1125 - 1133 |
Noise in scanning capacitance microscopy measurements Zavyalov VV, McMurray JS, Williams CC |
1134 - 1137 |
Optical active gallium arsenide cantilever probes for combined scanning near-field optical microscopy and scanning force microscopy Heisig S, Rudow O, Oesterschulze E |
1138 - 1143 |
Resolution in scanning near-field cathodoluminescence microscopy Pastre D, Bubendorff JL, Troyon M |
1144 - 1150 |
Imaging of soft structures: Dependence of contrast in atomic force microscopy images on the force applied by the tip Teschke O, Ceotto G, de Souza EF |
1151 - 1155 |
Study of Pb diffusion on Si(111)-(7x7) with scanning tunneling microscopy: Low coverage Slezak J, Chab V, Chvoj Z, Mutombo P |
1156 - 1159 |
Study on nucleation and growth of Ag nanoparticles prepared by radio-frequency sputtering on highly oriented pyrolytic graphite and amorphous carbon Lu WG, Wu H, Xiong YQ, Guo Y, Yang DQ, Li HL |
1160 - 1170 |
Electrical testing of gold nanostructures by conducting atomic force microscopy Bietsch A, Schneider MA, Welland ME, Michel B |
1171 - 1176 |
Direct patterning of noble metal nanostructures with a scanning tunneling microscope Marchi F, Tonneau D, Dallaporta H, Safarov V, Bouchiat V, Doppelt P, Even R, Beitone L |
1177 - 1181 |
Fabrication of dissimilar metal electrodes with nanometer interelectrode distance for molecular electronic device characterization Guillorn MA, Carr DW, Tiberio RC, Greenbaum E, Simpson ML |
1182 - 1186 |
Ti/TiN coatings for microfabricated cantilevers used in atomic force microscopy Wiederhold KP, Yamaguchi Y, Ayala A, Matheaus M, Gutierrez CJ, Galloway HC |
1187 - 1189 |
Nanometer-scale data storage on 3-phenyl-1-ureidonitrile thin film using scanning tunneling microscopy Shi DX, Ma LP, Xie SS, Pang SJ |
1190 - 1193 |
Defect observation on a 12-in. silicon wafer using large sample atomic force microscopy Nishimura T, Wakiyama S, Yasutake M, Sugano Y, Fujino N |
1194 - 1197 |
Characterization and nanometer-scale modifications of Bi2Te3 surface via atomic force microscopy Czajka R, Horak J, Lost'ak P, Karamazov S, Vanis J, Walachova J |
1198 - 1202 |
Homoepitaxial diamond (001) thin film studied by reflection high-energy electron diffraction, contact atomic force microscopy, and scanning tunneling microscopy Takami T, Kusunoki I, Nishitani-Gamo M, Ando T |
1203 - 1206 |
Comparison between tantalum carbosulfide and TaCl5-graphite intercalation compound by scanning tunneling microscopy Walter J, Shioyama H, Hara S |
1207 - 1211 |
High current density field emission from arrays of carbon nanotubes and diamond-clad Si tips Tarntair FG, Chen LC, Wei SL, Hong WK, Chen KH, Cheng HC |
1212 - 1215 |
Arrays of field emission cathode structures with sub-300 nm gates Bernhardt AF, Contolini RJ, Jankowski AF, Liberman V, Morse JD, Musket RG, Barton R, Macaulay J, Spindt C |
1216 - 1221 |
Mapping the field-emission tunneling barrier of organic adsorbates on tungsten Condon GR, Panitz JA |
1222 - 1226 |
Prebreakdown and breakdown investigation of needle-plane vacuum gaps in the micron/submicron regime Muzykov PG, Ma XY, Sudarshan TS |
1227 - 1231 |
Influence of getter activation and aging in a frit-sealed field emission display panel Kwon SJ, Hong KJ, Lee JD, Oh CW, Yoo JS, Kwon YB |
1232 - 1236 |
