515 - 529 |
Contributions of Scanning Probe Microscopy and Spectroscopy to the Investigation and Fabrication of Nanometer-Scale Structures Wiesendanger R |
530 - 535 |
Low Damage Etching of InGaAs/AlGaAs by the Electron-Cyclotron-Resonance Plasma with Cl2/He Mixture for Heterojunction Bipolar-Transistors Miyakuni S, Sakai M, Hattori R, Izumi S, Shimura T, Sato K, Takano H, Otsubo M |
536 - 539 |
Reactive Ion Etching of Alingap and GaAs in Sicl4/CH4/Ar-Based Plasmas Chang CV, Rijpers JC |
540 - 546 |
Electron-Cyclotron-Resonance Plasma Oxidation Studies of InP Hu YZ, Joseph J, Irene EA |
547 - 550 |
Optimal Surface Cleaning of GaAs (001) with Atomic-Hydrogen Petit EJ, Houzay F |
551 - 554 |
Arsenic Capping and Decapping of Inyal1-Yas(100) Grown by Molecular-Beam Epitaxy Clark SA, Dunscombe CJ, Woolf DA, Wilks SP, Williams RH |
555 - 566 |
Investigation of Chemically Assisted Ion-Beam Etching for the Fabrication of Vertical, Ultrahigh Quality Facets in GaAs Hagberg M, Jonsson B, Larsson AG |
567 - 573 |
Damage to Si Substrates During SiO2 Etching - A Comparison of Reactive Ion Etching and Magnetron-Enhanced Reactive Ion Etching Gu T, Ditizio RA, Fonash SJ, Awadelkarim OO, Ruzyllo J, Collins RW, Leary HJ |
574 - 580 |
Cleaning of Silicon Surfaces by Hydrogen Multipolar Microwave Plasma Excited by Distributed Electron-Cyclotron-Resonance Raynaud P, Pomot C |
581 - 584 |
Silicon Dioxide Deposition by Electron-Cyclotron-Resonance Plasma - Kinetic and Ellipsometric Studies Hernandez MJ, Garrido J, Piqueras J |
585 - 588 |
High-Temperature Deposition of Sin Films Using Low-Pressure Chemical-Vapor-Deposition System for X-Ray Mask Application Ohta T, Kumar R, Yamashita Y, Hoga H |
589 - 600 |
Fundamental Principles of Phase-Shifting Masks by Fourier Optics - Theory and Experimental-Verification Ronse K, Debeeck MO, Vandenhove L |
601 - 604 |
Tungsten Trench Etching in a Magnetically Enhanced Triode Reactor Pendharkar SV, Wolfe JC |
605 - 612 |
Effects of Substrate-Temperature and Angular Position on the Properties of Ion-Beam Sputter-Deposited Fe Films on (100) GaAs Substrates Bernstein SD, Wong TY, Tustison RW |
613 - 615 |
Selective Deposition of Metals on Submicron Resist Patterns Petermann J, Hoffmann T, Martinezsalazar J |
616 - 619 |
Improvement in Molecular-Beam Epitaxy Machine Reliability Using Preventive Maintenance Ebert CW, Peticolas LJ, Reynolds CL, Vuong HH |
620 - 621 |
Optical Beam-Deflection Scanning Force Microscope with Easy Cantilever-Laser Beam Alignment Sugihara K, Sakai A, Matsuda T, Toyosaki M, Tanaka K, Matsuura A, Tsukada S |
628 - 628 |
Papers from the 6th International Vacuum Microelectronics Conference - 12-15 July 1993 Newport, Rhode-Island - Preface Hollis MA |
629 - 632 |
Arrays of Gated Field-Emitter Cones Having 0.32-Mu-M Tip-to-Tip Spacing Bozler CO, Harris CT, Rabe S, Rathman DD, Hollis MA, Smith HI |
633 - 637 |
Chemical-Vapor-Deposition and Plasma-Enhanced Chemical-Vapor-Deposition Carbonization of Silicon Microtips Zhirnov VV, Givargizov EI |
638 - 643 |
Process Characterization and Analysis of Sealed Vacuum Microelectronic Devices Mei Q, Zurn S, Polla DL |
644 - 647 |
Knife-Edge Thin-Film Field-Emission Cathodes on (110) Silicon-Wafers Lee B, Elliott TS, Mazumdar TK, Mcintyre PM, Pang Y, Trost HJ |
648 - 651 |
