Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.21, No.5 Entire volume, number list

ISSN: 0734-2101 (Print)

In this Issue (40 articles)

L5 - L9	Electrical characteristics of ZrO2 prepared by electrochemical anodization of Zr in an ammonium tartrate electrolyte Jeon SH, Hwang HS
L10 - L12	Titanium alloy material with very low outgassing Kurisu H, Muranaka T, Wada N, Yamamoto S, Matsuura M, Hesaka M
L13 - L15	Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AIN subcycles in atomic layer deposition Lee YJ, Kang SW
L16 - L18	Atomic layer deposition of zirconium silicate films using zirconium tetra-tert-butoxide and silicon tetrachloride Kim WK, Kang SW, Rhee SW
L19 - L21	Metrology of 1-10 nm thick CNx films: Thickness, density, and surface roughness measurements Li DJ, Chen YF, Chung YW, Freire FL
1589 - 1594	Real-time etching monitor using argon quadrupole mass spectrometry for 100 nm class WSiN gate fabrication Jin Y, Takahashi C, Ono T
1595 - 1602	Preparation and characterization of superhard boron-suboxide films Huang H, Ong CW, Zheng B, Kwok RWM, Lau WM, He JW
1603 - 1608	Properties of Au and Ag Schottky diodes prepared on undoped n-ZnO Polyakov AY, Smirnov NB, Kozhukhova EA, Vdovin VI, Ip K, Norton DP, Pearton SJ
1609 - 1615	Deposition pressure dependence of internal stress in TiN films deposited by filtered cathodic vacuum arc Cheng YH, Tay BK
1616 - 1619	Etch characteristics of (Pb,Sr)TiO3 thin films using CF4/Ar inductively coupled plasma Kim GH, Kim KT, Kim DP, Kim CI
1620 - 1624	Surface reaction of bis(tertbutylimido)bis(diethylamido)tungsten precursor on Si(100)-(2X1) Wu JB, Yang YW, Lin YF, Chiu HT
1625 - 1630	X-ray photoelectron spectroscopy and secondary electron yield analysis of Al and Cu samples exposed to an accelerator environment Rosenberg RA, McDowell MW, Ma Q, Harkay KC
1631 - 1634	Ultrathin copper aluminum and nickel aluminide protective oxidation studied with an x-ray photoelectron spectrometer Moore JF, McCann MP, Pellin MJ, Zinovev A, Hryn JN
1635 - 1638	Corrosion behavior of sputter-deposited TiN thin films Martin-Palma RJ, Manso M, Martinez-Duart JM, Conde A, Damborenea JJ
1639 - 1643	The role of trapped Ar atoms in the mechanical properties of boron carbide films deposited by dc-magnetron sputtering Jacobsohn LG, Averitt RD, Nastasi M
1644 - 1648	Method to characterize the three-dimensional distribution of focused ion beam induced damage in silicon after 50 keV Ga+ irradiation Lugstein A, Brezna W, Hobler G, Bertagnolli E
1649 - 1654	Optimization of secondary ion mass spectrometry detection limit for N in SiC Pivovarov AL, Stevie FA, Griffis DP, Guryanov GM
1655 - 1664	Oxygenated polymeric thin films deposited from toluene and oxygen by remote plasma enhanced chemical vapor deposition Barranco A, Cotrino J, Yubero F, Gonzalez-Elipe AR
1665 - 1670	Influence of the incident angle of energetic carbon ions on the properties of tetrahedral amorphous carbon (ta-C) films Liu DP, Benstetter G, Lodermeier E, Vancea J
1671 - 1674	Focusing of MeV ion beams by means of tapered glass capillary optics Nebiki T, Yamamoto T, Narusawa T, Breese MBH, Teo EJ, Watt F
1675 - 1679	Plasma load characteristics of pulsed-bias arc ion plating Lin GQ, Ding ZF, Qi D, Zhao YH, Wang NH, Dong C, Huang RF, Wen LS
1680 - 1682	Reaction between nitrogen gas and silicon species during pulsed laser ablation Umezu I, Inada M, Kohno K, Yamaguchi T, Makino T, Sugimura A
1683 - 1687	Investigation of interactions between inert gases and nitrogen in direct current triode discharges Davison A, Avelar-Batista JC, Wilson AD, Leyland A, Matthews A, Fancey KS
1688 - 1701	Mechanisms for deposition and etching in fluorosilane plasma processing of silicon Williams KL, Butoi CI, Fisher ER
1702 - 1707	X-ray diffraction analyses of titanium coatings produced by electron beam evaporation in neon and argon inert gases Avelar-Batista JC, Wilson AD, Davison A, Matthews A, Fancey KS
1708 - 1716	Study of C4F8/N-2 and C4F8/Ar/N-2 plasmas for highly selective organosilicate glass etching over Si3N4 and SiC Hua XF, Wang X, Fuentevilla D, Oehrlein GS, Celii FG, Kirmse KHR
1717 - 1723	Initial growth stage of nanoscaled TiN films: Formation of continuous amorphous layers and thickness-dependent crystal nucleation Li TQ, Noda S, Komiyama H, Yamamoto T, Ikuhara Y
1724 - 1733	Measurements of neutral plasma species in an argon/isopropyl alcohol plasma for the deposition of organic films Guerin DC, Fernsler RF, Shamamian VA
1734 - 1738	Observation of the phase formation in Fe-N films deposited by reactive pulsed laser deposition Wang N, Ulmer KM, Constant AP, Anderegg JW, Snyder JE
1739 - 1744	Damage effects from medium-energy ion bombardment during the growth of cubic-boron nitride films Gago R, Vinnichenko M, Abendroth B, Kolitsch A, Moller W
1745 - 1751	Composition control and dielectric properties of bismuth zinc niobate thin films synthesized by radio-frequency magnetron sputtering Lu JW, Chen ZQ, Taylor TR, Stemmer S
1752 - 1757	Evidences for dry deintercalation in layered compounds upon controlled surface charging in x-ray photoelectron spectroscopy Feldman Y, Zak A, Tenne R, Cohen H
1758 - 1764	Structural and electrical characteristics of the interfacial layer of ultrathin ZrO2 films on partially strain compensated Si0.69Ge0.3C0.01 layers Mahapatra R, Maikap S, Lee JH, Kar GS, Dhar A, Kim DY, Bhattacharya D, Ray SK
1765 - 1769	Measurement of charge-separation potentials in GaAs1-xNx Johnston SW, Ahrenkiel RK, Tu CW, Hong YG
1770 - 1775	Photoinduced anisotropy of second-harmonic generation from azobenzene-modified alkylsiloxane monolayers Yi YW, Furtak TE, Farrow MJ, Walba DM
1776 - 1783	Photodesorption of gases in vacuum glazing Ng N, Collins RE, So L
1784 - 1790	Fluorinated amorphous carbon films prepared by plasma enhanced chemical vapor deposition for solar cell applications Valentini L, Salerni V, Armentano I, Kenny JM, Lozzi L, Santucci S
1791 - 1795	Influence of sputtering conditions on microstructure and mechanical properties of Zr-Si-N films prepared by radio-frequency-reactive sputtering Zhou M, Nose M, Deguchi Y, Mae T, Nogi K
1796 - 1799	Mass spectral resolution of F+ and H3O+ in very high vacuum Cole CR, Outlaw RA, Champion RL, Baker DH, Holloway BC
1800 - 1801	Infrared spectrometer attachment assembly for use with vacuum and high-pressure cells Wingrave JA, Teplyakov AV