Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.15, No.5 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (62 articles)

2463 - 2468	Migration-Assisted Si Subatomic-Layer Epitaxy from Si2H6 Suda Y
2469 - 2472	Unit-Cell Layer-by-Layer Heteroepitaxy of BaO Thin-Films at Temperatures as Low as 20-Degrees-C Ohnishi T, Yoshimoto M, Lee GH, Maeda T, Koinuma H
2473 - 2477	Deposition of GaAs(111) Epilayers on BaF2(111)/Si(100) Heterostructures by Molecular-Beam Epitaxy Stumborg MF, Santiago F, Chu TK, Boulais KA
2478 - 2484	Effect of Plasma and Thermal Annealing on Chemical-Vapor-Deposition Dielectrics Grown Using SiH4-H2O2 Gas-Mixtures Gaillard F, Brault P, Brouquet P
2485 - 2488	Structural Control of TiO2 Film Grown on MgO(001) Substrate by Ar-Ion Beam Sputtering Aoki T, Maki K, Tang Q, Kumagai Y, Matsumoto S
2489 - 2491	Spectroscopic Studies of Native-Oxide Formation on a SiO2-InSb Interface Valcheva E
2492 - 2501	Surface-Analysis Study of the Oxidation of Organotin Films Deposited by ArF Excimer-Laser Chemical-Vapor-Deposition Larciprete R, Borsella E, Depadova P, Perfetti P, Crotti C
2502 - 2507	Chemical-Reactions Induced by the Room-Temperature Interaction of Hyperthermal Atomic-Hydrogen with the Native-Oxide Layer on GaAs(001) Surfaces Studied by Ion-Scattering Spectroscopy and X-Ray Photoelectron-Spectroscopy Wolan JT, Mount CK, Hoflund GB
2508 - 2517	Effect of H-2 Addition on Surface-Reactions During CF4/H-2 Plasma-Etching of Silicon and Silicon Dioxide Films Marra DC, Aydil ES
2518 - 2520	Effect of the Cr-Rich Oxide Surface on Fast Pumpdown to Ultrahigh-Vacuum Chun I, Cho B, Chung S
2521 - 2528	Comparison of Surface Oxidation of Titanium Nitride and Chromium Nitride Films Studied by X-Ray-Absorption and Photoelectron-Spectroscopy Esaka F, Furuya K, Shimada H, Imamura M, Matsubayashi N, Sato H, Nishijima A, Kawana A, Ichimura H, Kikuchi T
2529 - 2536	Investigation of the Cu/Bcb and Cu/Ppq Interfaces by Photoelectron-Spectroscopy Schuhler N, Oelhafen P
2537 - 2541	Auger-Electron Spectroscopy Analysis of Oxidation-States of Te in Amorphous CdTe Oxide Thin-Films Zapatanavarro A, Bartoloperez P, Zapatatorres M, Castrorodriguez R, Pena JL, Farias MH
2542 - 2547	Improved Secondary-Ion Mass-Spectroscopy Detection Limits of Hydrogen, Carbon, and Oxygen in Silicon by Suppression of Residual-Gas Ions Using Energy and Ejection Angle Filtering Yamazaki H
2548 - 2552	Auger-Electron Spectroscopy and Electron-Energy-Loss Spectroscopy Study of the Adsorption of Nitrogen on a Polycrystalline Zirconium Surface Kurahashi M, Yamamoto M, Mabuchi M, Naito S
2553 - 2556	The Defective Nature of the TiO2(110) (1X2) Surface Patel R, Guo Q, Cocks I, Williams EM, Roman E, Desegovia JL
2557 - 2560	Extreme Surface Sensitivity in Neon-Ion Scattering from Silicon at Ejection Energies Below 80 eV - Evidence for the Presence of Oxygen on Ion-Bombarded SiO2 Wittmaack K
2561 - 2564	Core-Electron Excitation for Si Photochemical Process Using High-Intensity Monochromatized Synchrotron-Radiation Iba Y, Sugita Y, Nara Y
2565 - 2568	Repeatability of Si Concentration Measurements in Si-Doped GaN Films Chi PH, Simons DS, Wickenden AE, Koleske DD