Silicon Vacuum Microdiode with on-Chip Anode Yoon YJ, Lu YC, Lalevic B, Zeto RJ |
652 - 654 |
Oxidized Amorphous-Silicon as Gate Insulator for Silicon Tips Peters D, Paulus I, Stephani D |
655 - 661 |
Space-Charge Effects in Spindt-Type Field-Emission Cathodes Vanveen GN |
662 - 665 |
Field-Emission from Pyramidal Cathodes Covered in Porous Silicon Wilshaw PR, Boswell EC |
666 - 671 |
Improved Monolithic Vacuum Field-Emission Diodes Legg JD, Mason ME, Williams RT, Weichold MH |
672 - 675 |
Characterization of Silicon Field-Emission Microtriodes Liu D, Marcus RB |
676 - 679 |
Fabrication and Characterization of Silicon Field-Emission Diodes and Triodes Li Q, Yuan MY, Kang WP, Tang SH, Xu JF, Zhang D, Wu JL |
680 - 684 |
Gated Chromium Volcano Emitters Pogemiller JE, Busta HH, Zimmerman BJ |
685 - 688 |
Stability of the Emission of a Microtip Py C, Baptist R |
689 - 692 |
Scaling of Emission Currents and of Current Fluctuations of Gated Silicon Emitter Ensembles Busta HH, Pogemiller JE, Zimmerman BJ |
693 - 696 |
Bright-Field Analysis of Field-Emission Cones Using High-Resolution Transmission Electron-Microscopy and the Effect of Structural-Properties on Current Stability Goodhue WD, Nitishin PM, Harris CT, Bozler CO, Rathman DD, Johnson GD, Hollis MA |
697 - 699 |
SiO2-Induced Silicon Emitter Emission Instability Bintz WJ, Mcgruer NE |
700 - 702 |
Activation, Stabilization Degradation, and Lifetime Predictions of Refractory Thin-Films Emitters Operated in Cold-Cathode Magnetrons Kopylov MF |
703 - 704 |
Diffusion on an Elliptic Field-Emission Cathode Eremchenko DV, Makhov VI |
705 - 709 |
Atom-Probe Analysis and Field-Emission Studies of Silicon King RA, Mackenzie RA, Smith GD, Cade NA |
710 - 712 |
Investigation of the Operating Modes of Gated Vacuum Field Emitter Arrays to Reduce Failure Rates Maessick S, Xia Z, Chan C, Browning J |
713 - 716 |
Characterization of Gridded Field Emitters Huang M, Mackenzie RA, Godfrey TJ, Smith GD |
717 - 721 |
Modification of Si Field Emitter Surfaces by Chemical Conversion to SiC Liu J, Son UT, Stepanova AN, Christensen KN, Wojak GJ, Givargizov EI, Bachmann KJ, Hren JJ |
722 - 726 |
Transition-Metal Carbides for Use as Field-Emission Cathodes Mackie WA, Hartman RL, Anderson MA, Davis PR |
727 - 736 |
Energy-Exchange Processes in Electron-Emission at High Fields and Temperatures Chung MS, Cutler PH, Miskovsky NM, Sullivan TE |
737 - 744 |
Calculated IV Characteristics of a Gold Liquid-Metal Ion-Source for a Prototype Emitter Modeled as a Cone Sphere Miskovsky SN, Miskovsky NM, Cutler PH |
745 - 748 |
Calculations of Capacitance and Electric-Field of a Vacuum Field-Effect Device Huang ZH, Cutler PH, Miskovsky NM, Sullivan TE |
749 - 753 |
Field-Emission Diode Characterization Through Model Parameters Extraction from Current-Voltage Experimental-Data Nicolaescu D, Avramescu V |
754 - 758 |
Use of Boundary-Element Methods in-Field Emission Computations Hartman RL, Mackie WA, Davis PR |
759 - 763 |
Technological Parameters Distribution Effects on the Current-Voltage Characteristics of Field Emitter Arrays Nicolaescu D |
764 - 769 |
Simulations of Fabricated Field Emitter Structures Hong D, Aslam M, Feldmann M, Olinger M |
770 - 775 |
Time-Dependent, Self-Consistent Simulations of Field-Emission from Silicon Using the Wigner Distribution Function Jensen KL, Ganguly AK |