Growth of InxGa1-xAs/GaAs heterostructures using Bi as a surfactant Pillai MR, Kim SS, Ho ST, Barnett SA |
1237 - 1243 |
Electrical properties and defect states in undoped high-resistivity GaN films used in high-power rectifiers Polyakov AY, Smirnov NB, Govorkov AV, Dang G, Zhang AP, Ren F, Cao XA, Pearton SJ, Wilson RG |
1244 - 1250 |
Elevated source drain devices using silicon selective epitaxial growth Samavedam SB, Dip A, Phillips AM, Tobin PJ, Mihopolous T, Taylor WJ, Adetutu O |
1251 - 1253 |
Normal-incidence SiGe/Si photodetectors with different buffer layers Jiang RL, Lo ZY, Chen WM, Zang L, Zhu SM, Liu XB, Cheng XM, Chen ZZ, Chen P, Han P, Zheng YD |
1254 - 1261 |
Radio frequency plasma annealing of positive charge generated by Fowler-Nordheim electron injection in buried oxides in silicon Nazarov AN, Kilchytska VI, Barchuk IP, Tkachenko AS, Ashok S |
1262 - 1267 |
Process damage assessment of a low energy inductively coupled plasma-based neutral source Tang XM, Wang Q, Manos DM |
1268 - 1275 |
Water-assisted repair of plasma-induced damage in the silicon/silicon-dioxide system Itsumi M, Maeda M, Takeuchi H, Morie T |
1276 - 1280 |
Effect of oxygen plasma exposure of porous spin-on-glass films Kondoh E, Asano T, Nakashima A, Komatu M |
1281 - 1287 |
Low temperature oxidation and selective etching of chemical vapor deposition a-SiC : H films Baklanov MR, Van Hove M, Mannaert G, Vanhaelemeersch S, Bender H, Conard T, Maex K |
1288 - 1293 |
Navolak-diazonaphthoquinone resists: The central role of phenolic strings Reiser A, Yan ZL, Han YK, Kim MS |
1294 - 1298 |
Modeling anomalous depth dependent dissolution effects in chemically amplified resists Cheng MS, Tyminski J, Croffie E, Neureuther A |
1299 - 1305 |
Optimized design for the scattering with angular limitation in projection electron-beam lithography based electron projection system Xiu K, Gibson JM |
1306 - 1313 |
Experimentation and modeling of organic photocontamination on lithographic optics Kunz RR, Liberman V, Downs DK |
1314 - 1321 |
Role of passivation etch polymers in interfacial delamination for polymeric low-k dielectrics Breen MR, Foster CM, Bass S, Lee JJ, Mlynko W |
1322 - 1332 |
Highly localized thermal, mechanical, and spectroscopic characterization of polymers using miniaturized thermal probes Hammiche A, Bozec L, Conroy M, Pollock HM, Mills G, Weaver JMR, Price DM, Reading M, Hourston DJ, Song M |
1333 - 1337 |
Diffusion barrier properties of ZrN films in the Cu/Si contact systems Takeyama MB, Noya A, Sakanishi K |
1338 - 1342 |
Schottky barrier formation at Cu/TiB2/TiSi2/Si interface Pelleg J |
1343 - 1347 |
Kinetic simulation of metal chemical-vapor deposition on high aspect ratio features in modern very-large-scale-integrated processing Li M, Dew S, Brett M, Smy T |
1348 - 1351 |
Effects of O-2 gas flow ratio and flow rate on the formation of RuO2 thin films by reactive sputtering Abe Y, Kaga Y, Kawamura M, Sasaki K |
1352 - 1363 |
Process diagnostics and thickness metrology using in situ mass spectrometry for the chemical vapor deposition of W from H-2/WF6 Gougousi T, Xu YH, Kidder JN, Rubloff GW, Tilford CR |
1364 - 1368 |
Resonance enhanced multiphoton ionization as a diagnostic tool in glow discharge plasmas Senkan S, Ly A |
1369 - 1374 |
