Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.22, No.2 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (35 articles)

227 - 235	Comparison of pulsed and downstream deposition of fluorocarbon materials from C3F8 and c-C4F8 plasmas Martin IT, Malkov GS, Butoi CI, Fisher ER
236 - 244	Study of C4F8/CO and C4F8/Ar/CO plasmas for highly selective etching of organosilicate glass over Si3N4 and SiC Ling L, Hua X, Li X, Oehrlein GS, Celii FG, Kirmse KHR, Jiang P, Wang YC, Anderson HM
245 - 249	Control of nitrogen depth profile in ultrathin oxynitride films formed by pulse-time-modulated nitrogen beams Samukawa S, Minemura Y, Fukuda S
250 - 254	Preparation of TiN films by arc ion plating using dc and pulsed biases Huang MD, Lee YP, Dong C, Lin GQ, Sun C, Wen LS
255 - 259	Some considerations on heater design for simultaneous deposition of large-area double-sided high-T-c superconducting thin films Chen JJ, Tao BW, Liu XZ, Li YR
260 - 263	Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films Lee JW, Cuomo JJ, Bourham M
264 - 271	Reactive physical vapor deposition of TixAlyN: Integrated plasma-surface modeling characterization Zhang D, Schaeffer JK
272 - 280	Zirconia-alumina nanolaminate for perforated pitting corrosion protection of stainless steel Gaertner WF, Hoppe EE, Omari MA, Sorbello RS, Aita CR
281 - 286	Phase transformation of tungsten films deposited by diode and inductively coupled plasma magnetron sputtering Chen GS, Tian HS, Lin CK, Chen GS, Lee HY
287 - 292	Characterization of graded InGaN/GaN epilayers grown on sapphire Song TL, Chua SJ, Fitzgerald EA, Chen P, Tripathy S
293 - 301	Effects of voltage distribution along an induction coil and discharge frequency in inductively coupled plasmas Edamura M, Benck EC
302 - 308	Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoring in situ for epitaxial growth of group-III nitrides Xu Y, Gu B, Qin FW
309 - 320	Miniaturized vacuum gauges Wilfert S, Edelman C
321 - 323	Effect of concurrent N-2(+) and N+ ion bombardment on the plasma-assisted deposition of carbon nitride thin film Cao ZX, Oechsner H
324 - 327	Growth and characterization of cubic CdS epilayers on GaAs substrates Yu YM, Lee KS, O B, Yu PY, Kim CS, Choi YD, Yun HJ
328 - 331	Easy method enhancing the sensitivity of a helium mass-spectrometer leak detector Firpo G, Pozzo A
332 - 338	Preferred orientation and film structure of TaN films deposited by reactive magnetron sputtering Noda S, Tepsanongsuk K, Tsuji Y, Kajikawa Y, Ogawa Y, Komiyama H
339 - 348	High temperature processing of TiO2 thin films for application in silicon solar cells Richards BS, Richards SR, Boreland MB, Jamieson DN
349 - 355	Effect of deposition parameters on properties of ITO films prepared by reactive middle frequency pulsed dual magnetron sputtering Rogozin AI, Vinnichenko MV, Kolitsch A, Moller W
356 - 360	Effects of mesh-assisted carbon plasma immersion ion implantation on the surface properties of insulating silicon carbide ceramics Fu RKY, Fu KL, Tian XB, Chu PK
361 - 365	Thickness dependence of the properties of highly c-axis textured AlN thin films Martin F, Muralt P, Dubois MA, Pezous A
366 - 370	Effect of ion beam energy on magnetic properties of CoCrPt and CoPt thin films Zhang JQ, Wang HF, Alex M, Miloslavsky L
371 - 376	Electron beam fluorescence temperature measurements of N-2 in a semiconductor plasma reactor Shimada M, Cattolica R, Tynan GR
377 - 382	Optical emission diagnostic of a pulsed arc discharge Restrepo E, Devia A
383 - 394	Analytical modeling of rarefied Poiseuille flow in microchannels Sun YH, Chan WK
395 - 400	Growth and characterization of hafnium silicate films prepared by UV/ozone oxidation Punchaipetch P, Pant G, Kim MJ, Wallace RM, Gnade BE
401 - 406	Maximum entropy decomposition of quadrupole mass spectra Von Toussaint U, Dose V, Golan A
407 - 412	Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl-2/Ar/BCl3 inductively coupled plasmas Han YJ, Xue S, Wu T, Wu Z, Guo WP, Luo Y, Hao ZB, Sun CZ
413 - 418	Chemical bonds of fluorocarbon films which can be a source of CFx radicals Takada N, Iida T, Shibagaki K, Sasaki K
419 - 421	Fabrication of iron (III) oxide doped polystyrene shells Cai PJ, Tang YJ, Zhang L, Du K, Feng CG
422 - 424	Fabrication of ferroelectric PbZrxTi1-xO3 thick films and their optical waveguide properties Hu GJ, Hu SH, Meng XJ, Wang GS, Zhao Q, Sun JL, Chu JH, Dai N, Xu L, Liu LY, Li DX
425 - 432	Use of gas-phase ethanol to mitigate extreme UV/water oxidation of extreme UV optics Klebanoff LE, Malinowski ME, Clift WM, Steinhaus C, Grunow P
433 - 436	Mitigation of accumulated electric charge by deposited fluorocarbon film during SiO2 etching Shimmura T, Suzuki Y, Soda S, Samukawa S, Koyanagi M, Hane K
437 - 440	Trace moisture emissions from heated metal surfaces in hydrogen service Funke HH, Yao JL, Raynor MW
441 - 441	Etch characteristics of CeO2 thin film in Ar/CF4/Cl-2 plasma (vol 21, pg 426, 2003) Kim DP, Chang YS, Kim CI