776 - 780 |
Field-Emission from an Elliptic Boss - Exact and Approximate Forms for Area Factors and Currents Jensen KL, Zaidman EG |
781 - 784 |
New Electron Excited Light-Emitting Materials Vecht A, Smith DW, Chadha SS, Gibbons CS, Koh J, Morton D |
785 - 789 |
Phosphor Selection Constraints in Application of Gated Field-Emission Microcathodes to Flat-Panel Displays Chakhovskoi AG, Kesling WD, Trujillo JT, Hunt CE |
790 - 794 |
Deflection Microwave and Millimeter-Wave Amplifiers Tang CM, Lau YY, Swyden TA |
795 - 800 |
Study of the IV Characteristics of Planar-Doped-Barrier Electron Emitters Jiang WN, Mishra UK |
801 - 805 |
Energy-Distribution of Tunneling Emission from Si-Gate Metal-Oxide-Semiconductor Cathode Yokoo K, Sato S, Koshita G, Amano I, Murota J, Ono S |
813 - 814 |
Papers from the 1st International Workshop on Plasma-Based Ion-Implantation - 4-6 August 1993 University-of-Wisconsin-Madison Madison, Wisconsin - Preface Conrad JR, Sridharan K |
815 - 820 |
Metal Plasma Immersion Ion-Implantation and Deposition Using Vacuum-Arc Plasma Sources Anders A, Anders S, Brown IG, Dickinson MR, Macgill RA |
821 - 822 |
50-kv Pulse-Generator for Plasma Source Ion-Implantation Bohm G, Gunzel R |
823 - 827 |
Metal-Ion Implantation - Conventional Versus Immersion Brown IG, Anders A, Anders S, Dickinson MR, Macgill RA |
828 - 832 |
Plasma Ion-Implantation Technology for Broad Industrial Application Deb D, Siambis J, Symons R |
833 - 837 |
Analytical Modeling of Plasma Immersion Ion-Implantation Target Current Using the Spice Circuit Simulator En W, Cheung NW |
838 - 842 |
High-Power Modulator for Plasma Ion-Implantation Goebel DM |
843 - 849 |
Overview of Plasma Source Ion-Implantation Research at University-of-Wisconsin-Madison Malik SM, Sridharan K, Fetherston RP, Chen A, Conrad JR |
850 - 853 |
Plasma Ion-Implantation Technology at Hughes-Research-Laboratories Matossian JN |
854 - 860 |
Survey of High-Voltage Pulse Technology Suitable for Large-Scale Plasma Source Ion-Implantation Processes Reass WA |
861 - 866 |
Magnetic Insulation of Secondary Electrons in Plasma Source Ion-Implantation Rej DJ, Wood BP, Faehl RJ, Fleischmann HH |
867 - 869 |
Development of Plasma Source Ion-Implantation in China Tang BY |
870 - 874 |
Initial Operation of a Large-Scale Plasma Source Ion-Implantation Experiment Wood BP, Henins I, Gribble RJ, Reass WA, Faehl RJ, Nastasi MA, Rej DJ |
875 - 879 |
Measurements of Potentials and Sheath Formation in Plasma Immersion Ion-Implantation Collins GA, Tendys J |
880 - 883 |
Model for Expanding Sheaths and Surface Charging at Dielectric Surfaces During Plasma Source Ion-Implantation Emmert GA |
884 - 888 |
Application of Particle-in-Cell Simulation to Plasma Source Ion-Implantation Faehl R, Devolder B, Wood B |
889 - 896 |
2-Dimensional Fluid Modeling of Time-Dependent Plasma Sheath Hong MP, Emmert GA |
897 - 900 |
Ion-Matrix Sheath Around a Square Bar Sheridan TE, Alport MJ |
901 - 904 |
2 Ion Fluid Model for Plasma Source Ion-Implantation Thomas K, Alport MJ, Sheridan TE |
905 - 909 |
Energy and Angle Distributions of Ions Striking the Spherical Target in Plasma Source Ion-Implantation Wang DZ, Ma TC, Deng XL |
910 - 917 |
