181 - 185 |
Identification and Visualization of Questionable Regions in Atomic-Force Microscope Images Leung EC, Markiewicz P, Goh MC |
186 - 191 |
Surface Process and Interaction of Mo Clusters on Highly Oriented Pyrolytic-Graphite Observed by Scanning-Tunneling-Microscopy Xu H, Ng KY |
192 - 197 |
Atomic-Force Microscopic Observation at Initial Growth Stage of Vacuum-Deposited Thin-Film of Polyvinylidenefluoride Seyama H, Maki K, Yamazaki N |
198 - 201 |
Thin-Film Interference Effects in an Off-Axis Illumination System Azuma T, Sato T |
202 - 208 |
Optical-Emission Spectroscopy of High-Density Metal Plasma Formed During Magnetron Sputtering Radzimski ZJ, Hankins OE, Cuomo JJ, Posadowski WP, Shingubara S |
209 - 213 |
Effect of Annealing Temperature on Electrical Stability of Radio-Frequency Magnetron-Sputtered Silicon-Oxides Jelenkovic EV, Tong KY |
214 - 220 |
Chemical Challenge of Submicron Oxide Etching Mcnevin SC, Guinn KV, Taylor JA |
221 - 225 |
Pattern Profile Control of Polysilicon in Magnetron Reactive Ion Etching Kimizuka M, Ozaki Y |
226 - 231 |
Thermal Anneal Activation of Near-Surface Deep-Level Defects in Electron-Cyclotron-Resonance Hydrogen Plasma-Exposed Silicon Nam CW, Ashok S, Sekiguchi T |
232 - 236 |
Influence of Plasma Gas and Postcleaning on the Electrical Characteristics of Plasma-Exposed Al/N-Si Schottky Diodes Kuroda T, Lin ZD, Iwakuro H, Sato S |
237 - 240 |
Copper Dry-Etching with Precise Wafer-Temperature Control Using Cl-2 Gas as a Single Reactant Miyazaki H, Takeda K, Sakuma N, Kondo S, Homma Y, Hinode K |
241 - 246 |
Electrical and Structural Characterization of PtSi/P-Si1-xGex Low Schottky-Barrier Junctions Prepared by Cosputtering Nur O, Willander M, Turan R, Sardela MR, Radamson HH, Hansson GV |
247 - 251 |
Structural Characterization of Thin Ni Films Deposited on (001)ZnSe Ruvimov S, Lilientalweber Z, Bourret ED, Swider W, Washburn J, Duxstad KJ, Haller EE |
252 - 258 |
Metal-Insulator-Semiconductor Structure on GaAs Using a Pseudomorphic Si/Gap Interlayer Park DG, Mohammad SN, Chen Z, Morkoc H |
259 - 266 |
Physical-Properties and Microelectronic Applications of Low Permittivity Fluoromethylene Cyanate Ester Resins Buckley LJ, Snow AW |
267 - 272 |
Etching and Boron-Diffusion of High-Aspect-Ratio Si Trenches for Released Resonators Weigold JW, Juan WH, Pang SW |
273 - 276 |
Lateral Range Spread of MeV Phosphorus Ions Implanted in Silicon Measured by Time-of-Flight Secondary-Ion Mass-Spectrometry Shi BR, Cue N, Smith TL, Xu TB |
277 - 281 |
Thermal-Desorption Spectroscopy and Molecular-Beam Time-of-Flight Studies of Silicon-Wafer Ultraviolet/Ozone Cleaning Yamaguchi K, Uematsu Y, Ikoma Y, Watanabe F, Motooka T, Igarashi T |
282 - 286 |
Spark-Gap Atomic-Emission Microscopy .2. Improvements in Resolution Vanpatten PG, Noll JD, Myrick ML |
287 - 292 |
Generation of Diffraction-Free Beams for Applications in Optical Microlithography Erdelyi M, Horvath ZL, Szabo G, Bor Z, Tittel FK, Cavallaro JR, Smayling MC |
293 - 298 |
Fabrication and Analysis of Extreme-Ultraviolet Reflection Masks with Patterned W/C Absorber Bilayers Voorma HJ, Louis E, Koster NB, Bijkerk F, Zijlstra T, Degroot LE, Rousseeuw BA, Romijn J, Vanderdrift EW, Friedrich J |
299 - 305 |
New Deep-Ultraviolet Positive Photoresists .2. Copolymers of P-Trimethylsilylstyrenes and Acrylics Chiang WY, Shann HD |
306 - 310 |
Novel Electron-Beam Lithography Technique for Submicron T-Gate Fabrication Ahmed MM, Ahmed H |
311 - 315 |
Quantitative Measurement of the Resist Heating in a Variable Shaped Electron Lithography Babin S, Hudek P, Kostic I |
