| 2273 - 2279 |
Plasma Polymerization of Sulfonated Fluorochlorocarbon Ionomer Films
Brumlik CJ, Parthasarathy A, Chen WJ, Martin CR |
| 2279 - 2282 |
Linivo4 - A 4.8 Volt Electrode Material for Lithium Cells
Fey GT, Li W, Dahn JR |
| 2283 - 2285 |
Electrochemical Oxidation of 4,5-Dihydro-1,2,4-Triazin-6-One Derivatives at Carbon Electrode in Acetonitrile
Chirchi L, Boujlel K, Hajjem B, Baccar B |
| 2286 - 2291 |
Electrochemistry of Molybdenum Solutions in Molten LiCl-KCl Eutectic at 500-Degrees-C
Gabriel JC, Bouteillon J, Poignet JC, Roman JM |
| 2291 - 2296 |
Kinetics of Roughness Relaxation at Gold Electrodes
Garcia MP, Gomez MM, Salvarezza RC, Arvia AJ |
| 2297 - 2300 |
The Electronic and the Ionic Contribution to the Free-Energy of Alkali-Metals in Intercalation Compounds
Gerischer H, Decker F, Scrosati B |
| 2300 - 2305 |
Effect of Additives on Lithium Cycling Efficiency
Hirai T, Yoshimatsu I, Yamaki J |
| 2306 - 2309 |
Mixing Effect of Metal-Oxides on Negative Electrode-Reactions in the Nickel-Hydride Battery
Iwakura C, Matsuoka M, Kohno T |
| 2310 - 2316 |
Lithium Intercalation from Aqueous-Solutions
Li W, Mckinnon WR, Dahn JR |
| 2316 - 2326 |
Influence of Antimony on the Structure and the Degree of Hydration of the Anodic Pbo2 Layer Formed on Pb-Sb Electrodes
Monahov B, Pavlov D |
| 2326 - 2331 |
Electrochemical Properties of a Polypyrrole Polystyrenesulfonate Composite Film and Its Application to Rechargeable Lithium Battery Cathodes
Momma T, Nishimura K, Osaka T, Kondo N, Nakamura S |
| 2332 - 2337 |
Evaluation of Coating Degradation with Electrochemical Impedance Spectroscopy and Electrochemical Noise-Analysis
Xiao H, Mansfeld F |
| 2338 - 2343 |
Rotating-Disk Studies in Molten Carbonates .3. Diffusion-Coefficient and Bulk Concentration in Lithium-Carbonate
Ramaswami K, Selman JR |
| 2343 - 2349 |
The Effect of Sulfur on the Passivation of Iron in Calcium Nitrate
Windisch CF, Baer DR, Engelhard MH |
| 2350 - 2355 |
Preparation of Thin Perfluorosulfonate Cation-Exchanger Films by Plasma Polymerization
Yasuda K, Uchimoto Y, Ogumi Z, Takehara Z |
| 2356 - 2360 |
On the Mechanism of Electroless Ni-P Plating
Abrantes LM, Correia JP |
| 2361 - 2368 |
Hydrous Oxide Formation on Platinum in Phosphoric-Acid Solution
Burke LD, Morrissey JA |
| 2369 - 2373 |
Structure of the Copper-Monolayer Platinum-Electrode Interface as Measured in in-Situ X-Ray-Absorption Spectroscopy
Furtak TE, Wang L, Pant J, Pansewicz K, Hayes TM |
| 2374 - 2379 |
Studies of Polyimide Metal Interface
Lian SM, Chen KM, Hung A |
| 2379 - 2385 |
X-Ray Photoelectron Spectroscopic Analysis and Scanning Electron-Microscopic Observation of the Lithium Surface Immersed in Nonaqueous Solvents
Kanamura K, Shiraishi S, Tamura H, Takehara Z |
| 2386 - 2390 |
Control of Magnetic-Properties of Chemically Deposited Cobalt Nickel-Phosphorus Films by Electrolysis
Matsubara H, Yamada A |
| 2391 - 2402 |
Evolution of Crystallinity During the Electrodeposition of Body-Centered-Cubic Thallium(III) Oxide Onto Glassy-Carbon
Phillips RJ, Golden TD, Shumsky MG, Switzer JA |
| 2402 - 2409 |
Hot-Electron Reduction at Etched N-Si/Pt Thin-Film Electrodes
Frese KW, Chen C |
| 2409 - 2413 |
Electrochemical-Behavior of N-Type CdTe in the Presence of a Monoelectronic Oxidizing-Agent (Ce4+)