Target Temperature Prediction for Plasma Source Ion-Implantation Blanchard JP |
918 - 922 |
Dose Analysis of Nitrogen Plasma Source Ion-Implantation Treatment of Titanium-Alloys Chen A, Firmiss J, Conrad JR |
923 - 926 |
Nitrogen Profiles of High-Dose, High-Temperature Plasma Source Ion-Implantation Treated Austenitic Stainless-Steel Franklyn CB, Nothnagel G |
927 - 930 |
Plasma Source Ion-Implantation of Oxygen and Nitrogen in Aluminum Gunzel R, Wieser E, Richter E, Steffen J |
931 - 934 |
Structure and Wear Behavior of Nitrogen-Implanted Aluminum-Alloys Xia LF, Wang RZ, Ma XX, Sun Y |
935 - 939 |
Significance of Nitrogen Mass-Transfer Mechanisms on the Nitriding Behavior of Austenitic Stainless-Steel Samandi M, Shedden BA, Bell T, Collins GA, Hutchings R, Tendys J |
940 - 944 |
Enhanced Pitting Corrosion-Resistance of 304L Stainless-Steel by Plasma Ion-Implantation Smith PP, Buchanan RA, Roth JR, Kamath SG |
945 - 950 |
Nitrogen Plasma Source Ion-Implantation of Aluminum Walter KC |
951 - 955 |
Structural Characterization of Plasma-Doped Silicon by High-Resolution X-Ray-Diffraction Chapek DL, Conrad JR, Matyi RJ, Felch SB |
956 - 961 |
Anomalous Behavior of Shallow BF3 Plasma Immersion Ion-Implantation Jones EC, En W, Ogawa S, Fraser DB, Cheung NW |
962 - 968 |
Plasma Immersion Ion-Implantation Doping Experiments for Microelectronics Qin S, Chan C |
969 - 972 |
Characteristics of a Plasma Doping System for Semiconductor-Device Fabrication Sheng T, Felch SB, Cooper CB |
973 - 976 |
Plasma Immersion Ion-Implantation for Semiconductor Thin-Film Growth Tuszewski M, Scheuer JT, Campbell IH, Laurich BK |
977 - 980 |
Mechanical-Properties of Si-Diamond-Like Carbon-Films Formed by Ion-Beam-Assisted Deposition Fountzoulas CG, Kattamis TZ, Demaree JD, Kosik WE, Franzen W, Hirvonen JK |
981 - 985 |
Carbonaceous Surface-Layers Deposited on Tin Coatings by Ion-Implantation Franck M, Blanpain B, Celis JP, Roos JR, Pattyn H |
986 - 990 |
Ion-Beam-Induced Densification of Sol-Gel Ceramic Thin-Films Levine TE, Revesz P, Giannelis EP, Mayer JW |
991 - 997 |
Potential Applications of Fusion Neutral Beam Facilities for Advanced Material Processing Williams JM, Tsai CC, Stirling WL, Whealton JH |
1007 - 1007 |
Papers from the 13th North-American Conference on Molecular-Beam Epitaxy - 13-15 September 1993 Stanford-University Stanford, California - Preface Melloch MR |
1009 - 1012 |
Ordered and Randomly Disordered AlAs/GaAs Short-Period Superlattices Arent DJ, Alonso R, Horner G, Bode M, Olson JM, Yin X, Delong MC, Springthorpe AJ, Majeed A |
1013 - 1015 |
Growth Optimization of Molecular-Beam Epitaxy-Grown InAlAs on InP Choi WY, Fonstad CG |
1016 - 1018 |
Modulated Arsenic Molecular-Beam Epitaxial-Growth of In0.48Al0.52As Chou ST, Cheng KY |
1019 - 1022 |
Growth-Studies on In0.5Ga0.5As/AlGaAs Quantum-Wells Grown on GaAs with a Linearly Graded InGaAs Buffer Chui HC, Harris JS |
1023 - 1025 |
Accurate Measurements of Transients and Intentional Rates of Change in Molecular-Beam Epitaxy Growth-Rate Calibrations Fernandez R, Harwit A, Kinell D |
1026 - 1028 |
External Photoluminescence Efficiency and Minority-Carrier Lifetime of (Al,Ga)as/GaAs Multi-Quantum-Well Samples Grown by Molecular-Beam Epitaxy Using Both As2 and As4 Foxon CT, Cheng TS, Dawson P, Lacklison DE, Orton JW, Vandervleuten W, Hughes OH, Henini M |