Channeling-induced asymmetric distortion of depth profiles from polycrystalline-TiN/Ti/TiN(001) trilayers during secondary ion mass spectrometry Ramanath G, Greene JE, Petrov I, Baker JE, Allen LH, Gillen G |
1375 - 1380 |
X-ray rocking curve analysis of tetragonally distorted ternary semiconductors on mismatched (001) substrates Zhang XG, Parent DW, Li P, Rodriguez A, Zhao G, Ayers JE, Jain FC |
1381 - 1384 |
Real-time composition control using spectral ellipsometry in growth of Hg1-xCdxTe by molecular beam epitaxy Aqariden F, Shih HD, Liao PK, Duncan WM, Dat R |
1385 - 1391 |
Determination of pore size distribution in thin films by ellipsometric porosimetry Baklanov MR, Mogilnikov KP, Polovinkin VG, Dultsev FN |
1392 - 1396 |
Characterization of low-temperature wafer bonding by infrared spectroscopy Milekhin A, Friedrich M, Hiller K, Wierner M, Gessner T, Zahn DRT |
1397 - 1401 |
Electronic structure, growth, and structural and magnetic properties of magnetic semiconductor Fe/GaAs heterostructures Hirose S, Haneda S, Yamaura M, Hara K, Munekata H |
1402 - 1405 |
Granulated metal nanostructure deposited by laser ablation accompanied by cascade drop fission Kozhevin VM, Yavsin DA, Kouznetsov VM, Busov VM, Mikushkin VM, Nikonov SY, Gurevich SA, Kolobov A |
1406 - 1408 |
Nonalloy Ohmic contact fabrication in a hydrothermally grown n-ZnO (0001) substrate by KrF excimer laser irradiation Akane T, Sugioka K, Midorikawa K |
1409 - 1411 |
Highly selective dry etching of III nitrides using an inductively coupled Cl-2/Ar/O-2 plasma Lee JM, Chang KM, Lee IH, Park SJ |
1412 - 1416 |
Tailoring etch directionality in a deep reactive ion etching tool Ayon AA, Nagle S, Frechette L, Epstein A, Schmidt MA |
1425 - 1425 |
Papers from the 18th North American Conference on Molecular Beam Epitaxy - Preface Mars D |
1426 - 1430 |
Smart pyrometry for combined sample temperature and reflectance measurements in molecular-beam epitaxy Bertness KA |
1431 - 1434 |
Real-time measurements of stress relaxation in InGaAs/GaAs Beresford R, Yin J, Tetz K, Chason E |
1435 - 1438 |
Real-time composition control of InAlAs grown on InP using spectroscopic ellipsometry Beaudoin M, Grassi E, Johnson SR, Ramaswamy K, Tsakalis K, Alford TL, Zhang YH |
1439 - 1442 |
Closed-loop control of resonant tunneling diode barrier thickness using in situ spectroscopic ellipsometry Roth JA, Williamson WS, Chow DH, Olson GL, Johs B |
1443 - 1447 |
Precise and efficient ex situ technique for determining compositions and growth rates in molecular-beam epitaxy grown semiconductor alloys Peiris FC, Lee S, Bindley U, Furdyna JK |
1448 - 1452 |
Using statistical experimental design to investigate the role of the initial growth conditions on GaN epitaxial films grown by molecular beam epitaxy Lee KK, Doolittle WA, Brown AS, May GS, Stockh SR |
1453 - 1456 |
Properties of Ga2O3(Gd2O3)/GaN metal-insulator-semiconductor diodes Hong M, Anselm KA, Kwo J, Ng HM, Baillargeon JN, Kortan AR, Mannaerts JP, Cho AY, Lee CM, Chyi JI, Lay TS |
1457 - 1460 |
Structural and optical characterization of InGaN/GaN multiple quantum wells grown by molecular beam epitaxy Ng HM, Moustakas TD, Ludwig KF |
1461 - 1466 |
Maskless selective epitaxy of GaN by Ga low energy focused ion beam and dimethylhydrazine Cho DH, Tanaka M, Pak K |
1467 - 1471 |
Theoretical study of GaN molecular beam epitaxy growth using ammonia: A rate equation approach Fu WN, Venkat R |