Marin FI, Vigneron J, Debiemmechouvy C, Triboulet R, Lincot D, Etcheberry A |
| 2413 - 2416 |
Current Distribution in a Positive Current Collector of a Sodium-Selenium(IV) Molten-Salt Battery
Matsunaga M, Morimitsu M, Obata S, Hosokawa K, Rikihisa K, Adachi K |
| 2416 - 2421 |
Mathematical-Model of the Anodic-Oxidation of Lead
Stewart LL, Bennion DN, Lafollette RM |
| 2422 - 2429 |
Electrochemical Oxidation of Manganese(II) in HClO4 Solutions
Zhang H, Park SM |
| 2430 - 2434 |
Electrochemical Adsorption-Desorption of Hydrogen on Amorphous Ni40Nb60 in Alkaline Media
Ciureanu M, Yang QM, Ryan DH, Stromolsen JO |
| 2435 - 2438 |
Electrochromic Properties of Tungsten Trioxide Thin-Films Prepared by Photochemical Vapor-Deposition
Maruyama T, Kanagawa T |
| 2439 - 2442 |
Electrochromism of Niobium Oxide Thin-Films Prepared by the Sol-Gel Process
Ohtani B, Iwai K, Nishimoto S, Inui T |
| 2443 - 2453 |
Limitations on the Use of Ion-Implantation for the Study of the Reactive Element Effect in Beta-NiAl
Pint BA, Hobbs LW |
| 2453 - 2459 |
Neutral Particle-Flux Calculations in Plasma-Etching for Cylindrical Trench Holes
Hubner H, Engelhardt M |
| 2460 - 2464 |
Characterization and Elimination of Defects in Oxide Layers Grown on Czochralski Silicon Substrates
Itsumi M |
| 2465 - 2469 |
Electrokinetic Characteristics of Nitride Wafers in Aqueous-Solutions and Their Impact on Particulate Deposition
Jan DE, Raghavan S |
| 2470 - 2473 |
Extrinsic Conditions for Low-Temperature Silicon Homoepitaxy
Kim SK, Lee HH |
| 2474 - 2477 |
Metal-Oxide-Semiconductor Capacitance Measurements on Amorphous-Silicon
Neitzert HC, Loffler S, Klausmann E, Fahrner WR |
| 2478 - 2482 |
Use of Atmospheric-Pressure Ionization Mass-Spectrometry to Monitor Hydrocarbon Type Impurities in Bulk Nitrogen
Ridgeway RG, Ketkar SN, Depinillos JV |
| 2483 - 2486 |
Spectroscopic Ellipsometry Investigation of Amorphous-Silicon Nitride Thin-Films
Troliermckinstry S, Hu HG, Carim AH |
| 2487 - 2493 |
Generation Mechanism of Photoresist Residue After Ashing
Usujima A, Yasui M, Aoyama M, Shioya Y |
| 2493 - 2497 |
Anisotropic Etching of Silicon in Rubidium Hydroxide
Wang T, Surve S, Hesketh PJ |
| 2498 - 2502 |
Eliminating the Surface Inversion Layer Under the Field Oxide by Low-Pressure Rapid Thermal Annealing
Wu YL, Lin JJ, Hwu JG |
| 2503 - 2510 |
Electrochemical Planarization for Multilevel Metallization
Contolini RJ, Bernhardt AF, Mayer ST |
| 2511 - 2513 |
High-Resolution Images of Pd Particles Supported on Highly Oriented Pyrolytic-Graphite and Glassy-Carbon
Murakami Y, Naoi K, Yahikozawa K, Takasu Y |
| 2513 - 2515 |
Factors Affecting the Conductivity of Copper-Coated Direct-Current Electroluminescent Phosphor
Tsang LF, Anderson J, Brown N |
| 2516 - 2522 |
In-Situ X-Ray-Absorption Fine-Structure Study on Structure Transformation and Electronic-State of Various Pt Particles on Carbon Electrode
Yoshitake H, Yamazaki O, Ota K |
| 2522 - 2532 |
The Perspectives of Silicon-on-Insulator Technologies for Cryogenic Applications
Claeys C, Simoen E |
| 2533 - 2536 |
Spectral Behavior of Zero-Bias Photocurrent at Low-Temperature in Bulk Semiinsulating Gaascr
Germanova K, Donchev V, Ivanov I, Zheleva N, Hardalov C |
| 2536 - 2541 |
