Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.19, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (62 articles)

1 - 8	Surface science with nanosized particles in a carrier gas Keller A, Fierz M, Siegmann K, Siegmann HC, Filippov A
9 - 16	Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Effect of plasma modes and process parameters Raveh A, Brewer J, Irene EA
17 - 24	Nitridation of thermal SiO2 films by radio-frequency plasma assisted electron cyclotron resonance: Layer structure and composition Raveh A, Brewer J, Irene EA
25 - 30	Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas Kastenmeier BEE, Matsuo PJ, Oehrlein GS, Ellefson RE, Frees LC
31 - 37	In situ characterization of residues formed on a plasma-etching chamber Kawada H, Yamane M, Kitsunai H, Suzuki S
38 - 40	Remote-plasma-enhanced reaction between a silicon surface and trifluoro-acetyl-fluoride gas Saito Y, Yamazaki H, Mouri S
41 - 44	Electrical conduction studies of plasma enhanced chemical vapor deposited silicon nitride films Bose M, Basa DK, Bose DN
45 - 55	Absolute intensities of the vacuum ultraviolet spectra in oxide etch plasma processing discharges Woodworth JR, Riley ME, Arnatucci VA, Hamilton TW, Aragon BP
56 - 61	Effects of ozone assisted deposition on the dielectric properties of 90 degrees off-axis radio frequency magnetron sputtered SrTiO3 Gibbons BJ, Fan Y, Findikoglu AT, Jia QX, Reagor DW
62 - 65	Thin film growth of reactive sputter deposited tungsten-carbon thin films Rack PD, Peterson JJ, Li J, Geiculescu AC, Rack HJ
66 - 75	Plasma etching endpoint detection using multiple wavelengths for small open-area wafers Yue HH, Qin SJ, Wiseman J, Toprac A
76 - 86	Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources Kinder RL, Kushner MJ
87 - 89	Technology and realization of metallic curved waveguide mirrors in polymer film waveguides based on anisotropic plasma etching Wolff S, Grosse A, Schimper HJ, Giehl AR, Kuhnke M, Grote R, Fouckhardt H
90 - 96	Predeposition ultraviolet treatment for adhesion improvement of thin films on mercury cadmium telluride Butcher KSA, Tansley TL, Prince K, Leech PW
97 - 100	Quartz-crystal microbalance study for characterizing atomic oxygen in plasma ash tools Srivastava AK, Sakthivel P
101 - 107	Quantification of a radical beam source for methyl radicals Schwarz-Selinger T, Dose V, Jacob W, von Keudell A
108 - 117	Theoretical and experimental characterization of a low-pressure rf plasma and its optimization in electron-gas secondary-neutral mass spectrometry Bieck W, Merz E, Gnaser H, Oechsner H
118 - 123	Doped CHx microshells prepared by radio frequency plasma enhanced chemical vapor deposition for inertial confinement fusion experiments Theobald M, Baclet P, Legaie O, Durand J
124 - 129	Crystallization of nanostructured silicon films deposited under a low-pressure argon-silane pulsed-glow discharge: Correlation with the plasma duration Hadjadj A, Beorchia A, Boufendi L, Huet S, Cabarrocas PRI
130 - 135	Fracture resistance enhancement of diamond-like carbon/nitrogenated diamond-like carbon multilayer deposited by electron cyclotron resonance microwave plasma chemical vapor deposition Qi J, Lai KH, Bello I, Lee CS, Lee ST, Luo JB, Wen SZ
136 - 144	Chemical stability of Sin+ species in SiOx (x < 2) thin films Barranco A, Mejias JA, Espinos JP, Caballero A, Gonzalez-Elipe AR, Yubero F
145 - 152	Effects of electron-beam irradiation on the properties of CN thin films deposited by direct dual ion beams Kim YH, Lee DY, Kim IK, Baik HK
153 - 157	Fundamental study of ion-irradiation effects on the columnar growth of chromium films prepared by ion-beam and vapor deposition Kuratani N, Ebe A, Ogata K, Shimizu I, Setsuhara Y, Miyake S
158 - 166	Observations of the microscopic growth mechanism of pillars and helices formed by glancing-angle thin-film deposition Malac M, Egerton RF
167 - 170	Influence of sputtering pressure on physical structure of AIN thin films prepared on Y-128 degrees LiNbO3 by rf magnetron sputtering Wu L, Wu S, Song HT
171 - 174	Influence of deposition conditions on the thermal stability of ZnO : Al films grown by rf magnetron sputtering Haug FJ, Geller ZS, Zogg H, Tiwari AN, Vignali C
175 - 181	Atomistic simulation of fluorocarbon deposition on Si by continuous bombardment with energetic CF+ and CF2+ Abrams CF, Graves DB
182 - 191	Synchrotron x-ray diffraction and transmission electron microscopy studies of interfacial reaction paths and kinetics during annealing of fully-002-textured Al/TiN bilayers Chun JS, Carlsson JRA, Desjardins P, Bergstrom DB, Petrov I, Greene JE, Lavoie C, Cabral C, Hultman L
