Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.23, No.1 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (31 articles)

1 - 4	Growth of heteroepitaxial ZnO thin film and ZnO/(Mg,Zn)O nanomultilayer by off-axis rf magnetron sputtering Park JW, Park Y, Park JW, Jeon M, Lee JK
5 - 11	Design of functional coatings Hegemann D, Oehr C, Fischer A
12 - 17	Characteristics of Ti-Si-N coatings on geometrically complex-shaped surface Ma QS, Ma SL, Xu KW
18 - 22	Ionization of sputtered metals in high power pulsed magnetron sputtering Bohlmark J, Alami J, Christou C, Ehiasarian AP, Helmersson U
23 - 30	Collisional ion dynamics in capacitively coupled rf discharges Xiang N, Waelbroeck FL
31 - 38	Atomistic simulations of Ar+-ion-assisted etching of silicon by fluorine and chlorine Humbird D, Graves DB
39 - 43	Dynamic control of substrate bias for highly c-axis textured thin ferromagnetic CoCrTa film in inductively coupled plasma-assisted sputtering Okimura K, Oyanagi J
44 - 54	Influence of processing variables on the properties of dc magnetron sputtered NiAl coatings containing Hf additions Ning B, Shamsuzzoha M, Weaver ML
55 - 65	Outgassing of lower hybrid antenna modules during high-power long-pulse transmission Goniche M, Kazarian F, Bibet P, Maebara S, Seki M, Ikeda Y, Imai T
66 - 71	Pulsed dc operation of a Penning-type opposed target magnetron Moiseev T, Cameron DC
72 - 77	Preparation and characterization of atomically clean, stoichlometric surfaces of AIN(0001) Mecouch WJ, Wagner BP, Reitmeier ZJ, Davis RF, Pandarinath C, Rodriguez BJ, Nemanich RJ
78 - 84	Effect of nitrogen pressure on the hardness and chemical states of TiAlCrN coatings Sullivan JF, Huang F, Barnard JA, Weaver ML
85 - 89	Suppression of nanoscopic shadowing during physical vapor deposition by biased diffusion Kools JCS
90 - 98	Mechanical properties and thermal stability of TiN/TiB2 nanolayered thin films Martin KJ, Madan A, Hoffman D, Ji J, Barnett SA
99 - 113	Feature-scale model of Si etching in SF6 plasma and comparison with experiments Belen RJ, Gomez S, Kiehlbauch M, Cooperberg D, Aydil ES
114 - 117	Study on the superhardness mechanism of Ti-Si-N nandcomposite films: Influence of the thickness of the Si3N4 interfacial phase Hu XP, Zhang HJ, Dai JW, Li GY, Gu MY
118 - 125	Surface chemistry and infrared absorbance changes during ZnO atomic layer deposition on ZrO2 and BaTiO3 particles Ferguson JD, Weimer AW, George SM
126 - 136	Surface roughness in XeF2 etching of a-Si/c-Si(100) Stevens AAE, Beijerinck HCW
137 - 141	Effects of arrival rate and gas pressure on the chemical bonding and composition in titanium nitride films prepared on Si(100) substrates by ion beam and vapor deposition Matsuoka M, Isotani S, Mittani JCR, Chubaci JFD, Ogata K, Kuratani N
142 - 145	Diagnosis of hydrogen anions (H-, H-3(-)) from the near-electrode region of dielectric-barrier-discharge plasmas Wang WC, Xu Y, Wang WG, Zhu AM
146 - 150	Deep dry-etch of silica in a helicon plasma etcher for optical waveguide fabricatlon Li WT, Bulla DAP, Love J, Luther-Davies B, Charles C, Boswell R
151 - 164	Plasma-surface interactions of nanoporous silica during plasma-based pattern transfer using C4F8 and C4F8/Ar gas mixtures Hua XF, Stolz C, Oehrlein GS, Lazzeri P, Coghe N, Anderle M, Inoki CK, Kuan TS, Jiang P
165 - 176	Study on the initial deposition of ZrO2 on hydrogen terminated silicon and native silicon oxide surfaces by high vacuum chemical vapor deposition Song Z, Sullivan LM, Rogers BR
177 - 183	Temperature-dependent morphology evolution of the submonolayer clusters grown on fcc metal (110) surfaces Liu ZJ, Shen YG
184 - 189	Effect of ultrahigh vacuum on ordering temperature, crystallographic and magnetic properties of L1(0) FePt(001) film on a CrRu underlayer Chen JS, Lim BC, Zhou TJ
190 - 196	Plasma deposition of fluorocarbon thin films from c-C4F8 using pulsed and continuous rf excitation Labelle CB, Opila R, Kornblit A
197 - 200	Laser-induced damage threshold of ZrO2 thin films prepared at different oxygen partial pressures by electron-beam evaporation Zhang DP, Shao JA, Zhao YN, Fan SH, Hong RJ, Fan ZX
201 - 207	Roads to ultrathin silicon oxides Morgen P, Bahari A, Robenhagen U, Andersen JF, Hansen JK, Pedersen K, Rao MG, Li ZS
208 - 214	Downstream microwave ammonia plasma treatment of polydimethylsiloxane Pruden KG, Beaudoin SP
215 - 217	Design and construction of a semiautomatic temperature programmed desorption apparatus for ultrahigh vacuum Kondratyuk P, Yates JT
218 - 218	Radio frequency line-plasma source using permanet magets (vol 22, pg 7, 2004) Sakawa Y, Yano K, Shoji T