316 - 320 |
Molecular-Beam Epitaxy of Highly Mismatched In0.73Ga0.27As on InP for Near-Infrared Photodetectors Kochhar R, Hwang WY, Micovic M, Mayer TS, Miller DL, Lord SM |
321 - 324 |
InAs Room-Temperature Infrared Photoconductive Detectors Grown by Molecular-Beam Epitaxy Liu BD, Lin RM, Lee SC, Sun TP |
325 - 328 |
Surface Decontamination of Patterned GaAs Substrates for Molecular-Beam Epitaxy Regrowth Using a Hydrogen Radical Source Burke TM, Quierin MA, Grimshaw MP, Ritchie DA, Pepper M, Burroughes JH |
329 - 336 |
Substrate-Temperature Measurement by Absorption-Edge Spectroscopy During Molecular-Beam Epitaxy of Narrow-Band Gap Semiconductor-Films Delyon TJ, Roth JA, Chow DH |
337 - 342 |
Theoretical-Analysis of Field-Emission from a Metal Diamond Cold-Cathode Emitter Lerner P, Cutler PH, Miskovsky NM |
343 - 348 |
Fabrication of Arrayed Glassy-Carbon Field Emitters Sohda Y, Tanenbaum DM, Turner SW, Craighead HG |
349 - 360 |
Sensor Nanofabrication, Performance, and Conduction Mechanisms in Scanning Thermal Microscopy Luo K, Shi Z, Varesi J, Majumdar A |
361 - 368 |
Multiparameter Grating Metrology Using Optical Scatterometry Raymond CJ, Murnane MR, Prins SL, Sohail S, Naqvi H, Mcneil JR, Hosch JW |
369 - 372 |
A Simple Fabrication Method for Nanometer-Scale Thin-Metal Stencils Zimmerman NM |
373 - 373 |
Scaling of Si and GaAs Trench Etch Rates with Aspect Ratio, Feature Width, and Substrate-Temperature (Vol 13, Pg 92, 1995) Bailey AD, Vandesanden MC, Gregus JA, Gottscho RA |
383 - 383 |
Papers from the 9th-International-Vacuum-Microelectronics-Conference - Preface Fursey GN, Glazanov DV, Fletcher LA |
385 - 390 |
Microtips and Resistive Sheet - A Theoretical Description of the Emissive Properties of This System Baptist R, Bachelet F, Constancias C |
391 - 393 |
Simulation of Field-Emission and Electrodynamic Characteristics for Triode Near-Cathode Modulators with Edge Field Emitter Arrays Zakharchenko YF, Sinitsyn NL, Gulyaev YV |
394 - 397 |
Numerical Modeling of the Disk-Edge Field Emitter Triode Wang C, Wang BP, Zhao HW, Sin JK, Poon MC |
398 - 400 |
Hot-Electron and Quasi-Ballistic Transport of Nonequilibrium Electrons in Diamond Thin-Films Lerner P, Cutler PH, Miskovsky N |
401 - 404 |
Effects of Vacuum Conditions on Low-Frequency Noise in Silicon Field-Emission Devices Trujillo JT, Chakhovskoi AG, Hunt CE |
405 - 409 |
Modulation of the Current in a Field Emitter Caused by a Continuous-Wave or Pulsed-Laser - Simulations and Experimental Results Hagmann MJ, Brugat M |
410 - 421 |
Field-Emission Processes from a Liquid-Metal Surface Fursey GN, Shirochin LA, Baskin LM |
422 - 424 |
Work Function Estimate for Electrons Emitted from Nanotube Carbon Cluster Films Gulyaev YV, Sinitsyn NI, Torgashov GV, Mevlyut ST, Zhbanov AI, Zakharchenko YF, Kosakovskaya ZY, Chernozatonskii LA, Glukhova OE, Torgashov IG |
425 - 427 |
Fabrication and Field-Emission Study of Gated Diamond-Like-Carbon-Coated Silicon Tips Lee S, Ju BK, Lee YH, Jeon D, Oh MH |
428 - 430 |
Relationship Between Field-Emission Characteristics and Hydrogen Content in Diamond-Like Carbon Deposited by the Layer-by-Layer Technique Using Plasma-Enhanced Chemical-Vapor-Deposition Park KC, Moon JH, Chung SJ, Oh MH, Milne WI, Jang J |
431 - 433 |
Field-Emission Properties of Ta-C Films with Nitrogen Doping Park KC, Moon JH, Chung SJ, Jung JH, Ju BK, Oh MH, Milne WI, Han MK, Jang J |
434 - 438 |
Low-Temperature Reactive Ion Etching of Silicon with SF6/O-2 Plasmas Wells T, Elgomati MM, Wood J |
439 - 441 |