Interfacial Diffusion of Metal Atoms During Air Annealing of Chemically Deposited ZnS-Cus and PbS-Cus Thin-Films
Huang L, Nair PK, Nair MT, Zingaro RA, Meyers EA |
| 2541 - 2544 |
Silicon-Wafer Etching by Transmitted Electron-Beam-Enhanced Plasma
Inanami R, Shao CL, Morita S |
| 2545 - 2551 |
Simulation of Rarefied-Gas Transport and Profile Evolution in Nonplanar Substrate Chemical-Vapor-Deposition
Coronell DG, Jensen KF |
| 2552 - 2556 |
Gate Oxide Degradation Caused by Anomalous Oxidation of Bf2 Ion-Implanted Mosi2 on Polycrystalline Silicon
Kato J, Takeuchi M, Tanaka K |
| 2556 - 2559 |
Anisotropy of Porous Anodization of Aluminum for VLSI Technology
Lazarouk S, Baranov I, Maiello G, Proverbio E, Decesare G, Ferrari A |
| 2559 - 2563 |
Effects of SiH4, GeH4, and B2H6 on the Nucleation and Deposition of Polycrystalline Si1-xGex Films
Lin HC, Chang CY, Chen WH, Tsai WC, Chang TC, Jung TG, Lin HY |
| 2564 - 2566 |
Development of an Electrochemical Oxygen Sensor for Czochralski Silicon Melts
Seidl A, Marten R, Muller G |
| 2567 - 2572 |
Growth Defect Observation with Pyramidal Hillock and Reduction by Photoexcited Hydrogen in Si CVD with Sih2Cl2
Takakuwa Y, Mazumder MK, Miyamoto N |
| 2573 - 2577 |
Effect of Pt/Al2O3 Catalyst on GaAs Grown by Low-Pressure TEAS-TMGa Organometallic Vapor-Phase Epitaxy
Wang XL, Noda S, Takeda Y, Sasaki A |
| 2577 - 2577 |
Correlation of 150 mm P/P’ Epitaxial Wafer Flatness Parameters for Deep-Submicron Applications, (Vol 140, Pg 229, 1993)
Huff HR, Popham GH, Potter RW |
| L103 - L105 |
Quartz-Crystal Electrogravimetry with Controlled Hydrodynamics - Applications to the Study of Nickel Electrodeposition
Arkam C, Bouet V, Gabrielli C, Maurin G, Perrot H |
| L106 - L107 |
A 4V Lithium Manganese Oxide Cathode for Rocking-Chair Lithium-Ion Cells
Huang HT, Bruce PG |
| L108 - L110 |
Electrochemical Deposition of Uniform Lithium on an Ni Substrate in a Nonaqueous Electrolyte
Kanamura K, Shiraishi S, Takehara Z |
| L111 - L112 |
Ion Sensor with Photocurable Polyurethane Polymer Membrane
Bratov A, Abramova N, Munoz J, Dominguez C, Alegret S, Bartroli J |
| L113 - L114 |
Electrodeposition at an Ice-Coated Electrode
Glenn DF, Ingram JC |
| L115 - L117 |
Electrodeposition of Al-Cr Metallic-Glass
Moffat TP |
| L118 - L120 |
Morphology of Ultrafine RuO2-IrO2 Binary Oxide Particles Prepared by a Sol-Gel Process
Murakami Y, Miwa K, Ueno M, Ito M, Yahikozawa K, Takasu Y |
| L120 - L122 |
Observation of Oxygen Precipitates in Cz-Grown Si Wafers with a Phase Differential Scanning Optical Microscope
Kimura S |
| L123 - L124 |
A Low-Noise Contact for Rotating Electrodes
Fei Z, Hudson JL, Kelly RG |
| L125 - L126 |
Detection of D2O in Water Isotopes Using a High-Temperature Protonic Conductor
Hibino T, Iwahara H |
| L127 - L130 |
Electrochemical and Structural-Properties of SnO2 and Sbsno2 Transparent Electrodes with Mixed Electronically Conductive and Ion-Storage Characteristics
Orel B, Lavrencicstangar U, Kalcher K |
| L130 - L132 |
Electrochemical Reduction of Liquid CO2 - Drastic Enhancement of Current-Density
Saeki T, Hashimoto K, Noguchi Y, Omata K, Fujishima A |
| L132 - L134 |
Life Tests of Carbon-Supported Pt-Cr-Cu Electrocatalysts in Solid-Polymer Fuel-Cells
Tamizhmani G, Capuano GA |
