Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.12, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (48 articles)

1 - 6	In-Situ X-Ray Photoemission Spectroscopic Studies of Al/SiO2 Interface Formation Tsukada M, Ohfuji SI
7 - 11	Passivation SiO2 on HgCdTe by Direct Photochemical-Vapor Deposition Lin JD, Su YK, Chang SJ, Yokoyama M, Juang FY
12 - 18	Thickness Determination of Thin Oxide Layers at the Bottom of Contact Holes of Semiconductor-Devices by Auger-Electron Spectroscopy Pamler W, Mathuni J
19 - 22	Aligned Au-Si Eutectic Bonding of Silicon Structures Shoaf SE, Feinerman AD
23 - 28	Pb Preadsorption Facilitates Island Formation During Ga Growth on Si(111) Hibino H, Shimizu N, Sumitomo K, Shinoda Y, Nishioka T, Ogino T
29 - 34	Metallization of Teflon PFA .1. Interactions of Evaporated Cr and Al Measured by X-Ray Photoelectron-Spectroscopy Shi MK, Lamontagne B, Selmani A, Martinu L, Sacher E, Wertheimer MR, Yelon A
35 - 43	Correlation of X-Ray Photoelectron-Spectroscopy and Rutherford Backscattering Spectroscopy Depth Profiles on Hg1-xCdxTe Native Oxides Winton GH, Faraone L, Lamb R
44 - 50	X-Ray Photoelectron-Spectroscopy Study of X-Ray Irradiated Metal Fluoropolymer Interfaces Shi MK, Lamontagne B, Selmani A, Martinu L
51 - 55	Photoemission-Study of Evaporated Cuins(2) Thin-Films .1. Surface Stoichiometry and Phase Segregation Scheer R, Lewerenz HJ
56 - 60	Photoemission-Study of Evaporated Cuins(2) Thin-Films .2. Electronic Surface-Structure Scheer R, Lewerenz HJ
61 - 68	3-Dimensional Simulation of Surface Evolution During Growth and Erosion Katardjiev IV, Carter G, Nobes MJ, Berg S, Blom HO
69 - 74	Dependence of Etch Characteristics on Charge Particles as Measured by Langmuir Probe in a Multipolar Electron-Cyclotron-Resonance Source Sung KT, Juan WH, Pang SW, Dahimene M
75 - 82	Comparing Reactive Ion Etching of III-V Compounds in Cl-2/BCl3/Ar and Ccl2F2/BCl3/Ar Discharges Juang YZ, Su YK, Shei SC, Fang BC
83 - 89	Low-Temperature Radio-Frequency Sputter-Deposition of Tin Thin-Films Using Optical-Emission Spectroscopy as Process Monitor Pang Z, Boumerzoug M, Kruzelecky RV, Mascher P, Simmons JG, Thompson DA
90 - 96	Plasma-Enhanced Chemical-Vapor-Deposition of A-SiC-H Films from Organosilicon Precursors Loboda MJ, Seifferly JA, Dall FC
97 - 105	Angular Impact Energy-Distributions of Argon Ions at the Powered Electrode of a Helicon Plasma Source Janes J
106 - 113	Metastable Argon Beam Source Using a Surface-Wave Sustained Plasma Bannister ME, Cecchi JL
114 - 119	Characterization of Electron-Cyclotron-Resonance Microwave Plasma Under Critical Configuration of Magnetic-Field Bai PG, Liu J, Parikh N, Swanson M
120 - 124	Deposition of Gallium Oxide and Indium Oxide on GaAs for in-Situ Process Use by Alternating Supply of TEGa, Tmin, and H2O2 as Surge Pulses Ozasa K, Ye TC, Aoyagi Y
125 - 129	Improved Heteroepitaxial Growth of Layered NbSe2 on GaAs (111)B Yamamoto H, Yoshii K, Saiki K, Koma A
130 - 134	Effects of Plasma Enhancement on the Carrier-Gas-Free Metalorganic Chemical-Vapor-Deposition of Oxide Superconducting Thin-Films Kanehori K, Saito S, Sugii N, Imagawa K
135 - 139	Structural and Morphological Characterization of Nb2O5 Thin-Films Deposited by Reactive Sputtering Rosenfeld D, Sanjines R, Levy F, Buffat PA, Demarne V, Grisel A
