Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.12, No.2 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (56 articles)

269 - 273	Oriented Film Growth, Not Epitaxy in HTSC Film Growth Roy R, Guo R, Bhalla AS, Cross LE
274 - 277	Improved Substrate-Temperature Control for Growth of Twin-Free Cadmium Mercury Telluride by Molecular-Beam Epitaxy Skauli T, Colin T, Lovold S
278 - 281	Low-Temperature Growth of ZnTe by Synchroton Radiation Using Metalorganic Sources Ikejiri M, Ogata T, Ogawa H, Nishio M, Yoshida A
282 - 288	Magnesium Cluster-Beam Deposition on Glass and Si(111) Hagena OF, Knop G, Fromknecht R, Linker G
289 - 294	Ion-Beam-Assisted Growth of Beta-Fesi2 Terrasi A, Ravesi S, Grimaldi MG, Spinella C
295 - 299	Photoresponse Probe of the Space-Charge Distribution in Ferroelectric Lead-Zirconate-Titanate Thin-Film Memory Capacitors Thakoor S, Maserjian J
300 - 307	Electron-Cyclotron-Resonance Plasma Source for Metalorganic Chemical-Vapor-Deposition of Silicon-Oxide Films Popov OA, Shapoval SY, Yoder MD, Chumakov AA
308 - 313	Fluorinated Diamond-Like Carbon-Films Deposits from Radiofrequency Glow-Discharge in a Triode Reactor Dagostino R, Lamendola R, Favia P, Giquel A
314 - 320	Influence of an External Axial Magnetic-Field on the Plasma Characteristics and Deposition Conditions During Direct-Current Planar Magnetron Sputtering Ivanov I, Kazansky P, Hultman L, Petrov I, Sundgren JE
321 - 322	Deposition of Aluminum-Oxide Films with High Refractive-Index Shih KK, Dove DB
323 - 332	Fluorocarbon High-Density Plasmas .1. Fluorocarbon Film Deposition and Etching Using CF4 and Chf3 Oehrlein GS, Zhang Y, Vender D, Haverlag M
333 - 344	Fluorocarbon High-Density Plasmas .2. Silicon Dioxide and Silicon Etching Using CF4 and Chf3 Oehrlein GS, Zhang Y, Vender D, Joubert O
345 - 353	Study on Electromagnetron for Plasma Polymerization .2. Magnetic-Field Enhanced Radio-Frequency Plasma Deposition of Organogermanium Films from Tetraethylgermanium Gazicki M, Schalko J, Olcaytug F, Ebel M, Ebel H, Wernisch J, Yasuda H
354 - 364	Redeposition Kinetics in Fluorocarbon Plasma-Etching Gray DC, Mohindra V, Sawin HH
365 - 368	Plasma Fluorination of Graphite Merfeld GD, Petrich MA
369 - 378	Cleaning of Metal Parts in Oxygen Radio-Frequency Plasma - Process Study Korzec D, Rapp J, Theirich D, Engemann J
379 - 383	Synchrotron-Radiation Excited Etching of SiC Film Using Reactive Species Generated by a Microwave-Discharge Terakado SG, Ogura M, Suzuki S, Tanaka K
384 - 387	Elimination of Serious Artifacts in Temperature-Programmed Desorption Spectroscopy Lu GQ, Linsebigler AL, Yates JT
388 - 392	Effects of Processing on Electrical-Properties of YBa2Cu3O7 Films .2. In-Situ Deposition Processes Sheats JR, Newman N, Taber RC, Merchant P
393 - 398	Thermally-Induced Changes in TeOx Thin-Layers Podolesheva I, Platikanova V, Konstantinov I, Rosler M
399 - 404	Acceleration of High-Current Heavy-Ions Using a Variable-Energy Radiofrequency Quadrupole LINAC and Measurement of the Input Beam Emittance Amemiya K, Tokiguchi K, Hakamata Y, Yamada S, Hirao Y, Tokuda N
405 - 410	Correction of Dead-Time Effects in Time-of-Flight Mass-Spectrometry Stephan T, Zehnpfenning J, Benninghoven A
411 - 417	Study of the Structure of the Rh Ag Surface Using Positron-Annihilation Induced Auger-Electron Spectroscopy Yang G, Yang S, Kim JH, Lee KH, Koymen AR, Mulhollan GA, Weiss AH
418 - 422	Photoemission-Study of the Growth of the LaF3 Si (111) Interface Malten C, Cramm S, Colbow KM, Eberhardt W
423 - 427	Altered Layer as Sensitive Initial Chemical-State Indicator Dementjev AP, Ivanova OP, Vasilyev LA, Naumkin AV, Nemirovsky DM, Shalaev DY
428 - 435	Angular-Distributions of Auger Electrons from Surfaces - Conclusions from Full Multiple-Scattering Simulations Chen X, Harp GR, Saldin DK
436 - 442	Auger in-Depth Profiling of Mo-Si Multilayers Konkol A, Sulyok A, Menyhard M, Barna A
443 - 451	Structural and Surface Characterization of Ultrafine Iron Carbide Particles Generated by Laser Pyrolysis .1. High-Temperature He Treatment Sethuraman AR, Stencel JM, Rubel AM, Cavin B, Hubbard CR