1029 - 1033 |
Bonding and Migration of in-111 Atoms on GaAs-Surfaces Studied by Perturbed-Angular-Correlation Spectroscopy Fu JM, Adams JM, Catchen GL, Miller DL, Kim J, Gallagher MC, Willis RF |
1034 - 1037 |
Structural-Properties of Highly Mismatched InGaAs-Based Devices Grown by Molecular-Beam Epitaxy on GaAs Substrates Goorsky MS, Eldredge JW, Lord SM, Harris JS |
1038 - 1042 |
Interface Analysis of Dry-Etched and Molecular-Beam Epitaxial Regrown AlGaAs Grober LH, Hong M, Mannaerts JP, Freund RS, Luftman HS, Chu SN |
1043 - 1046 |
Extremely High Uniformity of Interfaces in GaAs/AlGaAs Quantum-Wells Grown on (411)A GaAs Substrates by Molecular-Beam Epitaxy Hiyamizu S, Shimomura S, Wakejima A, Kaneko S, Adachi A, Okamoto Y, Sano N, Murase K |
1047 - 1049 |
In-Situ Nonalloyed Ohmic Contacts to P-GaAs Hong M, Vakhshoori D, Mannaerts JP, Thiel FA, Wynn JD |
1050 - 1052 |
Effects of As4 Flux on Reflection High-Energy Electron-Diffraction Oscillations During Growth of GaAs at Low-Temperatures Ibbetson JP, Mirin RP, Mishra UK, Gossard AC |
1053 - 1055 |
Quantum-Confined Stark Shift Observed by Electroluminescence and Circular-Polarized Luminescence Excitation Spectroscopy in GaAs/AlGaAs Coupled Quantum-Wells Kato Y, Takahashi Y, Fukatsu S, Shiraki Y, Ito R |
1056 - 1058 |
Raman-Scattering Study of the Intermixing of AlAs Monolayers in GaAs Grown by Molecular-Beam Epitaxy Katzer DS, Shanabrook BV, Gammon D |
1059 - 1062 |
Low-Temperature Growth and Characterization of GaAs Epitaxial Layer on (111)B GaAs Substrates Kim GH, Gray JL, Yoo HM, Ohuchi FS |
1063 - 1066 |
Molecular-Beam Epitaxy Growth of Quantum Dots from Strained Coherent Uniform Islands of InGaAs on GaAs Leonard D, Krishnamurthy M, Fafard S, Merz JL, Petroff PM |
1067 - 1070 |
Molecular-Beam Epitaxial-Growth of GaAs on CaF2/Si(111) Substrate Li WD, Anan T, Schowalter LJ |
1071 - 1074 |
Realization of 3-Dimensionally Confined Structures via One-Step in-Situ Molecular-Beam Epitaxy on Appropriately Patterned GaAs(111)B and GaAs(001) Rajkumar KC, Madhukar A, Chen P, Konkar A, Chen L, Rammohan K, Rich DH |
1075 - 1077 |
Application of the Digital Alloy Composition Grading Technique to Strained InGaAs/GaAs/AlGaAs Diode-Laser Active Regions Cody JG, Mathine DL, Droopad R, Maracas GN, Rajesh R, Carpenter RW |
1078 - 1081 |
Determination of AlAs Mole Fraction in AlxGa1-xAs Using Raman-Spectroscopy and X-Ray-Diffraction Solomon GS, Kirillov D, Chui HC, Harris JS |
1082 - 1085 |
Random-Period Superlattice Quantum-Wells Shih YC, Sadra K, Streetman BG |
1086 - 1090 |
Characterization and Improvement of the Layer Uniformity for Large-Area Quantum-Well Device Arrays Grown in an Intevac Varian Gen-II Molecular-Beam Epitaxy System Svensson SP, Towner FJ |
1091 - 1094 |
Molecular-Beam Epitaxy of Mnas Thin-Films on GaAs Tanaka M, Harbison JP, Sands T, Cheeks TL, Keramidas VG, Rothberg GM |
1095 - 1098 |
Study of Lattice-Mismatched (in,Ga)as/GaAs Heterostructures on the Unconventional (110) GaAs Surface Sun DC, Towe E, Bennett BR |
1099 - 1101 |
Growth of the (in,Al,Ga)as Quaternary Alloy System on GaAs at Low Substrate Temperatures by Molecular-Beam Epitaxy Towe E, Sun D, Bennett BR |
1102 - 1105 |