1472 - 1475 |
Molecular-beam epitaxial growth of high electron mobility AlGaN/GaN heterostructures Li LK, Turk B, Wang WI, Syed S, Simonian D, Stormer HL, Lang DV |
1476 - 1479 |
Effects of hydrogen on doping of GaInNAs grown by gas-source molecular beam epitaxy Xin HP, Tu CW, Geva M |
1480 - 1483 |
Group III nitride-arsenide long wavelength lasers grown by elemental source molecular beam epitaxy Coldren CW, Spruytte SG, Harris JS, Larson MC |
1484 - 1487 |
High performance 1.3 mu m InGaAsN : Sb/GaAs quantum well lasers grown by molecular beam epitaxy Yang X, Heroux JB, Jurkovic MJ, Wang WI |
1488 - 1492 |
Smoothing of textured GaAs surfaces during molecular beam epitaxy growth Adamcyk M, Ballestad A, Pinnington T, Tiedje T, Davies M, Feng Y |
1493 - 1495 |
Strain relaxation-induced modifications of the optical properties of self-assembled InAs quantum dot superlattices Petitprez E, Moshegov NT, Marega E, Mazel A, Dorignac D, Fourmeaux R |
1496 - 1501 |
Characterization of InAs quantum dots in strained InxGa1-xAs quantum wells Stintz A, Liu GT, Gray AL, Spillers R, Delgado SM, Malloy KJ |
1502 - 1506 |
Growth of high density self-organized (In,Ga)As quantum dots with ultranarrow photoluminescence linewidths using buried In(Ga,Al)As stressor dots Krishna S, Sabarinathan J, Linder K, Bhattacharya P, Lita B, Goldman RS |
1507 - 1509 |
Size distribution of quantum-scale GaAs islands grown by Ga droplet induced chemical beam epitaxy Ro JR, Kim SB, Park K, Lee J |
1510 - 1513 |
Narrow photoluminescence linewidths from ensembles of self-assembled InGaAs quantum dots Mirin RP, Silverman KL, Christensen DH, Roshko A |
1514 - 1517 |
Plasma-assisted molecular beam epitaxy for ZnO based II-VI semiconductor oxides and their heterostructures Chen YF, Ko HJ, Hong SK, Sekiuchi T, Yao T, Segawa Y |
1518 - 1521 |
Controlled growth of ZnSeTe superlattices with sinusoidal compositional modulation Lee S, Bindley U, Furdyna JK, Reimer PM, Buschert JR |
1522 - 1525 |
Growth and characterization of patterned ZnCdSe structures for application in integrated R-G-B II-VI light-emitting diodes Luo Y, Elmoumni A, Guo SP, Tamargo MC, Kelly S, Ghaemi H, Asnin V, Tomkiewicz M, Pollak FH, Chen YC |
1526 - 1529 |
Temperature dependence of exciton localization in Zn1-xCdxSe quantum wells Diaz-Arencibia P, Hernandez-Calderon I, Hernandez-Ramirez LM, Tamargo MC |
1530 - 1533 |
Optical properties of ZnMgSeTe quaternary alloys grown on ZnTe substrates by molecular-beam epitaxy Chang JH, Wang HM, Cho MW, Makino H, Hanada H, Yao T, Shim K, Rabitz H |
1534 - 1537 |
p-type doping of (Zn,Mg,Cd)Se alloys using a radio frequency discharge nitrogen plasma source Lin W, Guo SP, Tamargo MC |
1538 - 1541 |
Investigation of e-h pair compression in molecular beam epitaxy grown ZnCdSe/ZnSe multiquantum wells at volume excitation by electron beam Kozlovsky VI, Sadofyev YG |
1542 - 1544 |
Resonant Raman scattering and photoluminescence enhancement in ZnCdSe quantum wells Hernandez-Ramirez LM, Hernandez-Calderon I |
1545 - 1548 |
Long wavelength pseudomorphic InGaPAsSb type-I and type-II active layers grown on GaAs Johnson SR, Dowd P, Braun W, Koelle U, Ryu CM, Beaudoin M, Guo CZ, Zhang YH |
1549 - 1552 |
Surface migration of group V atoms in GaAsP grown on GaAs channeled substrates by molecular beam epitaxy Tatsuoka Y, Kamimoto H, Kitada T, Shimomura S, Hiyamizu S |