452 - 456	Improved Quantification in Secondary-Ion Mass-Spectrometry Detecting Mcs+ Molecular-Ions Gnaser H
457 - 464	Measurement of Complete Auger-Electron Emission Angular-Distributions from Beta-SiC Films on Si(100) Chyan OM, Frank DG, Hubbard AT, Li JP, Steckl AJ
465 - 470	Infrared Spectroscopic Study of Initial-Stages of Ultraviolet Ozone Oxidation of Si(100) and Si(111) Surfaces Niwano M, Kageyama J, Kinashi K, Miyamoto N, Honma K
471 - 475	Approximate Method for Reducing the Effect of Beam Misalignment on Low-Energy-Electron Diffraction I(E) Curves at the Normal Incidence - The Horizontal-Beam Method Mizuno S, Tochihara H, Kawamura T
476 - 483	Structure and Properties of Titanium Nitride Thin-Films Deposited at Low-Temperatures Using Direct-Current Magnetron Sputtering Elstner F, Ehrlich A, Giegengack H, Kupfer H, Richter F
484 - 493	CO2-Laser Chemical-Vapor-Deposition of Silica Films in a Parallel Configuration - A Study of Gas-Phase Phenomena Fernandez D, Gonzalez P, Pou J, Garcia E, Serra J, Leon B, Perezamor M, Garrido C
494 - 500	Composition and Growth Mode of Mosx Sputtered Films Moser J, Levy F, Bussy F
501 - 505	Preparation of Inplane Textured Y2O3-Doped ZrO2 Thin-Film on Polycrystalline Metallic Tape by Modified Bias Sputtering Aoki S, Fukutomi M, Komori K, Maeda H
506 - 508	Properties of Titanium Layers Deposited by Collimation Sputtering Hara T, Nomura T, Mosley RC, Suzuki H, Sone K
509 - 512	Interaction of Al with Oxidized Ge/Si(001) - A Synchrotron-Radiation Photoelectron-Spectroscopy Study Prabhakaran K, Ogino T, Scimeca T, Oshima M
513 - 522	X-Ray Photoelectron-Spectroscopy Investigation of Interfacial Interactions in the Cr Bpda-PDA and Ti Bpda-PDA Systems Chenite A, Selmani A, Yelon A
523 - 528	Application of Dynamic in-Situ Ellipsometry to the Deposition of Tin-Doped Indium Oxide-Films by Reactive Direct-Current Magnetron Sputtering Fukarek W, Kersten H
529 - 532	Electrical-Properties of Radio-Frequency Magnetron-Sputtered (BASR)TiO3 Thin-Films on Indium Tin Oxide-Coated Glass Substrate Kim TS, Kim CH, Oh MH
533 - 535	In-Situ Deposition of YBa2Cu3O7-X Superconducting Thin-Film Without High-Pressure Oxygen During Film-Cooling Song WD, Liu DM, Jiao SL, Lu DS, An CW, Lu L, Yang HQ, Li ZG
536 - 541	Measurement of the Angular-Distribution of Sputtered Neutrals in a Planar Magnetron Geometry Eisenmengersittner C, Bergauer A, Bangert H, Bauer W
542 - 547	Electron Source Brightness and Degeneracy from Fresnel Fringes in-Field Emission Point Projection Microscopy Spence JC, Qian W, Silverman MP
548 - 553	Tritium Purification via Zirconium Manganese Iron Alloy Getter St 909 in Flow Processes Baker JD, Meikrantz DH, Pawelko RJ, Anderl RA, Tuggle DG
554 - 563	Vacuum Pumpdown Model for Long Outgassing Tubes Ernst MJ, Hemond HF
564 - 567	Using Characterized Variable Reservoir Helium Permeation Leaks to Generate Low Flows Tison SA, Mohan P
568 - 573	Nonstable Behavior of Widely Used Ionization Gauges Arnold PC, Borichevsky SC
574 - 579	Causes of Nonstability and Nonreproducibility in Widely Used Bayard-Alpert Ionization Gauges Bills DG
580 - 586	Stable and Reproducible Bayard-Alpert Ionization Gauge Arnold PC, Bills DG, Borenstein MD, Borichevsky SC
587 - 590	Charging Effects in Measurements of High-Temperature Superconductors with High-Resolution Electron-Energy-Loss Spectroscopy Akavoor P, Phelps RB, Kesmodel LL
591 - 593	Compact and Inexpensive Quartz Capillaritron Source Bautsch M, Varadinek P, Wege S, Niedrig H
594 - 597	Effect of Anode Bias on the Index of Refraction of Al2O3 Thin-Films Deposited by DC S-Gun Magnetron Reactive Sputtering Clarke PJ
598 - 600	Miniature Multitarget Sputtering System for the in-Situ X-Ray Study of High-Tc Multilayer Film Growth Williams SM, Yang HQ, Ketterson JB
601 - 602	Plasma-Treated Screws for Ultrahigh-Vacuum Application Macgill RA, Castro RA, Yao XY, Brown IG
603 - 603	Langmuir Probe Diagnostics of a Radio-Frequency Magnetron Discharge for Deposition of High-Tc YBCO Films (Vol 11, Pg 2747, 1993) Mishra SK, Sarkar A, Ray SK, Pathak LC, Bhattacharya D, Chopra KL, Das SR