Lateral Variation of Indium Content in InGaAs Grown on GaAs Channeled Substrates by Molecular-Beam Epitaxy Wakejima A, Inoue A, Kitada T, Tomita N, Shimomura S, Hiyamizu S, Fujii M, Yamamoto T, Kobayashi K, Sano N |
1106 - 1109 |
Electrical Characteristics of InP Grown by Molecular-Beam Epitaxy Using a Valved Phosphorus Cracking Cell Baillargeon JN, Cho AY, Fischer RJ, Pearah PJ, Cheng KY |
1110 - 1112 |
Chemical Beam Epitaxy of Strain Balanced Gap/GaAs/InP/GaAs Superlattices Bensaoula AH, Freundlich A, Bensaoula A, Rossignol V, Ponchet A |
1113 - 1115 |
Characterization of High-Quality GaInP/GaAs Superlattices Grown on GaAs and Si Substrates by Gas-Source Molecular-Beam Epitaxy Jelen C, Slivken S, He XG, Razeghi M, Shastry S |
1116 - 1118 |
Structural and Optical Characterizations of InAsP/InP Strained Multiple-Quantum Wells Grown on InP(111)B Substrates Hou HQ, Tu CW, Shan W, Hwang SJ, Song JJ, Chu SN |
1119 - 1121 |
Operation of a Molecular-Beam Epitaxy Machine Employing a Valved Solid Phosphorus Source Wicks GW, Koch MW, Johnson FG, Varriano JA, Kohnke GE, Colombo P |
1122 - 1124 |
Molecular-Beam Epitaxy-Grown Alassb/Gaassb Distributed-Bragg-Reflector on InP Substrate Operating Near 1.55-Mu-M Blum O, Fritz IJ, Dawson LR, Howard AJ, Headley TJ, Olsen JA, Klem JF, Drummond TJ |
1125 - 1128 |
Reflection High-Energy Electron-Diffraction Observation of Exchange-Reaction Dynamics on InAs Surfaces Collins DA, Wang MW, Grant RW, Mcgill TC |
1129 - 1132 |
Recombination Lifetime in InAs-Ga1-xInxSb Superlattices Youngdale ER, Meyer JR, Hoffman CA, Bartoli FJ, Miles RH, Chow DH |
1133 - 1135 |
Reflection High-Energy Electron-Diffraction Study of the GaSb Surface During Molecular-Beam Epitaxy Yano M, Yamamoto K, Utatsu T, Inoue M |
1136 - 1139 |
Molecular-Beam Epitaxy Growth of Bi Epilayers and Bi-CdTe Superlattices Divenere A, Yi XJ, Hou CL, Wang HC, Chen J, Ketterson JB, Wong GK, Meyer JR, Hoffman CA, Bartoli FJ |
1140 - 1142 |
1st Indications of Spontaneous Ordering in Znse0.50Te0.50 Alloy Luo H, Samarth N, Short SW, Xin SH, Furdyna JK, Ahrenkiel P, Bode MH, Aljassim MM |
1143 - 1145 |
Migration-Enhanced Epitaxy and Optical-Properties of ZnSe/CdSe Digital Alloy Quantum-Wells Short SW, Luo H, Xin S, Yin A, Pareek A, Dobrowolska M, Furdyna JK |
1146 - 1149 |
Characteristic Zeeman Patterns in Novel Graded Gap II-VI Quantum-Well Structures Hagston WE, Weston SJ, Oneill M, Stirner T, Harrison P, Hogg JH, Ashenford DE, Lunn B |
1150 - 1152 |
Exciton Dynamics in Multiquantum-Well CdTe-Cd1-xMnxTe Systems Stirner T, Hagston WE, Oneill M, Harrison P |
1153 - 1155 |
Gas-Source Molecular-Beam Epitaxy Growth of ZnSe on Novel Buffer Layers Lu K, Fisher PA, House JL, Ho E, Coronado CA, Petrich GS, Kolodziejski LA, Hua GC, Otsuka N |
1156 - 1159 |
Time-of-Flight Measurement of Carrier Transport and Carrier Collection in Strained Si1-xGex/Si Quantum-Wells Fukatsu S, Fujiwara A, Muraki K, Takahashi Y, Shiraki Y |
1160 - 1162 |
Room-Temperature Photoluminescence in Strained Si1-xGex/Si Quantum-Wells Fukatsu S, Sunamura H, Shiraki Y |
1163 - 1166 |
Novel Integration of a Group IV Electron-Beam Deposition Capability with a III-V Molecular-Beam Epitaxy System Lee HP, Szalkowski FJ, Sato DL, Liu X, Ranalli E, George T |
1167 - 1169 |
Study of Interaction Between Incident Silicon and Germanium Fluxes and SiO2 Layer Using Solid-Source Molecular-Beam Epitaxy Yun SJ, Lee SC, Kim BW, Kang SW |