1553 - 1556 |
Study of AlGaAs/GaAs quantum wells overgrown on in situ Cl-2-etched GaAs substrates Lopez-Lopez M, Luyo-Alvarado J, Melendez-Lira M, Cano-Aguilar O, Megia-Garcia C, Ortiz-Lopez J, Contreras-Puente G, Ishikawa T |
1557 - 1561 |
In situ etching and regrowth in III-V molecular beam epitaxy for future nanotechnology Schuler H, Keller M, Lipinski M, Eberl K, Weis J, Von Klitzing K |
1562 - 1565 |
Characterization of in situ etched and molecular beam epitaxy regrown GaAs interfaces using capacitance-voltage measurements, far infrared spectroscopy, and magnetotransport measurements Klein C, Kramp S, Beyer S, Heyn C, Hansen W, Heitmann D |
1566 - 1571 |
Analysis of twin defects in GaAs(111)B molecular beam epitaxy growth Park Y, Cich MJ, Zhao R, Specht P, Weber ER, Stach E, Nozaki S |
1572 - 1575 |
In0.18Ga0.82As/GaAs1-yPy quantum wells grown on (n11)A GaAs substrates by molecular beam epitaxy Kamimoto H, Tatsuoka Y, Kitada T, Shimomura S, Hiyamizu S |
1576 - 1578 |
In0.05Ga0.95As/Al0.3Ga0.7As quantum wells grown on a (411)A-oriented In0.06Ga0.94As ternary substrate by molecular beam epitaxy Kitano Y, Kuriyama R, Kitada T, Shimomura S, Hiyamizu S, Nishijima Y, Ishikawa H |
1579 - 1582 |
As-4 pressure dependence of surface segregation of indium atoms during molecular beam epitaxy of In0.08Ga0.92As/GaAs superlattices on (411)A GaAs substrates Kitada T, Tatsuoka Y, Shimomura S, Hiyamizu S |
1583 - 1585 |
Improving the surface morphology of InSb quantum-well structures on GaAs substrates Chung SJ, Ball MA, Lindstrom SC, Johnson MB, Santos MB |
1586 - 1589 |
Observation of direct (type-I) transitions in type-II InGaAs/AlAsSb heterostructures lattice matched to InP grown by molecular beam epitaxy Mozume T, Georgiev N, Yoshida H, Neogi A, Nishimura T |
1590 - 1593 |
Improvement of AlAs-GaAs interface roughness grown with high As overpressures Wohlert DE, Chang KL, Lin HC, Hsieh KC, Cheng KY |
1594 - 1597 |
Properties of carbon-doped low-temperature GaAs and InP grown by solid-source molecular-beam epitaxy using CBr4 Liu WK, Lubyshev DI, Specht P, Zhao R, Weber ER, Gebauer J, SpringThorpe AJ, Streater RW, Vijarnwannaluk S, Songprakob W, Zallen R |
1598 - 1600 |
Super-flat interfaces in pseudomorphic In0.72Ga0.28As/In0.52Al0.48As quantum wells grown on (411)A InP substrates by molecular beam epitaxy Aoki T, Kitada T, Shimomura S, Hiyamizu S |
1601 - 1604 |
Molecular beam epitaxial growth of monolithic 1.55 mu m vertical cavity surface emitting lasers with AlGaAsSb/AlAsSb Bragg mirrors Almuneau G, Hall E, Nakagawa S, Kim JK, Lofgreen D, Sjolund O, Luo C, Clarke DR, English JH, Coldren LA |
1605 - 1608 |
GaAsSb/InGaAs type-II quantum wells for long-wavelength lasers on GaAs substrates Klem JF, Blum O, Kurtz SR, Fritz J, Choquette KD |
1609 - 1613 |
Optimization of buffer layers for InGaAs/AlGaAs PIN optical modulators grown on GaAs substrates by molecular beam epitaxy Katzer DS, Rabinovich WS, Ikossi-Anastasiou K, Gilbreath GC |
1614 - 1618 |
InGaAs/AlGaAs intersubband transition structures grown on InAlAs buffer layers on GaAs substrates by molecular beam epitaxy Katzer DS, Rabinovich WS, Beadie G |
1619 - 1622 |
Molecular beam epitaxial growth of vertical cavity surface emitting lasers with digital alloys and digital gradings Newman PG, Pamulapati J, Shen H, Taysing-Lara M, Liu J, Chang W, Simonis G, Koley B, Dagenais M, Feld S, Loehr J |
