Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.18, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (46 articles)

1 - 9	Study on polymeric neutral species in high-density fluorocarbon plasmas Teii K, Hori M, Ito M, Goto T, Ishii N
10 - 16	Precursor chemistry and film growth with (methylcyclopentadienyl) (1,5-cyclooctadiene)iridium Sun YM, Yan XM, Mettlach N, Endle JP, Kirsch PD, Ekerdt JG, Madhukar S, Hance RL, White JM
17 - 22	Influence of second phases on the ferroelectric properties of SrBi2TaNbO9 thin films fabricated by radio-frequency magnetron sputtering Park YB, Jang SM, Lee JK, Park JW
23 - 29	Ionization enhancement in ionized magnetron sputter deposition Joo J
30 - 36	Structure, hardness, and tribological properties of reactive magnetron sputtered chromium nitride films He XM, Baker N, Kehler BA, Walter KC, Nastasi M, Nakamura Y
37 - 41	Biased target deposition Zhurin VV, Kaufman HR, Kahn JR, Hylton TL
42 - 47	Defect formation upon reactive direct-current magnetron sputtering of GeO2 films Njoroge W, Lange T, Weis H, Kohnen B, Wuttig M
48 - 50	Low-temperature deposition of Si thin layer by gas-source molecular beam epitaxy Ohtsuka K, Murai A, Oizumi T, Yoshida T, Kurabayashi T, Suto K, Nishizawa J
51 - 57	Direct low-temperature chemical vapor deposition of fully crystalline micro- and polycrystalline silicon thin films on SiO2 using plasma immersion ion implantation Shin JH, Huh H
58 - 62	Monitoring plasma impedance match characteristics in a multipole inductively coupled plasma for process control Kim B, Lee C
63 - 67	Multisource plasma chemical vapor deposition for synthesis of SiNx-SiOy and SiNx-SiCy composite films Nonogaki R, Yamada S, Wada T
68 - 73	Amorphous hydrogenated carbon film formation from benzene by electron cyclotron resonance chemical vapor deposition Chen XH, Ning ZY, Hess DW, Tolbert LM
74 - 78	Automated electron cyclotron resonance plasma enhanced chemical vapor deposition system for the growth of rugate filters Swart PL, Lacquet BM, Chtcherbakov AA, Bulkin PV
79 - 82	Low-temperature growth of epitaxial LaNiO3/Pb(Zr0.52Ti0.48)O-3/LaNiO3 on Si(001) by pulsed-laser deposition Wu WB, Wong KH, Choy CL
83 - 86	Stoichiometric indium oxide thin films prepared by pulsed laser deposition in pure inert background gas Yamada Y, Suzuki N, Makino T, Yoshida T
87 - 93	Preparation and stability of low temperature cobalt and nickel silicides on thin polysilicon films Howell RS, Sarcona G, Saha SK, Hatalis MK
94 - 98	Chemical vapor deposition of pyrolytic boron nitride from borazine Demin VN, Asanov IP, Akkerman ZL
99 - 107	Cathodic plasma polymerization and treatment by anode magnetron torch. I. The influence of operating parameters on anode magnetron torch glow discharge Zhao JG, Yasuda HK
108 - 114	Expanding microwave plasma for steel carburizing: Role of the plasma impinging species on the steel surface reactivity Jauberteau I, Cinelli MJ, Cahoreau M, Jauberteau JL, Aubreton J
115 - 120	Nonlinear amplitude evolution during spontaneous patterning of ion-bombarded Si(001) Erlebacher J, Aziz MJ, Chason E, Sinclair MB, Floro JA
121 - 130	Microstructural evolution during tempering of arc-evaporated Cr-N coatings Almer J, Oden M, Hultman L, Hakansson G
131 - 136	Influence of Mg on the corrosion of Al Baer DR, Windisch CF, Engelhard MH, Danielson MJ, Jones RH, Vetrano JS
137 - 142	Alternating ion bombardment technique for wall surface control in depositive plasma processing Nakamura K, Ohwaki M, Yoneda S, Sugai H
