SiO2 on Air-Exposed Surfaces by Cold-Plasma Torch Ha HK, Inomata K, Koinuma H |
2731 - 2737 |
Atomic Layer Epitaxy Growth of Tin Thin-Films Ritala M, Leskela M, Rauhala E, Haussalo P |
2738 - 2742 |
Enhanced Thickness Uniformity and Electrical Performance of Ultrathin Dielectrics Grown by Rtp Using Various N2O-Oxynitridation Processes Wrixon R, Twomey A, Osullivan P, Mathewson A |
2743 - 2747 |
Enhanced Hot-Carrier Degradation Due to Water-Related Species in Plasma-Enhanced Tetraethoxysilane Oxide Yamaha T, Inoue Y, Fujioka T, Hanagasaki O, Hotta T |
2747 - 2753 |
Palladium-Chloride to Palladium Metal 2-Dimensional Nucleation and Growth Phenomena Delong HC, Carlin RT |
2754 - 2757 |
Gas Sensitivity of SnO2/CuO Heterocontacts Devi GS, Manorama S, Rao VJ |
2757 - 2761 |
Combination of Pressure Modulation and Impedance Spectroscopy for Study of Electrode-Kinetics on Solid Electrolytes - The Porous Gold Solid Sodium-Carbonate Interface Dubbe A, Wiemhofer HD, Gopel W |
2762 - 2769 |
Effects of Electron-Cyclotron-Resonance Power and Cavity Dimensions in Plasma-Etching of III-V Compounds Melville DL, Thompson DA, Simmons JG |
2770 - 2776 |
Surface-Analysis and Photoelectrochemical Studies of Mixed Polycrystals of P-WSe2/Ws2 Santiagoortiz Y, Torres GI, Diaz A, Cabrera CR |
2777 - 2782 |
Trace Water-Vapor Detection in Nitrogen and Corrosive-Gases by FTIR Spectroscopy Stallard BR, Espinoza LH, Rowe RK, Garcia MJ, Niemczyk TM |
2783 - 2785 |
D-2 Lamp Photochemical Vapor-Deposition of Al2O3 Thin-Films in Oxygen Atmosphere Tanaka T, Matsuoka T, Saraie J |
2786 - 2789 |
Thermal Budget for Fabricating P(+) Polysilicon Gate with Thin Gate Oxide Suzuki K, Satoh A, Aoyama T, Namura I, Inoue F, Kataoka Y, Tada Y, Sugii T |
2790 - 2804 |
The Effects of Gas-Phase Convection on Carbon Contamination of Czochralski-Grown Silicon Bornside DE, Brown RA, Fujiwara T, Fujiwara H, Kubo T |
2805 - 2812 |
Layer Reversal of Co/Zr Bilayer and Epitaxial-Growth of CoSi2 Layer on Si(001) Substrate Byun JS, Kim JJ, Kim WS, Kim HJ |
2812 - 2817 |
An Experimental-Study of Megasonic Cleaning of Silicon-Wafers Busnaina AA, Kashkoush II, Gale GW |
2818 - 2823 |
Surface Characterization of Culns(2) with Lamellar Morphology Cattarin S, Pagura C, Armelao L, Bertoncello R, Dietz N |
2823 - 2828 |
Modeling of the Kinetics of Dopant Precipitation in Silicon Dunham ST |
2829 - 2832 |
Rapid Thermal-Diffusion of Sn from Spin-on-Glass into GaAs Hernandes CS, Swart JW, Pudenzi MA, Kraus GT, Shachamdiamand Y, Giannelis EP |
2833 - 2835 |
Monitoring and Optimization of Silicon Surface Quality Msaad H, Michel J, Reddy A, Kimerling LC |
2836 - 2838 |
Current Transport Through Silicon Oxynitride Films Oclock GD, Khaliq MA, Lidke KA |
2839 - 2844 |
Oxygen-Transport Mechanism in Czochralski Silicon Melt .1. The Whole Bulk Melt Togawa S, Shiraishi Y, Terashima K, Kimura S |
2844 - 2848 |
Oxygen-Transport Mechanism in Czochralski Silicon Melt .2. Vicinity of Growth Interface Togawa S, Shiraishi Y, Terashima K, Kimura S |
2849 - 2852 |
CH4/H-2/Ar Electron-Cyclotron-Resonance Plasma-Etching for GaAs-Based Field-Effect Transistors Vanhassel JG, Vanes CM, Nouwens PA, Maahury JH, Kaufmann LM |
2853 - 2860 |
Residue-Free Reactive Ion Etching of 3C-SiC and 6H-SiC in Fluorinated Mixture Plasmas Yih PH, Steckl AJ |
2861 - 2863 |
Calculation of Noise Resistance from Simultaneous Electrochemical Voltage and Current Noise Data Bierwagen GP |
2863 - 2863 |
An Oxynitride Isfet Modified for Working in a Differential-Mode for pH Detection (Vol 141, Pg 535, 1994) Rocher V, Chovelon JM, Jaffrezicrenault N, Cros Y, Birot D |
L125 - L128 |
Thermodynamic Model Prediction of Metal Removal During Hydrogen Annealing of Si Wafers Helms CR |
L129 - L132 |
Potential Enhancement of Polyiodide Redox Couples via Solution Modification Myung N, Licht S |
L132 - L134 |
Formation of Ultrathin Nitrided SiO2 Oxides by Direct Nitrogen Implantation into Silicon Soleimani HR, Doyle BS, Philipossian A |
L135 - L137 |
Solid-State Barium-Vapor Detector Fergus JW, Hui SQ |