1623 - 1627 |
Molecular beam epitaxy growth and characterization of broken-gap (type II) superlattices and quantum wells for midwave-infrared laser diodes Hasenberg TC, Day PS, Shaw EM, Magarreli DJ, Olesberg JT, Yu C, Boggess TF, Flatte ME |
1628 - 1632 |
Midinfrared type-II interband cascade lasers Bradshaw JL, Bruno JD, Pham JT, Wortman DE, Yang RQ |
1633 - 1637 |
Electrical properties of modulation-doped InxAl1-xAs/InyGa1-yAs structures on GaAs and InP substrates with 0.2 <= x, y <= 0.8 Cai WZ, Wang ZM, Miller DL |
1638 - 1641 |
Growth and characterization of metamorphic In-x(AlGa)(1-x)As/InxGa1-xAs high electron mobility transistor material and devices with X=0.3-0.4 Hoke WE, Lyman PS, Whelan CS, Mosca JJ, Torabi A, Chang KL, Hsieh KC |
1642 - 1644 |
High performance InP high electron mobility transistors by valved phosphorus cracker Chin TP, Chen YC, Barsky M, Wojtowicz M, Grundbacher R, Lai R, Streit DC, Block TR |
1645 - 1649 |
Gas source molecular beam epitaxial growth of 77 GHz InP Gunn diodes for automotive forward looking radar applications Franklin J, Kuo HC, Liu J, Vizcarra R, Pao YC, Cheng KY, Pickrell G |
1650 - 1652 |
Monolithic integration of resonant interband tunneling diodes and high electron mobility transistors in the InAs/GaSb/AlSb material system Bennett BR, Bracker AS, Magno R, Boos JB, Bass R, Park D |
1653 - 1657 |
Epitaxial perovskite thin films grown on silicon by molecular beam epitaxy Yu Z, Ramdani J, Curless JA, Finder JM, Overgaard CD, Droopad R, Eisenbeiser KW, Hallmark JA, Ooms WJ, Conner JR, Kaushik VS |
1658 - 1662 |
Strain compensation in In0.75Ga0.25As/InP pseudomorphic high electron mobility transistors using strained InAlAs buffers Goorsky MS, Sandhu R, Hsing R, Naidenkova M, Wojtowicz M, Chin TP, Block TR, Streit DC |
1663 - 1667 |
Process control of high volume pseudomorphic high electron mobility transistor and metal-semiconductor field effect transistor molecular beam epitaxy production using temperature-dependent photoluminescence Liu W, Lin ME |
1668 - 1671 |
New approach to the independent ohmic contact formation in the structures with two parallel isotype quantum wells Sadofyev YG, Yevstigneev SV, Kopaev YV, Shipitsin DS, Shmelev SS |
1672 - 1674 |
Laser operation at room temperature of self-organized In0.1Ga0.9As/(GaAs)(6)(AlAs)(1) quantum wires grown on (775)B-oriented GaAs substrates by molecular beam epitaxy Ohno Y, Higashiwaki M, Shimomura S, Hiyamizu S, Ikawa S |
1675 - 1679 |
Fabrication of GaAs quantum wires by natural selective doping and its characterization by electrostatic force microscope Yoh K, Takabayashi S |
1680 - 1683 |
Negative differential resistance of a ridge-type InGaAs quantum wire field-effect transistor Sugaya T, Kim SJ, Nakagawa T, Sugiyama Y, Ogura M |
1684 - 1687 |
Growth of CdS self-organized quantum dots by molecular beam epitaxy and application to light emitting diode structures Kobayashi M, Kitamura K, Umeya H, Jia AW, Yoshikawa A, Shimotomai M, Kato Y, Takahashi K |
1688 - 1691 |
Characteristics of Ga2O3(Gd2O3)/GaAs interface: Structures and compositions Hong M, Kortan AR, Kwo J, Mannaerts JP, Krajewski JJ, Lu ZH, Hsieh KC, Cheng KY |
1692 - 1696 |
