Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.20, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (47 articles)

1 - 6	Titanium atom densities in reactive rf magnetron sputtering for TiO2 deposition Nakamura T, Okimura K
7 - 13	Theoretical study of Cr diffusion in Co-Cr alloy thin film recording media Jin D, Wang JP, Gong H
14 - 23	Model for an inductively coupled Ar/c-C4F8 plasma discharge Rauf S, Ventzek PLG
24 - 29	Generation of a capacitively coupled microplasma and its application to the inner-wall modification of a poly(ethylene terephthalate) capillary Yoshiki H, Oki A, Ogawa H, Horiike Y
30 - 32	Deposition of silicon nitride films by pulsed laser ablation of the Si target in nitrogen gas Umezu I, Kohno K, Yamaguchi T, Sugimura A, Inada M
33 - 36	Reduction of residual gas in a sputtering system by auxiliary sputter of rare-earth metal Li DJ
37 - 42	Parametrization of optical properties of indium-tin-oxide thin films by spectroscopic ellipsometry: Substrate interfacial reactivity Losurdo M, Giangregorio M, Capezzuto P, Bruno G, De Rosa R, Roca F, Summonte C, Pla J, Rizzoli R
43 - 52	Effect of chamber wall conditions on Cl and Cl-2 concentrations in an inductively coupled plasma reactor Ullal SJ, Godfrey AR, Edelberg E, Braly L, Vahedi V, Aydil ES
53 - 59	Morphological transitions of Si1-xGex films growing on Si(100). I. Gas-source molecular-beam epitaxy: From two-dimensional growth to growth in the Stranski-Krastanov mode Akazawa H
60 - 67	Morphological transition of Si1-xGex films growing on Si(100). II. Synchrotron-radiation-excited chemical-vapor deposition: From two-dimensional growth to growth in the Volmer-Weber mode Akazawa H
68 - 75	Combined effect of electrode gap and radio frequency on power deposition and film growth kinetics in SiH4/H-2 discharges Amanatides E, Mataras D, Rapakoulias DE
76 - 83	Oxidation of deuterium-, acetylene-, and ethylene-terminated Si(100) by atomic oxygen Litorja M, Buntin SA
84 - 86	Encapsulation materials for SrRuO3 to avoid H-2 anneal-induced decomposition Lin J, Tsunoda K, Eguchi K, Heida K, Matsunaga D
87 - 92	Plasma-enhanced chemical-vapor deposition of titanium aluminum carbonitride/amorphous-carbon nanocomposite thin films Shieh J, Hon MH
93 - 101	Electron stimulated carbon adsorption in ultrahigh vacuum monitored by Auger electron spectroscopy Scheuerlein C, Taborelli M
102 - 106	Optical properties of magnesium fluoride thin films produced by argon ion-beam assisted deposition Dumas L, Quesnel E, Pierre F, Bertin F
107 - 111	Effects of photoassisted O-2 annealing on the properties of (Ba,Sr)TiO3 thin films Chang SJ, Lee JS, Wei MC, Chen JF, Liu CH
112 - 116	Investigation of Pt/Ti bilayer on SiNx/Si substrates for thermal sensor applications Giani A, Mailly F, Pascal-Delannoy F, Foucaran A, Boyer A
117 - 124	Analysis of SiO2-to-Si3N4 selectivity in reactive ion etching using additional O-2 gas Matsui M, Uchida F, Kojima M, Tokunaga T, Yano F, Hasegawa M
125 - 131	Substrate temperature studies of SrBi2(Ta1-xNbx)(2)O-9 grown by pulsed laser ablation deposition Tay ST, Huan CHA, Wee ATS, Liu R, Goh WC, Ong CK, Chen GS
132 - 137	Plasma etching of cesium iodide Yang X, Hopwood J, Tipnis S, Nagarkar V, Gaysinskiy V
138 - 145	Retention of neon in graphite after ion beam implantation or exposures to the scrape-off layer plasma in the TEXTOR tokamak Kim YM, Philipps V, Rubel M
146 - 152	Modeling SiC etching in C2F6/O-2 inductively coupled plasma using neural networks Kim B, Kong SM, Lee BT