2569 - 2573	Temperature-Dependence of Reflection High-Energy Electron-Diffraction Intensity from Si(111)-7X7 Superlattice Yamaguchi K, Mitsui H, Shigeta Y
2574 - 2578	Electron-Spectroscopy Studies of Interface Formation Between Metal-Electrodes and Luminescent Organic Materials Park Y, Choong VE, Hsieh BR, Tang CW, Wehrmeister T, Mullen K, Gao Y
2579 - 2584	Fine-Structures of Valence-Band, X-Ray-Excited Auger-Electron, and Plasmon Energy-Loss Spectra of Diamond-Like Carbon-Films Obtained Using X-Ray Photoelectron-Spectroscopy Seo SC, Ingram DC
2585 - 2591	In-Situ Monitoring and Characterization of SiC Interface Formed in Carbon-Films Grown by Pulsed-Laser Deposition Samano EC, Soto G, Valenzuela J, Cota L
2592 - 2596	Characterization of CdTe-Sb Co-Sputtered Films Picosvega A, Ramirezbon R, Espinozabeltran FJ, Zelayaangel O, Farias M
2597 - 2604	Chemical Sputtering Measurements in Tore Supra by Aftershot Mass-Spectrometry Outgassing Studies Delacal E, Gauthier E
2605 - 2608	Insulator-Coated Sputter Gun for Growing Superconducting Oxide-Films Lin RJ, Chen LJ
2609 - 2614	Microstructural Change of Tin Films by C and B Ion Implantations Ohara H, Nakayama A, Nomura T
2615 - 2622	Observations of Standing Waves on an Inductive Plasma Coil Modeled as a Uniform Transmission-Line Lamm AJ
2623 - 2626	Hard Boron Suboxide-Based Films Deposited in a Sputter-Sourced, High-Density Plasma Deposition System Doughty C, Gorbatkin SM, Tsui TY, Pharr GM, Medlin DL
2627 - 2635	Ion Energy, Ion Flux, and Ion Species Effects on Crystallographic and Electrical-Properties of Sputter-Deposited Ta Thin-Films Ino K, Shinohara T, Ushiki T, Ohmi T
2636 - 2643	Plasma Nitriding Combined with a Hollow-Cathode Discharge Sputtering at High-Pressures Benda M, Vlcek J, Cibulka V, Musil J
2644 - 2652	Role of Low-Energy Secondary Electrons in Synchrotron Radiation-Excited Chemical-Vapor-Deposition of Silicon-Nitride Films Kyuragi H
2653 - 2660	Effects of Low-Energy-Electron and Ion Irradiation on Co/Cu(100) - In-Situ Production and Coadsorbate-Induced Adsorption of Co Above Room-Temperature Yu H, Hu DQ, Leung KT
2661 - 2669	Etching of Si at Low-Temperatures Using a SF6 Reactive Ion-Beam - Effect of the Ion Energy and Current-Density Chevolleau T, Tessier PY, Cardinaud C, Turban G
2670 - 2672	Experimental-Study on Intermediate and Gradient-Index Dielectric Thin-Films by a Novel Reactive Sputtering Method Tang Q, Ogura S, Yamasaki M, Kikuchi K
2673 - 2676	TiO2 Electrochromic Thin-Films by Reactive Direct-Current Magnetron Sputtering Yoshimura K, Miki T, Tanemura S
2677 - 2686	Ion-Induced Chemical-Vapor-Deposition of High-Purity Cu Films at Room-Temperature Using a Microwave-Discharge H Atom Beam Source Chiang TP, Sawin HH, Thompson CV
2687 - 2692	Study on the Growth of Biaxially Aligned Yttria-Stabilized Zirconia Films During Ion-Beam-Assisted Deposition Mao YJ, Ren CX, Yuan J, Zhang F, Liu XH, Zou SC
2693 - 2697	Model for Hydrogen Desorption in SiGe(100) Films Vizoso J, Martin F, Sune J, Nafria M
2698 - 2708	Metastable Chlorine Ion Kinetics in Inductively-Coupled Plasmas Hebner GA, Fleddermann CB, Miller PA