Modulation-doped ZnSe/(Zn,Cd,Mn)Se quantum wells and superlattices Berry JJ, Knobel R, Ray O, Peoples W, Samarth N |
1697 - 1700 |
Structural and magnetic properties of molecular beam epitaxy grown GaMnAs layers Sadowski J, Domagala JZ, Bak-Misiuk J, Kolesnik S, Sawicki M, Swiatek K, Kanski J, Ilver L, Strom V |
1701 - 1705 |
Growth and nonlinear optical properties of GaAs absorber layers for AlGaAs/CaF2 semiconductor saturable absorber mirrors Schon S, Haiml M, Achermann M, Keller U |
1706 - 1710 |
Fabrication of GaAs-based photonic band gap materials Zhou WD, Bhattacharya P, Sabarinathan J, Zhu DH |
1711 - 1715 |
Molecular-beam epitaxy growth and nitrogen doping of hexagonal ZnSe and ZnCdSe/ZnSe quantum well structures on hexagonal ZnMgSSe bulk substrates Lin W, Tamargo MC, Wei HY, Sarney W, Salamanca-Riba L, Fitzpatrick BJ |
1716 - 1719 |
Phase stability during molecular beam epitaxial growth of CdTe on InSb(111) substrates Huerta J, Lopez M, Zelaya-Angel O |
1720 - 1723 |
Molecular beam epitaxy of PbSrSe and PbSe/PbSrSe multiple quantum well structures for use in midinfrared light emitting devices Fang XM, Namjou K, Chao IN, McCann PJ, Dai N, Tor G |
1724 - 1727 |
Interface-controlled Si/SiGe-heterostructure growth and its device application Sugii N, Nakagawa K, Yamaguchi S, Miyao M |
1728 - 1731 |
Heterostructures of pseudomorphic Ge1-yCy and Ge1-x-ySixCy alloys grown on Ge (001) substrates Dashiell MW, Kolodzey J, Boucaud P, Yam V, Lourtioz JM |
1736 - 1736 |
Papers from the International Conference on Silicon Dielectric Interfaces - 25-27 February 2000 - Raleigh, North Carolina -Preface Paesler M |
1737 - 1741 |
Depth-resolved detection and process dependence of traps at ultrathin plasma-oxidized and deposited SiO2/Si interfaces Brillson LJ, Young AP, White BD, Schafer J, Niimi H, Lee YM, Lucovsky G |
1742 - 1748 |
Intrinsic limitations on device performance and reliability from bond-constraint induced transition regions at interfaces of stacked dielectrics Lucovsky G, Yang H, Niimi H, Keister JW, Rowe JE, Thorpe MF, Phillips JC |
1749 - 1751 |
Stress and defects in silicate films and glasses Phillips JC |
1752 - 1756 |
Controlled bond formation between chemical vapor deposition Si and ultrathin SiO2 layers Yasuda T, Nishizawa M, Yamasaki S, Tanaka K |
1757 - 1763 |
Ar/N2O remote plasma-assisted oxidation of Si(100): Plasma chemistry, growth kinetics, and interfacial reactions Smith BC, Khandelwal A, Lamb HH |
1764 - 1769 |
Bond strain, chemical induction, and OH incorporation in low-temperature (350-100 degrees C) plasma deposited silicon dioxide films Gupta A, Parsons GN |
1770 - 1772 |
Hydrogen diffusion through silicon/silicon dioxide interfaces Nickel NH |
1773 - 1775 |
Internal stress of amorphous carbon nitride films Aono M, Nitta S, Katsuno T, Iuchi T |
1776 - 1784 |
Photoemission of the SiO2-SiC heterointerface O'Brien ML, Koitzsch C, Nemanich RJ |
1785 - 1791 |
Band offsets of wide-band-gap oxides and implications for future electronic devices Robertson J |
1792 - 1795 |
Bandtails and defects in microcrystalline silicon (mu c-Si : H) Fuhs W, Kanschat P, Lips K |
1796 - 1804 |
Infrared optical constants of silicon dioxide thin films by measurements of R and T Tsu DV |
1805 - 1809 |
Comparison of the potential fluctuations in a-Si: H measured by the optical and transport methods Sinha AK, Agarwal SC |