153 - 159	Experimental study of the influence of nanoparticle generation on the electrical characteristics of argon-silane capacitive radio-frequency plasmas Shen Z, Kortshagen U
160 - 164	Effects of bias voltage on the corrosion resistance of titanium nitride thin films fabricated by dynamic plasma immersion ion implantation-deposition Tian XB, Fu RKY, Chu PK
165 - 169	Ordering and surface state reduction of GaAs (100) by low energy S+ bombardment Zhao Q, Kwok RWM, Lau WM
170 - 173	Electron temperatures of inductively coupled Cl-2-Ar plasmas Fuller NCM, Donnelly VM, Herman IP
174 - 179	Ti diffusion in ion prebombarded MgO(100). I. A model for quantitative analysis Lu M, Lupu C, Styve VJ, Lee SM, Rabalais JW
180 - 188	Ti diffusion in ion prebombarded MgO(100). II. Effects of the irradiation spectrum Lu M, Lupu C, Lee SM, Rabalais JW
189 - 193	Comparison of fiber optics and standard nickel catalytic probes for determination of neutral oxygen atoms concentration Poberaj I, Mozetic M, Babic D
194 - 197	Characteristics of plasma enhanced chemical vapor deposited W-B-N thin films Kim DJ, Sim HS, Kim SI, Kim YT, Jeon H
198 - 201	Ultraviolet-assisted pulsed laser deposition of La0.7Ca0.3MnO3 thin films with improved oxygen content, crystallinity and magnetoresistive properties Kumar D, Pietambaram SV, Craciun V, Singh RK, Perriere J, Sankar J
202 - 205	Diamond nucleation enhancement on reconstructed Si(100) Van Chiem C, Kim JH, Shin HS, Seo JM
206 - 213	Dependence of ion beam induced nitrogen diffusion in aluminum on oxygen impurities Manova D, Huber P, Sienz S, Gerlach JW, Mandl S, Rauschenbach B
214 - 224	Performance analysis and optimization considerations for a Knudsen compressor in transitional flow Muntz EP, Sone Y, Aoki K, Vargo S, Young M
225 - 229	Chlorine dissociation fraction in an inductively coupled plasma measured by ultraviolet absorption spectroscopy Neuilly F, Booth JP, Vallier L
230 - 233	Density changes upon crystallization of Ge2Sb2.04Te4.74 films Njoroge WK, Woltgens HW, Wuttig M
234 - 238	Growth of ultrathin cobalt films on Fe(001) studied by reflection high-energy electron diffraction and x-ray diffraction Blomqvist P, Wappling R
239 - 244	Interactions of H2O with SrTiO3(100) surfaces Wang LQ, Ferris KF, Herman GS
245 - 250	Plasma treatment of polycarbonate for improved adhesion Hofrichter A, Bulkin P, Drevillon B
251 - 264	Optical emission characteristics and mode transitions in low-frequency inductively coupled plasmas Ostrikov KN, Xu S, Azam ABMS
265 - 269	Growth of high quality ZnO thin films at low temperature on Si(100) substrates by plasma enhanced chemical vapor deposition Li BS, Liu YC, Shen DZ, Lu YM, Zhang JY, Kong XG, Fan XW, Zhi ZZ
270 - 277	Optical diagnostics of radio-frequency plasmas containing CHF3 and CHF3/O-2: Laser-induced fluorescence of CF2, CF, and O atoms, and optical emission from H, F, and O Hancock G, Sucksmith JP
278 - 284	XPS instrument coupled with ALCVD reactor for investigation of film growth Sterner J, Kessler J, Stolt L
285 - 287	Simple design for the transportation of ex situ prepared hydrogen passivated silicon MacLaren DA, Curson NJ, Atkinson P, Holst B, Johnson DJ, Allison W
288 - 290	Molybdenum-doped indium oxide transparent conductive thin films Meng Y, Yang XL, Chen HX, Shen J, Jiang YM, Zhang ZJ, Hua ZY
291 - 293	Sample transfer system with longer displacement than the maximum stroke of the manipulator Cho SH, Chun MH, Zhu YC, Zhang J, Lee JK, Seo JM