1170 - 1173 |
Atomic Layer-by-Layer Epitaxy of Cuprate Superconductors Bozovic I, Eckstein JN, Virshup GF |
1174 - 1177 |
Growth Morphologies of (001), (100), and (010) Oriented Er5Ba7Cu12Oy High-Temperature Superconductor Thin-Films on Various Substrates Choudhary KM, Seshadri P, Black M |
1178 - 1180 |
Effects of Oxygen on the Sublimation of Alkaline-Earths from Effusion Cells Hellman ES, Hartford EH |
1181 - 1183 |
Atomically Controlled Growth of GaAs/NiAl/GaAs Structures by Molecular-Beam Epitaxy Hirono S, Tanimoto M, Inoue N |
1184 - 1185 |
Stabilized Alpha-Sn Grown at High-Temperature by Molecular-Beam Epitaxy Kimata M, Suzuki T, Saino K, Kawamura K, Hobbs A |
1186 - 1189 |
Growth of Group-III Nitrides on Si(111) by Plasma-Assisted Molecular-Beam Epitaxy Stevens KS, Ohtani A, Schwartzman AF, Beresford R |
1190 - 1192 |
Carbon P+ Doping of Molecular-Beam Epitaxial GaAs Films Using Carbon Tetrabromide Lemonias PJ, Hoke WE, Weir DG, Hendriks HT |
1193 - 1196 |
Carbon Doping of InGaAs in Solid-Source Molecular-Beam Epitaxy Using Carbon Tetrabromide Hwang WY, Miller DL, Chen YK, Humphrey DA |
1197 - 1199 |
Some Doping Results in ZnSe Grown by Molecular-Beam Epitaxy Li LK, Wang WI, Gaines JM, Petruzzello J, Marshall T |
1200 - 1202 |
Carbon Doping by a Compact Electron-Beam Source Vanhove JM, Chow PP, Rosamond MF, Carpenter GL, Chow LA |
1203 - 1206 |
Boron Delta-Doping in Si and SiGe and Its Application Toward Field-Effect Transistor Devices Carns TK, Zheng X, Wang KL, Wu SL, Wang SJ |
1207 - 1210 |
Pyrometric Interferometry for Real-Time Molecular-Beam Epitaxy Process Monitoring Bobel FG, Moller H, Wowchak A, Hertl B, Vanhove J, Chow LA, Chow PP |
1211 - 1213 |
Determination of Molecular-Beam Epitaxial-Growth Parameters by Ellipsometry Droopad R, Kuo CH, Anand S, Choi KY, Maracas GN |
1214 - 1216 |
Measurement of GaAs Temperature-Dependent Optical-Constants by Spectroscopic Ellipsometry Kuo CH, Anand S, Droopad R, Choi KY, Maracas GN |
1217 - 1220 |
Dual-Beam Atomic-Absorption Spectroscopy for Controlling Thin-Film Deposition Rates Benerofe SJ, Ahn CH, Wang MM, Kihlstrom KE, Do KB, Arnason SB, Fejer MM, Geballe TH, Beasley MR, Hammond RH |
1221 - 1224 |
In-Situ Thickness Monitoring and Control for Highly Reproducible Growth of Distributed Bragg Reflectors Houng YM, Tan MR, Liang BW, Wang SY, Mars DE |
1225 - 1228 |
Factors Affecting the Temperature Uniformity of Semiconductor Substrates in Molecular-Beam Epitaxy Johnson SR, Lavoie C, Nodwell E, Nissen MK, Tiedje T, Mackenzie JA |
1229 - 1231 |
Efficient Liquid-Nitrogen Supply-System for the Cooling Shroud in a Molecular-Beam Epitaxy System Cook JW, Schetzina JF |
1232 - 1235 |
Atomic Nitrogen-Production in a Molecular-Beam Epitaxy Compatible Electron-Cyclotron-Resonance Plasma Source Vaudo RP, Cook JW, Schetzina JF |
1236 - 1238 |
Reflection High-Energy Electron-Diffraction Intensity Oscillations During Molecular-Beam Epitaxy on Rotating Substrates Vanderwagt JP, Harris JS |
1239 - 1241 |
Molecular-Beam Epitaxial-Growth and Properties of Si-Doped GaAs/AlGaAs Quantum-Wells Asom MT, Livescu G, Swaminathan V, Geva M, Luther L |
1242 - 1245 |
Electrical and Optical-Properties of Heavily N-Doped GaSb-AlSb Multiquantum-Well Structures for Infrared Photodetector Applications Brar B, Samoska L, Kroemer H, English JH |