143 - 148	Annealing effects on the interfacial reactions of Ni on Si0.76Ge0.24 and Si1-x-yGexCy Luo JS, Lin WT, Chang CY, Shih PS, Pan FM
149 - 157	Defect-permeation correlation for ultrathin transparent barrier coatings on polymers Sobrinho ASD, Czeremuszkin G, Latreche M, Wertheimer MR
158 - 165	High aspect ratio SiO2 etching with high resist selectivity improved by addition of organosilane to tetrafluoroethyl trifluoromethyl ether Chinzei Y, Feurprier Y, Ozawa M, Kikuchi T, Horioka K, Ichiki T, Horiike Y
166 - 175	Consideration of local shadowing and ion beam voltage effects in the prediction of a surface evolving under ion milling Klein EJ, Ramirez WF
176 - 180	Influence of electron shading on highly selective SiO2 to Si etching Yonekura K, Katayama T, Maruyama T, Fujiwara N, Miyatake H
181 - 187	Dry etching of platinum films with TiN masks in an Ar/O-2 helicon wave plasma Chiang MC, Pan FM, Cheng HC, Liu JS, Chan SH, Wei TC
188 - 196	Feature evolution during plasma etching. II. Polycrystalline silicon etching Lane JM, Klemens FP, Bogart KHA, Malyshev MV, Lee JTC
197 - 206	Mask charging and profile evolution during chlorine plasma etching of silicon Bogart KHA, Klemens FP, Malyshev MV, Colonell JI, Donnelly VM, Lee JTC, Lane JM
207 - 212	Defect analysis of Cl-2/HBr/He/O-2 etching process by imaging time-of-flight secondary ion mass spectrometry Zhao J, Reich DF, Nguyen TT, Zhao L, Hossain TZ
213 - 231	Plasma abatement of perfluorocompounds in inductively coupled plasma reactors Xu XD, Rauf S, Kushner MJ
232 - 236	Using a quartz crystal microbalance for low energy ion beam etching studies Doemling MF, Lin B, Rueger NR, Oehrlein GS, Haring RA, Lee YH
237 - 243	Detailed simulation of mass spectra for quadrupole mass spectrometer systems Gibson JR, Taylor S, Leck JH
244 - 247	Vacuum gauge self-compensating external environment in the SPring-8 storage ring Saeki H, Momose T
248 - 256	X-ray photoelectron spectroscopy studies of novel Pi-conjugated ethynyl thiophene containing Pd(II) complexes and of their interaction with chromium Iucci G, Polzonetti G, Altamura P, Paolucci G, Goldoni A, Russo MV
257 - 260	Measuring the electrical characteristics of thin polymeric films Gladys M, Greig P, Dastoor P
261 - 267	Effect of thermal annealing on hole trap levels in Mg-doped GaN grown by metalorganic vapor phase epitaxy Zhu QS, Nagai H, Kawaguchi Y, Hiramatsu K, Sawaki N
268 - 272	Long term stability of dry etched magnetoresistive random access memory elements Jung KB, Marburger J, Sharifi F, Park YD, Lambers ES, Pearton SJ
273 - 277	Analysis of alkali elements in insulators using a CAMECA IMS-6f McKinley JM, Stevie FA, Granger CN, Renard D
278 - 284	Comparative study of a-C : H films for inertial confinement fusion prepared with various hydrocarbon precursors by radio frequency-plasma enhanced chemical vapor deposition Theobald M, Durand J, Baclet P, Legaie O
285 - 287	Plasma-assisted reduction of carbon dioxide in the gas phase Maya L
288 - 289	Influence of lubricating conditions of fixing bolts on penetration of ConFlat (R) flange knife edge into gasket Kurokouchi S
290 - 292	Cryogenic substrate cooling or substrate heating without vacuum feedthroughs Smith WF, Stokes BG, Crawford JF
293 - 293	Epitaxial growth of ZnY ferrite films by pulsed laser deposition (vol 17, pg 3111, 1999) Kim H, Horwitz JS, Pique A, Newman HS, Lubitz P, Miller MM, Knies DL, Chrisey DB