2709 - 2716	Generation of a Velocity Selected, Pulsed-Source of Hyperthermal (1-10 eV) Neutral Metal Atoms for Thin-Film Growth-Studies Knowles MP, Leone SR
2717 - 2727	Automated Tuning of an Electron-Cyclotron-Resonance Cavity to a Microwave-Power Source Hanish CK, Grizzle JW
2728 - 2739	Characterization of Arc-Like Ti Vapor Plasma on the High-Voltage Electron-Beam Evaporator Kajioka H
2740 - 2742	Low-Energy Broad-Beam Electron-Gun Barefoot TW, Ebinger HD, Yates JT
2743 - 2749	Chemical-Vapor-Deposition of Diamond Films on Hydrofluoric-Acid Etched Silicon Substrates Schelz S, Borges CF, Martinu L, Moisan M
2750 - 2754	Carbon Nucleation on Si(100) Using a Negative Carbon Ion-Beam Ko YW, Kim SI
2755 - 2765	Fluoroether Bonding to Carbon Overcoats Cornaglia L, Gellman AJ
2766 - 2769	Control of Silicon Crystal Temperature by Measurement of Resistivity Dohnalek Z, Mezhenny S, Lyubinetsky I, Choyke WJ, Yates JT
2770 - 2776	Low-Temperature Fabrication of Amorphous-Silicon Thin-Film Transistors by DC Reactive Magnetron Sputtering Mccormick CS, Weber CE, Abelson JR, Davis GA, Weiss RE, Aebi V
2777 - 2780	Physical and Optical-Properties of an Antireflective Layer Based on Sioxny Gaillard F, Schiavone P, Brault P
2781 - 2786	Microcrystalline Oxide-Incorporated New Diffusion Barrier for Dynamic Random-Access Memory and Ferroelectric Random-Access Memory Capacitor Electrode Yoon DS, Baik HK, Lee SM
2787 - 2792	Studies of Electrical and Chemical-Properties of SiO2/Si After Rapid Thermal Nitridation Using Surface-Charge Spectroscopy and X-Ray Photoelectron-Spectroscopy Chan RW, Kwok RW, Lau WM, Yan H, Wong SP
2793 - 2797	Search for Coupling in Ferromagnetic/Superconducting Multilayers - Fe4N/NbN Mattson JE, Potter CD, Conover MJ, Sowers CH, Bader SD
2798 - 2801	Optimization of Bi2Te3 Thin-Films for Microintegrated Peltier Heat-Pumps Shafai C, Brett MJ
2802 - 2806	Primary Pressure Standard for Calibration in the Medium Vacuum Range Hinkle LD, Provost J, Surette DJ
2807 - 2811	Sputtered Cu/Co Films for Giant Magnetoresistance - Effect of Plasma Gas and Annealing Treatment Maya L, Paranthaman M, List FA, Warmack RJ
2812 - 2815	Constant Power Operation of Incandescent Micromachined Polysilicon Microresistors for Use as Vacuum Pressure Sensors Kleckner TC, Lawson RP, Robinson AM
2816 - 2819	Etching of Boron-Nitride in Radio-Frequency Plasmas Schaffnit C, Thomas L, Rossi F
2820 - 2821	An Easily Constructed High-Voltage Power-Supply for Electrostatic Ion-Beam Lensing and Deflection Optics Gannon T, Watson PR
2822 - 2822	Simple and Economical Heating Tape for Vacuum Chamber Baking Chegwidden S, Little T, Ohuchi F
2823 - 2823	Wavelength Tunable Fiber Bragg Grating Devices Based on Sputter-Deposited Resistive and Piezoelectric Coatings (Vol 15, Pg 1791, 1997) Fox GR, Muller CA, Setter N, Costantini DM, Ky NH, Limberger HG
2824 - 2824	Anisotropy in the Lateral Momentum of Co Chemisorbed on Cu(110) Studied by Time-of-Flight Electron Simulated Desorption Ion Angular-Distribution (Vol 15, Pg 1548, 1997) Ahner J, Mocuta D, Ramsier RD, Yates JT