Layered Structures with Delta-Doped Layers for Enhancement of Field-Emission Evtukh AA, Litovchenko VG, Marchenko RI, Kydzinovski SY |
442 - 445 |
Diamond Cold Cathodes for Electron Guns Givargizov EI, Zhirnov VV, Chubun NN, Voronin AB |
446 - 449 |
Emission Characterization of Diamond-Coated Si Field-Emission Arrays Zhirnov VV, Givargizov EI, Kandidov AV, Seleznev BV, Alimova AN |
450 - 453 |
Fabrication of Field-Emission Display Prototype Based an Si Field-Emission Arrays with Diamond Coating Givargizov EI, Zhirnov VV, Chubun NN, Stepanova AN |
454 - 456 |
Field-Emission of Nitrogen-Doped Diamond-Like Carbon-Films Deposited by Plasma-Enhanced Chemical-Vapor-Deposition Park KC, Moon JH, Chung SJ, Jang J |
457 - 459 |
Self-Aligned Silicon Tips Coated with Diamond-Like Carbon Lee S, Lee S, Lee S, Jeon D, Lee KR |
460 - 463 |
Physical Characterization of Diamond Pyramidal Microtip Emitters Kang WP, Davidson JL, George MA, Milosavljevic I, Li Q, Xu JF, Kerns DV |
464 - 467 |
Fabrication and Characterization of Volcano-Shaped Field Emitters Surrounded by Planar Gates Lee CG, Park BG, Lee JD |
468 - 471 |
Fabrication of Metal Field Emitter Arrays on Polycrystalline Silicon Kim IH, Lee CG, Kim YH, Park BG, Lee JD |
472 - 476 |
Process Design and Emission Properties of Gated N(+) Polycrystalline Silicon Field Emitter Arrays for Flat-Panel Display Applications Uh HS, Kwon SJ, Lee JD |
477 - 481 |
Anodic Bonding Technique Under Low-Temperature and Low-Voltage Using Evaporated Glass Choi WB, Ju BK, Lee YH, Haskard MR, Sung MY, Oh MH |
482 - 487 |
Surface Modification by the Voltage Pulse in a Scanning Tunneling Microscope Vladimirov GG, Drozdov AV |
488 - 490 |
Fully Large-Scale Integration-Process-Compatible Si Field Emitter Technology with High Controllability of Emitter Height and Sharpness Takemura H, Furutake N, Nisimura M, Tsuida S, Yoshiki M, Okamoto A, Miyano S |
491 - 494 |
Dual Scanning Tunneling Microscope Mode of the Surface-Diffusion Metal-Ion Source - Li Transfer and Scanning Gupalo MS, Yarish IL, Zlupko VM, Suchorski Y |
495 - 498 |
Atom-Probe Determination of the Multicomponent Material Thermo-Field Microprotrusion Parameters Kontorovich EL, Loginov MV, Shrednik VN |
499 - 502 |
Emission Characteristic of Diamond-Tip Field Emitter Arrays Fabricated by Transfer Mold Technique Kim S, Ju BK, Lee YH, Park BS, Baik YJ, Lim S, Oh MH |
503 - 506 |
Experimental-Study of Matrix Carbon Field-Emission Cathodes and Computer-Aided-Design of Electron Guns for Microwave-Power Devices, Exploring These Cathodes Grigoriev YA, Petrosyan AI, Penzyakov VV, Pimenov VG, Rogovin VI, Shesterkin VI, Kudryashov VP, Semyonov VC |
507 - 511 |
Characterization of Novel Powder and Thin-Film RGB Phosphors for Field-Emission Display Application Chakhovskoi AG, Hunt CE, Malinowski ME, Felter TE, Talin AA |
512 - 515 |
Thin-Film Phosphor Prepared by Physical Vapor-Deposition for Field-Emission Display Application Lee YH, Song MH, Ju BK, Shin DK, Oh MH |
516 - 519 |
Phosphor Challenge for Field-Emission Flat-Panel Displays Hunt CE, Chakhovskoi AG |
520 - 523 |
Optical Characteristics of the Phosphor Screen in Field-Emission Environments Kang SW, Jeon BS, Yoo JS, Lee JD |
524 - 527 |
Development of 4-in Field-Emission Displays Gorfinkel B, Kim JM |
528 - 532 |
Reliability-Analysis of 4-in Field-Emission Display Kim JM, Hong JP, Kim JW, Choi JH, Park NS, Kang JH, Jang JE, Ryu YS, Yang HC |
533 - 534 |
Distributed Generator with Extended Interaction on Field Emitter Arrays Zakharchenko YF, Sinitsyn NI, Gulyaev YV |
535 - 538 |
Characterization of Lateral Thin-Film-Edge Field Emitter Arrays Johnson BR, Akinwande AI, Murphy D |