192 - 199	Structural and electrical characteristics of Y2O3 films grown on oxidized Si(100) surface Cho MH, Ko DH, Choi YG, Jeong K, Lyo IW, Noh DY, Kim HJ, Whang CN
200 - 206	Thickness dependence of Y2O3 films grown on an oxidized Si surface Cho MH, Ko DH, Choi YK, Lyo IW, Jeong K, Whang CN, Kim HJ, Noh DY
207 - 214	Interfacial chemistry of the Ba/SiOxNy/Si(100) nanostructure Kirsch PD, Ekerdt JG
215 - 222	Anomalies in kinetics of hydrogen evolution from austenitic stainless steel from 300 to 1000 degrees C Nemanic V, Zajec B, Setina J
223 - 227	Intrinsic stress of Co35Pd65 alloy films Jen SU, Chung CM
228 - 231	Thin-walled vacuum chambers of austenitic stainless steel Moore BC
232 - 239	Microstructure and secondary phases in coevaporated CuInS2 films: Dependence on growth temperature and chemical composition Alvarez-Garcia J, Perez-Rodriguez A, Romano-Rodriguez A, Morante JR, Calvo-Barrio L, Scheer R, Klenk R
240 - 245	Hydrogenation characteristics and observation of disintegration conditions of Ti-Mo and Ni-coated Ti-Mo thin films Shi LQ, Zhou ZY, Zhao GQ, He MH
246 - 250	Structural characterization of polycrystalline Cd-Te-In films Zapata-Torres M, Castro-Rodriguez R, Martel A, Mascarenhas YP, Guevara J, Melendez-Lira M, Pena JL
251 - 261	Efficient modeling of thin film deposition for low sticking using a three-dimensional microstructural simulator Smy T, Dew SK, Joshi RV
262 - 266	Hydrocarbon thin films produced from adamantane-diamond surface deposition: Molecular dynamics simulations Plaisted TA, Sinnott SB
267 - 274	Effects of chemical etching with nitric acid on glass surfaces Jang HK, Chung YD, Whangbo SW, Kim TG, Whang CN, Lee SJ, Lee S
275 - 279	Electron-beam-assisted evaporation of epitaxial CeO2 thin films on Si substrates Inoue T, Yamamoto Y, Satoh M
280 - 286	GaN grown on two-step cleaned C-terminated 6H-SiC by molecular-beam epitaxy Guan ZP, Cai AL, Porter H, Cabalu J, Chen J, Huang S, Giedd RE
287 - 291	Model of crystal lattice strained along the preferential direction by anisotropic stress for GaAs heteroepitaxial films grown on vicinal Si(001) and Si(110) substrates by molecular-beam epitaxy Yodo T
292 - 294	In situ determination of growth rate by pyrometric interferometry during molecular-beam epitaxy: Application to the growth of AlGaN/GaN quantum wells Ng HM, Chu SNG, Cho AY
295 - 298	Enhancement of tribological properties of 9Cr18 stainless steel by dual Mo and SCo implantation Zhang T, Song JH, Li GQ, Chu PK, Brown IG
299 - 305	Preparation of AlN films by pulsed laser deposition using sintered aluminum nitride and elemental aluminum as raw materials Wu JD, Sun J, Ying ZF, Shi W, Ling H, Li FM, Zhou ZY, Wang KL, Ding XM
306 - 310	Structural properties of CdS-doped glass nanocrystallites grown by pulsed laser deposition in high vacuum Wang H, Zhu Y, Ong PP
311 - 316	Effect of chamber pressure and atmosphere on the microstructure and nanomechanical properties of amorphous carbon films prepared by pulsed laser deposition Wei Q, Sankar J, Sharma AK, Yamagata Y, Narayan J
317 - 324	Measurements of viscosity, velocity slip coefficients, and tangential momentum accommodation coefficients using a modified spinning rotor gauge Bentz JA, Tompson RV, Loyalka SK
325 - 328	Heat dissipation in thin-film vacuum sensor Berlicki TM
329 - 344	Transient analysis of carrier gas saturation in liquid source vapor generators Mayer B, Collins CC, Walton M
345 - 348	Process and fabrication of a lead zirconate titanate thin film pressure sensor Zakar E, Dubey M, Piekarski B, Conrad J, Piekarz R, Widuta R
349 - 352	Vacuum gauge system with a self-compensator for photoelectrons produced in the SPring-8 storage ring Saeki H, Aoki T, Yonehara H, Momose T
353 - 357	Thermal micropressure sensor for pressure monitoring in a minute package Wang SN, Mizuno K, Fujiyoshi M, Funabashi H, Sakata J
358 - 364	Modeling a microfluidic system using Knudsen's empirical equation for flow in the transition regime Robertson JK, Wise KD
365 - 371	True and measured outgassing rates of a vacuum chamber with a reversibly adsorbed phase Akaishi K, Nakasuga M, Funato Y
372 - 375	Calculated energetics for adsorption and desorption steps during etching of Si(110) surface by Cl Halicioglu T
376 - 378	Analysis of Langmuir probe data: Analytical parametrization, and the importance of the end effect Narasimhan G, Steinbruchel C
379 - 382	Enhanced coercivity by substrate bias configuration in Co-based alloy thin film Jin D, Wang JP, Gong H
383 - 385	Molecular beam epitaxy system at an undergraduate institution Celinski Z
386 - 387	All-metal ultrahigh vacuum optical fiber feedthrough Miller DL, Moshegov NT
388 - 388	Evolution of integrated-circuit vacuum processes: 1959-1975 (vol 18, pg 1736, 2000) Waits RK