1246 - 1250 |
Growth of GaAs Light Modulators on Si by Gas-Source Molecular-Beam Epitaxy for 850 nm Optical Interconnects Cunningham JE, Goossen KW, Walker JA, Jan W, Santos M, Miller DA |
1251 - 1253 |
Chemical Beam Epitaxy of InP-Based Solar-Cells and Tunnel-Junctions Vilela MF, Rossignol V, Bensaoula A, Medelci N, Freundlich A |
1254 - 1257 |
Molecular-Beam Epitaxy Growth of Pseudomorphic II-VI Multilayered Structures for Blue-Green Laser-Diodes and Light-Emitting-Diodes Han J, He L, Grillo DC, Clark SM, Gunshor RL, Jeon H, Salokatve A, Nurmikko AV, Hua GC, Otsuka N |
1258 - 1261 |
Buried Heterostructure Laser-Diodes Fabricated Using in-Situ Processing Hong M, Vakhshoori D, Grober LH, Mannaerts JP, Asom MT, Wynn JD, Thiel FA, Freund RS |
1262 - 1265 |
Blue-Green ZnSe-Zncdse Light-Emitting-Diodes and Photopumped Laser Structures Grown by Molecular-Beam Epitaxy on ZnSe Substrates Ren J, Eason DB, Yu Z, Sneed B, Cook JW, Schetzina JF, Elmasry NA, Yang XH, Song JJ, Cantwell G, Harsh WC |
1266 - 1268 |
Molecular-Beam Epitaxy Growth of High-Performance Midinfrared Diode-Lasers Turner GW, Choi HK, Calawa DR, Pantano JV, Chludzinski JW |
1269 - 1272 |
Photocontrolled Double-Barrier Resonant-Tunneling Diode Li HS, Chen YW, Wang KL, Pan DS, Chen LP, Liu JM |
1273 - 1276 |
Studies of Si Segregation in GaAs Using Current-Voltage Characteristics of Quantum-Well Infrared Photodetectors Wasilewski ZR, Liu HC, Buchanan M |
1277 - 1279 |
One-Dimensional Wire Formed by Molecular-Beam Epitaxial Regrowth on a Patterned Pnpnp GaAs Substrate Burroughes JH, Grimshaw MP, Leadbeater ML, Ritchie DA, Pepper M, Jones GA |
1280 - 1282 |
High-Quality Strained Quantum Wires Grown by Molecular-Beam Epitaxy on (100) GaAs Substrate Chen YP, Reed JD, Schaff WJ, Eastman LF |
1283 - 1285 |
Current-Controlled Negative Differential Resistance in InAs/AlxGa1-Xsb Tunnel Structures Chow DH, Schulman JN |
1286 - 1289 |
50 nm GaAs/AlAs Wire Structures Grown on Corrugated GaAs Miller DJ, Harris JS |
1290 - 1292 |
Effect of the Proximity of an Ex-Situ Patterned Interface on the Quality of 2-Dimensional Electron Gases at GaAs/AlGaAs Heterojunctions Grimshaw MP, Ritchie DA, Burroughs JH, Jones GA |
1293 - 1295 |
Fabrication of Independent Contacts to 2 Closely Spaced 2-Dimensional Electron Gases Using Molecular-Beam Epitaxy Regrowth and in-Situ Focused Ion-Beam Lithography Brown KM, Linfield EH, Ritchie DA, Jones GA, Grimshaw MP, Churchill AC |
1296 - 1299 |
Optimization of High-Mobility 2-Dimensional Hole Gases Simmons MY, Ritchie DA, Zailer I, Churchill AC, Jones GA |
1300 - 1302 |
AlGaAs/Ge/GaAs Heterostructures Grown by Molecular-Beam Epitaxy Wang Y, Baruch N, Wang WI, Cheney ME, Huang CI, Scherer RL |
1303 - 1305 |
Observation of Quantum-Mechanical Reflections of Electrons at an in-Situ Grown GaAs/Aluminum Schottky-Barrier Weckwerth MV, Vanderwagt JP, Harris JS |
1306 - 1308 |
Modulation-Doped InAlAs/InGaAs Quantum-Well Structures for High-Electron-Mobility Transistors Klein W, Bohm G, Sexl M, Grigull S, Heiss H, Trankle G, Weimann G |
1309 - 1311 |
Double-Quantum-Well Charge-Transport in Pseudomorphic Al0.3Ga0.7As/In0.15Ga0.85As/GaAs Modulation-Doped Heterostructures Young AP, Fernandez JM, Chen JH, Wieder HH |