140 - 147	Surface Reconstructions of (001) CdTe and Their Role in the Dynamics of Evaporation and Molecular-Beam Epitaxy Growth Tatarenko S, Bassani F, Klein JC, Saminadayar K, Cibert J, Etgens VH
148 - 152	Mo-Si Multilayer as Soft-X-Ray Mirrors for the Wavelengths Around 20 nm Region Kim D, Lee HW, Lee JJ, Je JH, Sakurai M, Watanabe M
153 - 157	Selective Deposition of Copper by Chemical-Vapor-Deposition Using Cu(Hfa)(2) Kim DH, Wentorf RH, Gill WN
158 - 160	Reactive Evaporation of Potassium in CO2 and the Formation of Bulk Intermediates Axelsson O, Paul J, Weisel MD, Hoffmann FM
161 - 168	C49/C54 Phase-Transformation During Chemical-Vapor-Deposition of TiSi2 Engqvist J, Jansson U, Lu J, Carlsson JO
169 - 173	Adhesion Measurement of Ti Thin-Films on Si Substrate Using Internal-Stress in Overcoated Ni Films Kondo I, Takenaka O, Kamiya T, Hayakawa K, Kinbara A
174 - 178	Reflection High-Energy Electron-Diffraction Patterns of Carbide-Contaminated Silicon Surfaces Becker JP, Long RG, Mahan JE
179 - 184	Mass Spectroscopic Study of the Cracking of Trimethylgallium in a Heated Doser Lin R, Cadwell L, Masel RI
185 - 191	Adhesion Durability of Tantalum Bpda-PDA Polyimide Interfaces Callegari AC, Clearfield HM, Furman BK, Graham TG, Neugroschl D, Purushothaman S
192 - 198	Adhesion, Surface-Morphology, and Gas-Sensing Characteristics of Thin-Gold-Film Chemical Sensors Yoo KS, Sorensen LW, Glaunsinger WS
199 - 203	Initial Metal Fluoride Formation at Metal/Fluorocarbon Interfaces John PJ, Liang J
204 - 215	Thermodynamic Analysis of Ash3 and PH3 Decomposition Including Subhydrides Jordan AS, Robertson A
216 - 218	Photodissociation of SF6 Near the F 1S Absorption-Edge Mochiji K, Lee K, Ma CI, Kim DY, Mahalingam M, Hanson DM
219 - 223	Purity of Atomic Oxygen Production from Heated Iridium Surfaces Smentkowski VS, Yates JT
224 - 227	Characterization of Heated Platinum Filaments as a Source of Atomic Oxygen Smentkowski VS, Yates JT
228 - 234	Nonlinearities in Sensitivity of Quadrupole Partial-Pressure Analyzers Operating at Higher Gas-Pressures Cowen MC, Allison W, Batey JH
235 - 240	Miniature Cryosorption Vacuum Pump for Portable Instruments Piltingsrud HV
241 - 247	Pump Down of Evacuated Glazing Clugston DA, Collins RE
248 - 250	Proposal of a Sputter-Ion Pump Structure Suetsugu Y
251 - 254	Properties of Polysilicon Films Deposited on Amorphous Substrates Using Reactive Plasma Beam Deposition Technique Moradi B, Dalal VL, Knox R
255 - 257	Segregation to the (100) Surface of Dilute Cu-Ag Alloys Liu YS, Wynblatt P
258 - 261	Anisotropic Effects in Glass Substrates Heated in Vacuum Wu QH, Hodgkinson IJ
262 - 263	Construction of Brazed Be Windows for Ultrahigh-Vacuum Use Navrotski G
264 - 264	Zero-Profile Differentially Pumped Window for Ultrahigh-Vacuum Tobin RG, Chung C, Luo JS
265 - 266	Modification of the Phi Sample Mount for Multiple- or Micropositioning for Zalar Rotation Neiman DL, Turner JE, Soo P
267 - 267	X-Ray Photoelectron Spectroscopic Comparison of Sputtered Ti, Ti6Al4V, and Passivated Bulk Metals for Use in Cell-Culture Techniques (Vol A9, Pg 1329, 1991) Sodhi RN, Weninger A, Davies JE, Sreenivas K