Journal of Vacuum Science & Technology B

Journal of Vacuum Science & Technology B, Vol.28, No.3 Entire volume, number list

ISSN: 1071-1023 (Print)

In this Issue (39 articles)

441 - 449	Method to obtain nonuniformity information from field emission behavior Dall'Agnol FF, de Paulo AC, Paredez P, den Engelsen D, Santos TEA, Mammana VP
450 - 459	Effect of energetic ions on plasma damage of porous SiCOH low-k materials Kunnen E, Baklanov MR, Franquet A, Shamiryan D, Rakhimova TV, Urbanowicz AM, Struyf H, Boullart W
460 - 465	Effects of the size of silicon grain on the gate-leakage current in nanocrystalline silicon thin-film transistors Mao LF
466 - 472	n-type InP Schottky diodes with organic thin layer: Electrical and interfacial properties Gullu O, Turut A
473 - 477	Effects of AlxGa1-xN interlayer for GaN epilayer grown on Si substrate by metal-organic chemical-vapor deposition Lin KL, Chang EY, Hsiao YL, Huang WC, Luong TT, Wong YY, Li TK, Tweet D, Chiang CH
478 - 483	Mn-induced growth of InAs nanowires Jabeen F, Piccin M, Felisari L, Grillo V, Bais G, Rubini S, Martelli F, d'Acapito F, Rovezzi M, Boscherini F
484 - 489	Direct transfer of gold nanoislands from a MoS2 stamp to a Si-H surface Deng J, Troadec C, Hui HK, Joachim C
490 - 494	Cathodoluminescent properties of nanocrystalline Lu3Ga5O12:Tb3+ phosphor for field emission display application Xu XG, Chen J, Deng SZ, Xu NS, Lin J
495 - 499	Cesium and oxygen activated amorphous silicon germanium photocathodes for photoinjectors Mulhollan GA, Bierman JC
500 - 505	Effects of focused MeV ion beam irradiation on the roughness of electrochemically micromachined silicon surfaces Ow YS, Azimi S, Breese MBH, Teo EJ, Mangaiyarkarasi D
506 - 510	Field emission from N-doped diamond doped with dimethylurea Kudo Y, Sato Y, Masuzawa T, Yamada T, Saito I, Yoshino T, Chun WJ, Yamasaki S, Okano K
511 - 516	Secondary ion mass spectrometry characterization of anomalous behavior for low dose ion implanted phosphorus in silicon Penley C, Stevie FA, Griffis DP, Siebel S, Kulig L, Lee J
517 - 521	Mechanism of ultrathin tunnel barrier failure due to mechanical-stress-induced nanosized hillocks and voids Tyagi P, Hinds BJ
522 - 526	Aligned dense single-walled carbon nanotube beams and cantilevers for nanoelectromechanical systems applications Lu M, Jang MW, Campbell SA, Cui TH
527 - 537	Atomic radical abatement of organic impurities from electron beam deposited metallic structures Wnuk JD, Gorham JM, Rosenberg SG, Madey TE, Hagen CW, Fairbrother DH
538 - 544	Parallel fabrication of monolithic nanoscopic tunnel junctions for molecular devices Gupta R, Willis BG
545 - 548	X-ray photoelectron spectroscopy investigation of oxidation states in molybdenum thin films for Cu(InGa)Se-2 applications Kang YC, Khanal R, Park JY, Ramsier RD, Khatri H, Marsillac S
549 - 553	Fabrication of complex three-dimensional nanostructures using focused ion beam and nanomanipulation Jeon J, Floresca HC, Kim MJ
554 - 557	Depth profile analysis of helium in silicon with high-resolution elastic recoil detection analysis Tomita M, Akutsu H, Oshima Y, Sato N, Mure S, Fukuyama H, Ichihara C
558 - 561	Fabrication of gated CuO nanowire field emitter arrays for application in field emission display Zhan RZ, Chen J, Deng SZ, Xu NS
562 - 566	Nanoscale field emission in inert gas under atmospheric pressure Qian L, Wang YQ, Liu L, Fan SS
567 - 572	Effect of copper barrier dielectric deposition process on characterization of copper interconnect Cheng YL, Chiu TJ, Wei BJ, Wang HJ, Wu J, Wang YL
573 - 576	Electrical and reliability performances of nitrogen-incorporated silicon carbide dielectric by chemical vapor deposition Cheng YL, Chen SA, Chiu TJ, Wu J, Wei BJ, Chang HJ
577 - 580	Effect of iodotrifluoromethane plasma for reducing ultraviolet light irradiation damage in dielectric film etching processes Ichihashi Y, Ishikawa Y, Shimizu R, Samukawa S
581 - 587	Electron-beam exposure mechanisms in hydrogen silsesquioxane investigated by vibrational spectroscopy and in situ electron-beam-induced desorption Olynick DL, Cord B, Schipotinin A, Ogletree DF, Schuck PJ
588 - 594	Damage engineering of boron-based low energy ion implantations on ultrashallow junction fabrications Qin S, Hu YJ, McTeer A
595 - 607	Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques Rommel M, Spoldi G, Yanev V, Beuer S, Amon B, Jambreck J, Petersen S, Bauer AJ, Frey L
608 - 612	Neutron transmutation doping effects in GaN Polyakov AY, Smirnov NB, Govorkov AV, Kolin NG, Merkurisov DI, Boiko VM, Korulin AV, Pearton SJ
613 - 616	ZnCdSe nanowires grown by molecular beam epitaxy Lan BW, Hsiao CH, Hung SC, Chang SJ, Young SJ, Cheng YC, Chih SH, Huang BR
617 - 622	Submicron organic nanofiber devices with different anode-cathode materials: A simple approach Henrichsen H, Sturm H, Boggild P, Hansen O
623 - 626	Correlation between structural and optical properties of a-plane GaN films grown on r-plane sapphire by metal organic chemical-vapor deposition Jung M, Chang J, Lee H, Ha JS, Park JS, Park S, Fujii K, Yao T, Kil GS, Lee S, Cho M, Whang S, Seo YG
627 - 630	Simulation of self-focusing electron emitter Yuan G, Jiang JJ, Li C, Liu WD, Mimura H
631 - 634	Single-crystal gold tip for tip-enhanced Raman spectroscopy Roy D, Williams CM, Mingard K
635 - 637	Removing GaAs substrate by nitric acid solution Li CC, Guan BL, Chuai DX, Guo X, Shen GD
638 - 642	Fabrication of regular arrays of gold nanospheres by thermal transformation of electroless-plated films Ahn W, Blake P, Shultz J, Ware ME, Roper DK
643 - 647	Resurrecting dirty atomic force microscopy calibration standards Chernoff DA, Sherman R
648 - 648	Experimental studies of dose retention and activation in fin field-effect-transistor-based structures (vol 28, pg C1H5, 2010) Mody J, Duffy R, Eyben P, Goossens J, Moussa A, Polspoel W, Berghmans B, van Dal MJH, Pawlak BJ, Kaiser M, Weemaes RGR, Vandervorst W
L21 - L24	Visualizing contact line phenomena on microstructured superhydrophobic surfaces Cannon AH, King WP
L25 - L27	Development of ion sources from ionic liquids for microfabrication Perez-Martinez C, Guilet S, Gogneau N, Jegou P, Gierak J, Lozano P